ATE315326T1 - Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu - Google Patents

Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu

Info

Publication number
ATE315326T1
ATE315326T1 AT01980831T AT01980831T ATE315326T1 AT E315326 T1 ATE315326 T1 AT E315326T1 AT 01980831 T AT01980831 T AT 01980831T AT 01980831 T AT01980831 T AT 01980831T AT E315326 T1 ATE315326 T1 AT E315326T1
Authority
AT
Austria
Prior art keywords
treated
jet
jets
plasma
cathodic
Prior art date
Application number
AT01980831T
Other languages
English (en)
Inventor
Pavel Koulik
Anatolii Saitchenko
Nail Musin
Original Assignee
Apit Corp Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Apit Corp Sa filed Critical Apit Corp Sa
Application granted granted Critical
Publication of ATE315326T1 publication Critical patent/ATE315326T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Discharge Heating (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
AT01980831T 2000-11-10 2001-11-12 Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu ATE315326T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00811065 2000-11-10

Publications (1)

Publication Number Publication Date
ATE315326T1 true ATE315326T1 (de) 2006-02-15

Family

ID=8175021

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01980831T ATE315326T1 (de) 2000-11-10 2001-11-12 Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu

Country Status (12)

Country Link
US (1) US6949716B2 (de)
EP (2) EP1332650B1 (de)
JP (1) JP2004514054A (de)
CN (1) CN1265684C (de)
AT (1) ATE315326T1 (de)
AU (1) AU2002212616A1 (de)
BR (1) BR0115035A (de)
CA (1) CA2424891A1 (de)
DE (1) DE60116522T2 (de)
EA (1) EA004439B1 (de)
UA (1) UA75613C2 (de)
WO (1) WO2002039791A1 (de)

Families Citing this family (24)

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DE10157191A1 (de) * 2001-11-23 2003-06-05 Fritzmeier Georg Gmbh & Co Mikrobiologische Energiequelle zum Antrieb eines Verbrauchers
KR100464856B1 (ko) * 2002-11-07 2005-01-05 삼성전자주식회사 표면 식각 방법 및 실리콘 기판 이면 식각 방법.
FR2856079B1 (fr) * 2003-06-11 2006-07-14 Pechiney Rhenalu Procede de traitement de surface pour toles et bandes en alliage d'aluminium
SG114754A1 (en) * 2004-02-25 2005-09-28 Kulicke & Soffa Investments Laser cleaning system for a wire bonding machine
JP2005285520A (ja) * 2004-03-29 2005-10-13 Hiroshi Takigawa プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置
JP2005293945A (ja) * 2004-03-31 2005-10-20 Tama Tlo Kk プラズマ加熱装置およびノズル付き電極
JP4658506B2 (ja) 2004-03-31 2011-03-23 浩史 滝川 パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置
DE102004033728B4 (de) * 2004-07-13 2009-07-23 Plasmatreat Gmbh Verfahren zum Bearbeiten und Verkleben von Werkstücken aus einem Metall oder einer Metalllegierung mit einer hydratisierten Oxid- und/oder Hydroxidschicht
BRPI0514309B1 (pt) 2004-08-13 2016-03-29 Force Technology método para melhoria de um processo envolvendo um objeto sólido e um gás
JP5319921B2 (ja) * 2004-11-19 2013-10-16 ヴェトロテヒ・サン−ゴバン・（インターナショナル）・アクチェンゲゼルシャフト ガラス板の表面の筋状及び面状の加工をするための方法及び装置
DE102005012296A1 (de) * 2005-03-17 2006-09-21 Sms Demag Ag Verfahren und Vorrichtung zum Entzundern eines Metallbandes
US20060219754A1 (en) * 2005-03-31 2006-10-05 Horst Clauberg Bonding wire cleaning unit and method of wire bonding using same
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
WO2008138901A1 (en) * 2007-05-11 2008-11-20 Force Technology Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves
JP2012523675A (ja) * 2009-04-14 2012-10-04 チュシクフェサ ダウォンシス プラズマ表面処理装置および方法
DE102012104224A1 (de) * 2012-05-15 2013-11-21 Plasmatreat Gmbh Vorrichtung und Verfahren zur Behandlung eines Drahts aus leitfähigem Material
JP6482014B2 (ja) * 2014-07-30 2019-03-13 株式会社イーツーラボ プラズマ表面処理装置およびプラズマ表面処理システム
NL2014022B1 (en) * 2014-12-19 2016-10-12 Ihc Holland Ie Bv Device and method for crushing rock by means of pulsed electric energy.
JP6224139B2 (ja) * 2016-01-22 2017-11-01 沖野　晃俊 プラズマ処理装置
DE102020114016B4 (de) 2020-05-26 2024-09-19 Einhell Germany Ag Plasmabehandlung einer Trägerfolie für eine Elektrode eines Lithium-Ionen-Akkumulators
KR102451424B1 (ko) * 2020-07-14 2022-10-05 이창훈 롤투롤 플라즈마 생성 장치를 이용한 기재의 표면 세정 시스템 및 방법
DE102020124022A1 (de) * 2020-09-15 2022-03-17 centrotherm international AG Werkstückträger, System und Betriebsverfahren für PECVD
DE102021118156A1 (de) 2021-07-14 2023-01-19 Rolls-Royce Deutschland Ltd & Co Kg Verfahren zur Oberflächenbehandlung eines Drahtes, eine supraleitende Vorrichtung, eine elektrische Maschine, ein Luftfahrzeug und eine Oberflächenbehandlungsvorrichtung
CN121491137A (zh) * 2025-12-17 2026-02-10 太原理工大学 一种超声振动-脉冲电流多能场辅助的极薄带轧制装置

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US3050616A (en) * 1957-09-09 1962-08-21 Union Carbide Corp Arc process and apparatus
FR2039566A5 (de) * 1969-03-31 1971-01-15 Soudure Autogene Elect
US3940641A (en) * 1974-04-05 1976-02-24 Reynolds Metals Company Plasma jet electrode for magnetohydrodynamic generators
GB1493394A (en) * 1974-06-07 1977-11-30 Nat Res Dev Plasma heater assembly
US5548611A (en) * 1993-05-19 1996-08-20 Schuller International, Inc. Method for the melting, combustion or incineration of materials and apparatus therefor
JP3204801B2 (ja) * 1993-06-18 2001-09-04 富士写真フイルム株式会社 真空グロー放電処理装置及び処理方法
WO1997018694A1 (fr) * 1995-11-13 1997-05-22 Ist Instant Surface Technology S.A. Reacteur a jet de plasma
EP0861575B1 (de) * 1995-11-13 2000-07-05 IST Instant Surface Technology S.A. Vierdüsen-plasmaerzeugungsvorrichtung zur erzeugung eines aktivierter strahles
DE69610221T2 (de) 1995-11-13 2001-04-26 Tepla Ag Plasmalichtbogenstrom-erzeugungsvorrichtung mit geschlossener konfiguration
JPH11106947A (ja) 1997-09-29 1999-04-20 Nkk Corp 金属板の表面改質方法
JPH11222530A (ja) * 1998-02-06 1999-08-17 Nitto Denko Corp フッ素樹脂被覆金属線の製造方法

Also Published As

Publication number Publication date
US20040026385A1 (en) 2004-02-12
EA200300416A1 (ru) 2003-10-30
WO2002039791A1 (fr) 2002-05-16
EP1332650B1 (de) 2006-01-04
EP1613133A3 (de) 2011-04-27
CN1265684C (zh) 2006-07-19
BR0115035A (pt) 2004-02-03
CA2424891A1 (fr) 2002-05-16
DE60116522T2 (de) 2006-08-03
EP1613133B1 (de) 2013-01-16
US6949716B2 (en) 2005-09-27
DE60116522D1 (de) 2006-03-30
CN1471800A (zh) 2004-01-28
AU2002212616A1 (en) 2002-05-21
EA004439B1 (ru) 2004-04-29
JP2004514054A (ja) 2004-05-13
EP1332650A1 (de) 2003-08-06
EP1613133A2 (de) 2006-01-04
UA75613C2 (en) 2006-05-15

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