ATE311592T1 - Nachweis und entfernen von kupfer aus abwässern bei der herstellung von halbleitern und leiterplatten - Google Patents

Nachweis und entfernen von kupfer aus abwässern bei der herstellung von halbleitern und leiterplatten

Info

Publication number
ATE311592T1
ATE311592T1 AT99935400T AT99935400T ATE311592T1 AT E311592 T1 ATE311592 T1 AT E311592T1 AT 99935400 T AT99935400 T AT 99935400T AT 99935400 T AT99935400 T AT 99935400T AT E311592 T1 ATE311592 T1 AT E311592T1
Authority
AT
Austria
Prior art keywords
copper
wastewater
removal
detection
semiconductors
Prior art date
Application number
AT99935400T
Other languages
English (en)
Inventor
Kristine S Salmen
Angela S Kowalski
Brian V Jenkins
John E Hoots
Original Assignee
Nalco Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nalco Chemical Co filed Critical Nalco Chemical Co
Application granted granted Critical
Publication of ATE311592T1 publication Critical patent/ATE311592T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
    • G01N21/643—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" non-biological material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/12—Condition responsive control

Landscapes

  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Pathology (AREA)
  • Removal Of Specific Substances (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Physical Water Treatments (AREA)
  • Catalysts (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
AT99935400T 1998-07-13 1999-07-01 Nachweis und entfernen von kupfer aus abwässern bei der herstellung von halbleitern und leiterplatten ATE311592T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/114,740 US6140130A (en) 1998-07-13 1998-07-13 Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing
PCT/US1999/015005 WO2000003231A1 (en) 1998-07-13 1999-07-01 Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing

Publications (1)

Publication Number Publication Date
ATE311592T1 true ATE311592T1 (de) 2005-12-15

Family

ID=22357143

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99935400T ATE311592T1 (de) 1998-07-13 1999-07-01 Nachweis und entfernen von kupfer aus abwässern bei der herstellung von halbleitern und leiterplatten

Country Status (12)

Country Link
US (1) US6140130A (de)
EP (1) EP1097368B1 (de)
JP (1) JP4883838B2 (de)
KR (1) KR100679092B1 (de)
CN (1) CN1180240C (de)
AT (1) ATE311592T1 (de)
AU (1) AU770591B2 (de)
DE (1) DE69928670T2 (de)
ES (1) ES2253900T3 (de)
MY (1) MY118270A (de)
TW (1) TW518416B (de)
WO (1) WO2000003231A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436830B1 (en) * 1999-10-06 2002-08-20 Agere Systems Guardian Corp. CMP system for polishing semiconductor wafers and related method
US6458289B1 (en) 1999-10-06 2002-10-01 Agere Systems Guardian Corp. CMP slurry for polishing semiconductor wafers and related methods
US6375791B1 (en) * 1999-12-20 2002-04-23 Lsi Logic Corporation Method and apparatus for detecting presence of residual polishing slurry subsequent to polishing of a semiconductor wafer
RU2201592C2 (ru) * 2001-05-03 2003-03-27 Красноярский государственный университет Способ определения меди
US6800255B2 (en) * 2002-01-23 2004-10-05 Agere Systems, Inc. System and method for the abatement of toxic constituents of effluent gases
JP2003300070A (ja) * 2002-04-09 2003-10-21 Ngk Insulators Ltd メタル系ｃｍｐ排水の処理方法
US20060243604A1 (en) * 2003-04-30 2006-11-02 Sota Nakagawa Method and apparatus for treating waste water
US8110163B2 (en) * 2007-12-07 2012-02-07 Nalco Company Complexation and removal of heavy metals from flue gas desulfurization systems
JP4264111B2 (ja) * 2007-03-01 2009-05-13 株式会社東芝 紫外線照射システムおよび水質監視装置
TWI424965B (zh) * 2007-04-03 2014-02-01 Nalco Co 都市廢水的重金屬移除的方法
KR100903446B1 (ko) * 2007-10-25 2009-06-18 주식회사 동부하이텍 화학기계적 연마장치의 구리 검출방법
JP5525454B2 (ja) 2008-01-28 2014-06-18 フラム・グループ・アイピー・エルエルシー 高い位置のねじ山の接地シールド
KR101363294B1 (ko) 2012-05-03 2014-02-19 대전보건대학 산학협력단 구리 농도 측정용 조성물 및 이를 이용한 검출방법
CN103940797B (zh) * 2014-05-02 2016-07-06 上海交通大学 利用铜离子特异性DNA和SYBR Green I荧光法检测铜的方法
CN108191148B (zh) * 2017-12-29 2021-10-15 赣州龙源环保产业经营管理有限公司 一种焦铜废水的自动化净化系统及净化方法
CN108585299A (zh) * 2018-07-05 2018-09-28 江苏德意高航空智能装备股份有限公司 一步式投药荧光废水处理系统
JP7747652B2 (ja) * 2020-04-07 2025-10-01 エヴォクア ウォーター テクノロジーズ エルエルシー 限外ろ過およびイオン交換によるスラリー銅廃液の処理
US11480556B1 (en) * 2020-04-27 2022-10-25 Hf Scientific, Llc Method and apparatus for detecting trace amounts of copper and silver in water
US12065367B2 (en) 2021-04-23 2024-08-20 Ecolab Usa Inc. Volatile fatty acid control
KR102778852B1 (ko) 2023-12-05 2025-03-11 한국건설기술연구원 중금속 폐수 내 선택적 구리 흡착용 알루미나 컬럼 및 그 제작방법

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3843567A (en) * 1972-11-30 1974-10-22 Mitsubishi Chem Ind Chelating amino acid addition polymer
US3877878A (en) * 1973-05-02 1975-04-15 William B Kerfoot Analytic device and method for monitoring heavy metals in natural waters
US3898042A (en) * 1974-01-02 1975-08-05 Dow Chemical Co Method and apparatus for continuously determining total copper in an aqueous stream
JPS5562794A (en) * 1978-11-01 1980-05-12 Hitachi Ltd Method of regnerating printed circuit board surface cleanser
US4400243A (en) * 1979-10-25 1983-08-23 Ebdon Leslie C Monitoring of heavy metal ions, electrode therefor and method of making a membrane sensitive to heavy metal ions
US4462913A (en) * 1981-11-09 1984-07-31 General Electric Company Process for treating wastewater containing fat and heavy metal ions
US4944836A (en) * 1985-10-28 1990-07-31 International Business Machines Corporation Chem-mech polishing method for producing coplanar metal/insulator films on a substrate
US4908676A (en) * 1987-12-18 1990-03-13 Bio-Recovery Systems, Inc. Sensors for dissolved substances in fluids
US5132096A (en) * 1990-03-23 1992-07-21 Nalco Chemical Company Monitoring performance of a water treating agent by measuring and resolving optical voltage analogs
US5116759A (en) * 1990-06-27 1992-05-26 Fiberchem Inc. Reservoir chemical sensors
US5292423A (en) * 1991-04-09 1994-03-08 New Mexico State University Technology Transfer Corp. Method and apparatus for trace metal testing
US5164095A (en) * 1991-10-02 1992-11-17 Nalco Chemical Company Dithiocarbamate polymers
US5346627A (en) * 1992-03-03 1994-09-13 Nalco Chemical Company Method for removing metals from a fluid stream
US5278074A (en) * 1992-04-22 1994-01-11 Nalco Chemical Company Method of monitoring and controlling corrosion inhibitor dosage in aqueous systems
US5407420A (en) * 1992-11-12 1995-04-18 Smith & Nephew Donjoy, Inc. Fully adjustable shoulder brace
US5328599A (en) * 1993-03-08 1994-07-12 Nalco Chemical Company System using sulfide ion-selective electrodes for control of chemical feed of organic sulfide products for metal ion precipitation from waste water
US5286464A (en) * 1993-06-14 1994-02-15 Nalco Chemical Company Silica gel ion exchange resins for the selective removal of lead and cadmium ions from aqueous liquids
US5552058A (en) * 1993-09-03 1996-09-03 Advanced Waste Reduction Cooling tower water treatment method
US5411889A (en) * 1994-02-14 1995-05-02 Nalco Chemical Company Regulating water treatment agent dosage based on operational system stresses
US5578829A (en) * 1994-05-23 1996-11-26 Texas Instruments Incorporated On-line monitor for moisture contamination in HCL gas and copper contamination in NH4 OH solutions
DE19512908C2 (de) * 1995-04-06 1998-08-27 Abb Patent Gmbh Verfahren zur Abwasseranalyse
US5928517A (en) * 1995-05-30 1999-07-27 The Regents Of The University Of California Water-soluble polymers for recovery of metals from solids
US5804606A (en) * 1997-04-21 1998-09-08 Rohm & Haas Company Chelating resins

Also Published As

Publication number Publication date
AU5088499A (en) 2000-02-01
DE69928670D1 (de) 2006-01-05
TW518416B (en) 2003-01-21
WO2000003231A1 (en) 2000-01-20
KR20010074717A (ko) 2001-08-09
AU770591B2 (en) 2004-02-26
ES2253900T3 (es) 2006-06-01
JP2002520144A (ja) 2002-07-09
EP1097368B1 (de) 2005-11-30
DE69928670T2 (de) 2006-07-20
KR100679092B1 (ko) 2007-02-05
CN1308723A (zh) 2001-08-15
CN1180240C (zh) 2004-12-15
MY118270A (en) 2004-09-30
EP1097368A1 (de) 2001-05-09
EP1097368A4 (de) 2002-04-10
JP4883838B2 (ja) 2012-02-22
US6140130A (en) 2000-10-31

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