ATE319184T1 - Verfahren und gerät zur plasmadotierung durch pulsieren der anode - Google Patents

Verfahren und gerät zur plasmadotierung durch pulsieren der anode

Info

Publication number
ATE319184T1
ATE319184T1 AT02782242T AT02782242T ATE319184T1 AT E319184 T1 ATE319184 T1 AT E319184T1 AT 02782242 T AT02782242 T AT 02782242T AT 02782242 T AT02782242 T AT 02782242T AT E319184 T1 ATE319184 T1 AT E319184T1
Authority
AT
Austria
Prior art keywords
plasma doping
chamber
mode
anode
plasma
Prior art date
Application number
AT02782242T
Other languages
English (en)
Inventor
Steven R Walther
Bjorn O Pedersen
Original Assignee
Varian Semiconductor Equipment
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Semiconductor Equipment filed Critical Varian Semiconductor Equipment
Application granted granted Critical
Publication of ATE319184T1 publication Critical patent/ATE319184T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
AT02782242T 2001-10-26 2002-10-25 Verfahren und gerät zur plasmadotierung durch pulsieren der anode ATE319184T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/005,613 US20030079688A1 (en) 2001-10-26 2001-10-26 Methods and apparatus for plasma doping by anode pulsing

Publications (1)

Publication Number Publication Date
ATE319184T1 true ATE319184T1 (de) 2006-03-15

Family

ID=21716757

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02782242T ATE319184T1 (de) 2001-10-26 2002-10-25 Verfahren und gerät zur plasmadotierung durch pulsieren der anode

Country Status (8)

Country Link
US (1) US20030079688A1 (de)
EP (1) EP1438735B1 (de)
JP (1) JP4443925B2 (de)
KR (1) KR101034422B1 (de)
AT (1) ATE319184T1 (de)
DE (1) DE60209532D1 (de)
TW (1) TW567542B (de)
WO (1) WO2003036681A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7838842B2 (en) * 1999-12-13 2010-11-23 Semequip, Inc. Dual mode ion source for ion implantation
US20030116089A1 (en) * 2001-12-04 2003-06-26 Walther Steven R. Plasma implantation system and method with target movement
US20060236931A1 (en) * 2005-04-25 2006-10-26 Varian Semiconductor Equipment Associates, Inc. Tilted Plasma Doping
CN101160643B (zh) * 2005-05-12 2012-04-18 松下电器产业株式会社 等离子体掺入方法和等离子体掺入设备
US20070170867A1 (en) * 2006-01-24 2007-07-26 Varian Semiconductor Equipment Associates, Inc. Plasma Immersion Ion Source With Low Effective Antenna Voltage
US20080132046A1 (en) * 2006-12-04 2008-06-05 Varian Semiconductor Equipment Associates, Inc. Plasma Doping With Electronically Controllable Implant Angle
US20080169183A1 (en) * 2007-01-16 2008-07-17 Varian Semiconductor Equipment Associates, Inc. Plasma Source with Liner for Reducing Metal Contamination
US7820533B2 (en) * 2007-02-16 2010-10-26 Varian Semiconductor Equipment Associates, Inc. Multi-step plasma doping with improved dose control
US20090084987A1 (en) * 2007-09-28 2009-04-02 Varian Semiconductor Equipment Associates, Inc. Charge neutralization in a plasma processing apparatus
US7812321B2 (en) * 2008-06-11 2010-10-12 Varian Semiconductor Equipment Associates, Inc. Techniques for providing a multimode ion source

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3908183A (en) * 1973-03-14 1975-09-23 California Linear Circuits Inc Combined ion implantation and kinetic transport deposition process
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
US4283631A (en) * 1980-02-22 1981-08-11 Varian Associates, Inc. Bean scanning and method of use for ion implantation
US4922106A (en) * 1986-04-09 1990-05-01 Varian Associates, Inc. Ion beam scanning method and apparatus
US4899059A (en) * 1988-05-18 1990-02-06 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
US5452177A (en) * 1990-06-08 1995-09-19 Varian Associates, Inc. Electrostatic wafer clamp
US5350926A (en) * 1993-03-11 1994-09-27 Diamond Semiconductor Group, Inc. Compact high current broad beam ion implanter
US5354381A (en) * 1993-05-07 1994-10-11 Varian Associates, Inc. Plasma immersion ion implantation (PI3) apparatus
US5529657A (en) * 1993-10-04 1996-06-25 Tokyo Electron Limited Plasma processing apparatus
TW299559B (de) * 1994-04-20 1997-03-01 Tokyo Electron Co Ltd
US5711812A (en) * 1995-06-06 1998-01-27 Varian Associates, Inc. Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processes
US5911832A (en) * 1996-10-10 1999-06-15 Eaton Corporation Plasma immersion implantation with pulsed anode
US6111260A (en) * 1997-06-10 2000-08-29 Advanced Micro Devices, Inc. Method and apparatus for in situ anneal during ion implant
US6153524A (en) * 1997-07-29 2000-11-28 Silicon Genesis Corporation Cluster tool method using plasma immersion ion implantation
US6020592A (en) * 1998-08-03 2000-02-01 Varian Semiconductor Equipment Associates, Inc. Dose monitor for plasma doping system
US6182604B1 (en) * 1999-10-27 2001-02-06 Varian Semiconductor Equipment Associates, Inc. Hollow cathode for plasma doping system

Also Published As

Publication number Publication date
WO2003036681A3 (en) 2003-10-30
US20030079688A1 (en) 2003-05-01
EP1438735A2 (de) 2004-07-21
EP1438735B1 (de) 2006-03-01
JP2005507168A (ja) 2005-03-10
JP4443925B2 (ja) 2010-03-31
KR20040041707A (ko) 2004-05-17
KR101034422B1 (ko) 2011-05-12
WO2003036681A2 (en) 2003-05-01
TW567542B (en) 2003-12-21
DE60209532D1 (de) 2006-04-27

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Legal Events

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