ATE328135T1 - Anlage zum beschichten von werkstücken durch elektronenstrahlen - Google Patents

Anlage zum beschichten von werkstücken durch elektronenstrahlen

Info

Publication number
ATE328135T1
ATE328135T1 AT03293346T AT03293346T ATE328135T1 AT E328135 T1 ATE328135 T1 AT E328135T1 AT 03293346 T AT03293346 T AT 03293346T AT 03293346 T AT03293346 T AT 03293346T AT E328135 T1 ATE328135 T1 AT E328135T1
Authority
AT
Austria
Prior art keywords
conic
pinions
pinion
electron beams
holding
Prior art date
Application number
AT03293346T
Other languages
English (en)
Inventor
Mikola Hrechaniuk
Pavlo Koucherenko
Original Assignee
Gba S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gba S A filed Critical Gba S A
Application granted granted Critical
Publication of ATE328135T1 publication Critical patent/ATE328135T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Spray Control Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
AT03293346T 2003-09-23 2003-12-29 Anlage zum beschichten von werkstücken durch elektronenstrahlen ATE328135T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH16232003 2003-09-23

Publications (1)

Publication Number Publication Date
ATE328135T1 true ATE328135T1 (de) 2006-06-15

Family

ID=34280717

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03293346T ATE328135T1 (de) 2003-09-23 2003-12-29 Anlage zum beschichten von werkstücken durch elektronenstrahlen

Country Status (7)

Country Link
US (1) US6923868B2 (de)
EP (1) EP1520914B1 (de)
CN (1) CN1600894A (de)
AT (1) ATE328135T1 (de)
CA (1) CA2451682C (de)
DE (1) DE60305704T2 (de)
RU (1) RU2265078C1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101321888B (zh) * 2005-12-05 2015-01-21 株式会社爱发科 真空装置用闸阀
RU2308538C1 (ru) * 2006-06-19 2007-10-20 Общество с ограниченной ответственностью научно-производственная фирма "ЭЛАН-ПРАКТИК" Установка для нанесения многослойных покрытий с периодической структурой методом магнетронного распыления
EP1947210A1 (de) * 2007-01-16 2008-07-23 ARCELOR France Verfahren zur Beschichtung eines Substrats, Anlage zur Umsetzung des Verfahrens und Vorrichtung zur Metallzuführung zu einer solchen Anlage
US7997227B2 (en) * 2007-03-13 2011-08-16 General Electric Company Vacuum coater device and mechanism for supporting and manipulating workpieces in same
RU2391443C2 (ru) * 2008-06-17 2010-06-10 Лев Викторович Мисожников Установка для нанесения покрытий в вакууме
CN101619446A (zh) 2008-06-30 2010-01-06 鸿富锦精密工业（深圳）有限公司 镀膜蒸发载具及使用该镀膜蒸发载具的真空镀膜装置
RU2404285C1 (ru) * 2009-10-22 2010-11-20 Закрытое акционерное общество "Специальное Конструкторско-Технологическое Бюро КАСКАД" (ЗАО "СКТБ КАСКАД") Установка для нанесения покрытий в вакууме
CN102108486B (zh) * 2009-12-28 2014-04-23 鸿富锦精密工业（深圳）有限公司 镀膜机
RU2437964C2 (ru) * 2010-01-11 2011-12-27 Вера Дмитриевна Мирошникова Подложкодержатель и установка для нанесения покрытий методом магнетронного распыления на его основе
DE102010017895A1 (de) * 2010-04-21 2011-10-27 Ald Vacuum Technologies Gmbh Vorrichtung zum Beschichten von Substraten nach dem EB/PVD-Verfahren
SG10201601693VA (en) * 2011-03-17 2016-04-28 Sulzer Metco Ag Component manipulator for the dynamic positioning of a substrate, coating method, as well as use of a component manipulator
RU2543023C2 (ru) * 2012-10-01 2015-02-27 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Владимирский государственный университет имени Александра Григорьевича и Николая Григорьевича Столетовых" (ВлГУ) Роторный подложкодержатель
CN104511390A (zh) * 2013-10-04 2015-04-15 宁夏中远天晟科技有限公司 一种铁路车钩配件的油漆喷涂设备
KR101642188B1 (ko) * 2014-08-19 2016-07-22 재단법인 하이브리드 인터페이스기반 미래소재 연구단 구조물의 균일 증착을 위하여 비틀림각을 연출하는 지그시스템
RU172351U1 (ru) * 2017-04-17 2017-07-05 Федеральное государственное бюджетное образовательное учреждение высшего образования "Томский государственный университет систем управления и радиоэлектроники" Устройство для электронно-лучевого осаждения оксидных покрытий
CN107130213B (zh) * 2017-05-03 2019-04-09 成都真锐科技涂层技术有限公司 多元合金复合薄膜制备设备和制备方法
RU2669953C1 (ru) * 2017-08-29 2018-10-17 Публичное акционерное общество "Региональный инжиниринговый центр промышленных лазерных технологий "КАИ - Лазер" Устройство для гибридного лазерно-акустического создания функционально-градиентного материала
RU2680115C1 (ru) * 2017-11-13 2019-02-15 Публичное акционерное общество "Уфимское моторостроительное производственное объединение" (ПАО "ОДК-УМПО") Способ нанесения покрытия на лопатки газотурбинного двигателя
CN121344511B (zh) * 2025-12-19 2026-03-03 北矿新材科技有限公司 一种高抗热震拱形陶瓷涂层零件及其制备方法和航空发动机

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US3656454A (en) * 1970-11-23 1972-04-18 Air Reduction Vacuum coating apparatus
US3812486A (en) 1972-04-18 1974-05-21 Antolelic Ind Ltd Display having a photoconductor gas discharge control
FR2183603B1 (de) 1972-05-12 1974-08-30 Cit Alcatel
CH580990A5 (de) 1974-03-04 1976-10-29 Ebauches Sa
JPS5247530A (en) * 1975-10-14 1977-04-15 Pioneer Electronic Corp Vaporisation apparatus
US4108107A (en) * 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
DE2813180C2 (de) 1978-03-25 1985-12-19 Leybold-Heraeus GmbH, 5000 Köln Vakuumbeschichtungsanlage zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Materialstrom
FR2644180B1 (fr) * 1989-03-08 1991-05-10 Commissariat Energie Atomique Dispositif pour recouvrir une surface plane d'une couche d'epaisseur uniforme
RU2038417C1 (ru) * 1992-06-22 1995-06-27 Бурков Сергей Геннадьевич Устройство для нанесения покрытий на изделия в вакууме
US6083322A (en) * 1997-03-06 2000-07-04 United Technologies Corporation Modular coating fixture
FR2827307B1 (fr) * 2001-07-12 2004-07-16 Snecma Moteurs Procede de reparation locale de pieces revetues d'une barriere thermique en ceramique
US7754016B2 (en) * 2002-10-07 2010-07-13 United Technologies Corporation Multiple axis tumbler coating apparatus

Also Published As

Publication number Publication date
CA2451682C (fr) 2007-03-20
EP1520914B1 (de) 2006-05-31
CA2451682A1 (fr) 2005-03-23
RU2265078C1 (ru) 2005-11-27
DE60305704T2 (de) 2007-03-29
CN1600894A (zh) 2005-03-30
DE60305704D1 (de) 2006-07-06
US20050061250A1 (en) 2005-03-24
EP1520914A1 (de) 2005-04-06
RU2004112868A (ru) 2005-10-27
US6923868B2 (en) 2005-08-02

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