ATE310106T1 - Verbessertes verfahren zum beschichten eines trägers mit einem material - Google Patents
Verbessertes verfahren zum beschichten eines trägers mit einem materialInfo
- Publication number
- ATE310106T1 ATE310106T1 AT02801075T AT02801075T ATE310106T1 AT E310106 T1 ATE310106 T1 AT E310106T1 AT 02801075 T AT02801075 T AT 02801075T AT 02801075 T AT02801075 T AT 02801075T AT E310106 T1 ATE310106 T1 AT E310106T1
- Authority
- AT
- Austria
- Prior art keywords
- support
- coating
- phase
- layer
- incorporating
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000463 material Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5893—Mixing of deposited material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0115366A FR2832736B1 (fr) | 2001-11-28 | 2001-11-28 | Procede perfectionne de revetement d'un support par un materiau |
| PCT/FR2002/004087 WO2003046248A2 (fr) | 2001-11-28 | 2002-11-28 | Procede perfectionne de revetement d'un support |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE310106T1 true ATE310106T1 (de) | 2005-12-15 |
Family
ID=8869866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02801075T ATE310106T1 (de) | 2001-11-28 | 2002-11-28 | Verbessertes verfahren zum beschichten eines trägers mit einem material |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7767269B2 (de) |
| EP (1) | EP1448805B1 (de) |
| CN (1) | CN1610765B (de) |
| AT (1) | ATE310106T1 (de) |
| AU (1) | AU2002364794A1 (de) |
| DE (1) | DE60207437T2 (de) |
| ES (1) | ES2248638T3 (de) |
| FR (1) | FR2832736B1 (de) |
| WO (1) | WO2003046248A2 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101818325B (zh) * | 2010-04-19 | 2011-10-26 | 中国民航大学 | 一种利用强脉冲离子束制备具有连续过渡层的镀层的方法 |
| JP5815713B2 (ja) * | 2010-09-23 | 2015-11-17 | ロールス−ロイス コーポレイション | 環境保護のためのイオン衝撃表面を備えた合金 |
| KR20120121299A (ko) * | 2011-04-26 | 2012-11-05 | 주식회사 팬택 | 기지국의 상향링크 전력 제어 정보 제공 방법 및 단말의 상향링크 전력 제어 방법, 그 기지국, 그 단말 |
| CN103173731B (zh) * | 2011-12-23 | 2015-03-18 | 中国科学院兰州化学物理研究所 | 一种改善TiN/TiCN多层复合薄膜材料性能的方法 |
| US20200115804A1 (en) * | 2017-06-29 | 2020-04-16 | 3M Innovative Properties Company | Article and method of making the same |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4714641A (en) * | 1983-12-15 | 1987-12-22 | Varian Associates, Inc. | Ferromagnetic films for high density recording and methods of production |
| GB8417040D0 (en) * | 1984-07-04 | 1984-08-08 | Salford University Of | Modifying properties of material |
| JPH0726198B2 (ja) * | 1986-01-29 | 1995-03-22 | 株式会社日立製作所 | 薄膜形成方法及びその装置 |
| US4743308A (en) * | 1987-01-20 | 1988-05-10 | Spire Corporation | Corrosion inhibition of metal alloys |
| US5690796A (en) * | 1992-12-23 | 1997-11-25 | Balzers Aktiengesellschaft | Method and apparatus for layer depositions |
| US5532495A (en) * | 1993-11-16 | 1996-07-02 | Sandia Corporation | Methods and apparatus for altering material using ion beams |
| CN1163581A (zh) * | 1995-01-23 | 1997-10-29 | 桑代公司 | 脉冲离子束辅助淀积 |
| JPH09511028A (ja) * | 1995-01-23 | 1997-11-04 | サンディア・コーポレーション | パルスイオンビーム利用デポジション |
| CA2237258A1 (en) * | 1995-11-10 | 1997-05-15 | Tapio Pohjola | A method of tiling a plane surface |
| US6572933B1 (en) * | 1997-09-24 | 2003-06-03 | The Regents Of The University Of California | Forming adherent coatings using plasma processing |
| US6086726A (en) * | 1998-05-19 | 2000-07-11 | Sandia Corporation | Method of modifying a surface |
| WO1999065038A1 (en) * | 1998-06-10 | 1999-12-16 | Quantum Manufacturing Technologies, Inc. | Simplified method of modifying a surface of a material |
| US6426125B1 (en) * | 1999-03-17 | 2002-07-30 | General Electric Company | Multilayer article and method of making by ARC plasma deposition |
| US6475573B1 (en) * | 1999-05-03 | 2002-11-05 | Guardian Industries Corp. | Method of depositing DLC inclusive coating on substrate |
-
2001
- 2001-11-28 FR FR0115366A patent/FR2832736B1/fr not_active Expired - Fee Related
-
2002
- 2002-11-28 WO PCT/FR2002/004087 patent/WO2003046248A2/fr not_active Ceased
- 2002-11-28 AU AU2002364794A patent/AU2002364794A1/en not_active Abandoned
- 2002-11-28 EP EP02801075A patent/EP1448805B1/de not_active Expired - Lifetime
- 2002-11-28 ES ES02801075T patent/ES2248638T3/es not_active Expired - Lifetime
- 2002-11-28 AT AT02801075T patent/ATE310106T1/de active
- 2002-11-28 US US10/497,052 patent/US7767269B2/en not_active Expired - Fee Related
- 2002-11-28 DE DE60207437T patent/DE60207437T2/de not_active Expired - Lifetime
- 2002-11-28 CN CN028263774A patent/CN1610765B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003046248A2 (fr) | 2003-06-05 |
| CN1610765A (zh) | 2005-04-27 |
| EP1448805B1 (de) | 2005-11-16 |
| US7767269B2 (en) | 2010-08-03 |
| EP1448805A2 (de) | 2004-08-25 |
| DE60207437D1 (de) | 2005-12-22 |
| FR2832736B1 (fr) | 2004-12-10 |
| CN1610765B (zh) | 2012-01-11 |
| ES2248638T3 (es) | 2006-03-16 |
| FR2832736A1 (fr) | 2003-05-30 |
| DE60207437T2 (de) | 2006-07-27 |
| AU2002364794A8 (en) | 2003-06-10 |
| WO2003046248A3 (fr) | 2003-12-11 |
| US20050147767A1 (en) | 2005-07-07 |
| AU2002364794A1 (en) | 2003-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2004113585A3 (en) | Atomic layer deposition of barrier materials | |
| DK2034039T3 (da) | Metalliseret folie og fremgangsmåde til dens fremstilling samt anvendelse af den | |
| TW200602510A (en) | In-situ process chamber preparation methods for plasma ion implantation systems | |
| DE10124749A1 (de) | Kombiniertes Beschichtungs Verfahren magnetfeldunterstützte Hochleistungs-Impuls-Kathodenzerstäubung und Unbalanziertes Magnetron | |
| JPS60141869A (ja) | 膜形成方法および膜形成装置 | |
| EP1340835A3 (de) | Mit einem Kohlenstofffilm beschichteter Gegenstand und Verfahren zu dessen Herstellung | |
| ATE287459T1 (de) | Kohlenstoffbeschichtungen, verfahren und vorrichtung für ihre aufbringung und damit beschichtete gegenstände | |
| WO2000058953A3 (en) | Reactive ion beam etching method and a thin film head fabricated using the method | |
| EP0335526A3 (de) | Magnetron mit schaltbarem magnetischem Fluss und Betriebsverfahren | |
| BE1010420A3 (fr) | Procede pour la formation d'un revetement sur un substrat et installation pour la mise en oeuvre de ce procede. | |
| ATE310106T1 (de) | Verbessertes verfahren zum beschichten eines trägers mit einem material | |
| CN101368260A (zh) | 用于在基底上沉积涂层的方法和设备 | |
| WO1999020086A3 (en) | Process for forming adherent coatings using plasma processing | |
| US5750012A (en) | Multiple species sputtering for improved bottom coverage and improved sputter rate | |
| WO1996033098A3 (en) | Gas-impermeable, chemically inert container structure and method of producingthe same | |
| Nender et al. | Monte Carlo simulations of ion-assisted selectivedeposition | |
| JP2006057008A (ja) | シール材およびその製造方法 | |
| GB2154249A (en) | Cathode sputtering | |
| JPS61153275A (ja) | スパツタリングによる薄膜形成方法 | |
| JP2875892B2 (ja) | 立方晶窒化ほう素膜の形成方法 | |
| Berg et al. | Ion assisted selective thin film deposition | |
| JPS60131964A (ja) | 膜被覆物の製造方法 | |
| GB2401116A (en) | Plasma Assisted Chemical Vapour Deposition | |
| JP3260905B2 (ja) | 皮膜形成装置 | |
| KR100362529B1 (ko) | 후막 코팅방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
Ref document number: 1448805 Country of ref document: EP |