ATE330976T1 - Reinigungsverfahren - Google Patents

Reinigungsverfahren

Info

Publication number
ATE330976T1
ATE330976T1 AT00992477T AT00992477T ATE330976T1 AT E330976 T1 ATE330976 T1 AT E330976T1 AT 00992477 T AT00992477 T AT 00992477T AT 00992477 T AT00992477 T AT 00992477T AT E330976 T1 ATE330976 T1 AT E330976T1
Authority
AT
Austria
Prior art keywords
cleaning procedure
polymer
partitioning
polymers
improving
Prior art date
Application number
AT00992477T
Other languages
English (en)
Inventor
Michael Thomas Sheehan
James Ralph Sounik
Keith Michell Russ
Original Assignee
Triquest L P
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triquest L P filed Critical Triquest L P
Application granted granted Critical
Publication of ATE330976T1 publication Critical patent/ATE330976T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/06—Treatment of polymer solutions
    • C08F6/12—Separation of polymers from solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/06—Treatment of polymer solutions
    • C08F6/10—Removal of volatile materials, e.g. solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Glass Compositions (AREA)
  • Gas Separation By Absorption (AREA)
  • Water Treatment By Sorption (AREA)
  • Steering Control In Accordance With Driving Conditions (AREA)
AT00992477T 1999-11-12 2000-10-23 Reinigungsverfahren ATE330976T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44002399A 1999-11-12 1999-11-12
US09/667,856 US6414110B1 (en) 1999-11-12 2000-09-20 Purification means

Publications (1)

Publication Number Publication Date
ATE330976T1 true ATE330976T1 (de) 2006-07-15

Family

ID=27032263

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00992477T ATE330976T1 (de) 1999-11-12 2000-10-23 Reinigungsverfahren

Country Status (7)

Country Link
US (1) US6414110B1 (de)
EP (1) EP1228103B1 (de)
AT (1) ATE330976T1 (de)
AU (1) AU4503501A (de)
DE (1) DE60028997T2 (de)
TW (1) TW526212B (de)
WO (1) WO2001040321A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6787611B2 (en) * 2000-06-27 2004-09-07 Chemfirst Electronic Materials L.P. Purification means
US6593431B2 (en) * 2000-06-27 2003-07-15 Chemfirst Electronic Materials Lp Purification means
US6761824B2 (en) 2000-08-17 2004-07-13 Reeve Lorraine E Process for the fractionation of polymers
US6864324B2 (en) * 2002-04-19 2005-03-08 Chem First Electronic Materials L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
US20040242798A1 (en) * 2003-05-08 2004-12-02 Sounik James R. Photoresist compositions and processes for preparing the same
US7834113B2 (en) * 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
KR101129948B1 (ko) 2003-12-16 2012-03-26 듀퐁 일렉트로닉 폴리머스 엘피 중합체 정제방법
CN101395189B (zh) 2006-03-31 2013-07-17 Jsr株式会社 含氟聚合物及其精制方法以及感放射线性树脂组合物
US12607933B2 (en) 2022-10-20 2026-04-21 Dupont Electronics, Inc. Polymer compositions having photoacid generators and photoresists

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01278503A (ja) * 1988-05-02 1989-11-08 Tonen Sekiyukagaku Kk ポリ（２‐ヒドロキシスチレン）及びその製造法
US5087772A (en) * 1990-11-16 1992-02-11 Hoechst Celanese Corporation Method for preparing 4-hydroxystyrene
US6027853A (en) * 1998-01-16 2000-02-22 Olin Microelectronic Chemicals, Inc. Process for preparing a radiation-sensitive composition
US5945251A (en) * 1998-05-08 1999-08-31 Olin Corporation Process for producing purified solutions of blocked polyhydroxystyrene resins

Also Published As

Publication number Publication date
WO2001040321A3 (en) 2002-05-10
AU4503501A (en) 2001-06-12
TW526212B (en) 2003-04-01
EP1228103B1 (de) 2006-06-21
WO2001040321A2 (en) 2001-06-07
DE60028997D1 (de) 2006-08-03
EP1228103A2 (de) 2002-08-07
DE60028997T2 (de) 2007-01-11
US6414110B1 (en) 2002-07-02

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Legal Events

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