ATE332517T1 - Form zur nanobedruckung - Google Patents

Form zur nanobedruckung

Info

Publication number
ATE332517T1
ATE332517T1 AT01942726T AT01942726T ATE332517T1 AT E332517 T1 ATE332517 T1 AT E332517T1 AT 01942726 T AT01942726 T AT 01942726T AT 01942726 T AT01942726 T AT 01942726T AT E332517 T1 ATE332517 T1 AT E332517T1
Authority
AT
Austria
Prior art keywords
mold
layer
reaction
nanoprinting
metal
Prior art date
Application number
AT01942726T
Other languages
English (en)
Inventor
Torbjoern Ling
Lars Montelius
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0000173A external-priority patent/SE517093C2/sv
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE332517T1 publication Critical patent/ATE332517T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT01942726T 2000-01-21 2001-01-19 Form zur nanobedruckung ATE332517T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17728400P 2000-01-21 2000-01-21
SE0000173A SE517093C2 (sv) 2000-01-21 2000-01-21 Form för nanoprägling

Publications (1)

Publication Number Publication Date
ATE332517T1 true ATE332517T1 (de) 2006-07-15

Family

ID=26654958

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01942726T ATE332517T1 (de) 2000-01-21 2001-01-19 Form zur nanobedruckung

Country Status (6)

Country Link
US (1) US6923930B2 (de)
EP (1) EP1257878B1 (de)
AT (1) ATE332517T1 (de)
AU (1) AU2001228987A1 (de)
DE (1) DE60121302T2 (de)
WO (1) WO2001053889A1 (de)

Families Citing this family (77)

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EP1303792B1 (de) 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System Hoch auflösende ausrichtungsverfahren und entsprechende systeme für die präge-lithographie
AU2001277907A1 (en) 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
CN1696826A (zh) 2000-08-01 2005-11-16 得克萨斯州大学系统董事会 用对激活光透明的模板在衬底上形成图案的方法及半导体器件
KR101031528B1 (ko) 2000-10-12 2011-04-27 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
SE519573C2 (sv) * 2001-07-05 2003-03-11 Obducat Ab Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
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US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
CN100473535C (zh) * 2002-11-21 2009-04-01 科学和工业研究协会 在玻璃和塑料基底上的彩色纳米平版印刷术
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US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
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EP1533657B1 (de) * 2003-11-21 2011-03-09 Obducat AB Nanoimprint Lithographie in Mehrschichtsystemem
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US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
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US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
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US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
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US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
KR20070119624A (ko) * 2005-02-03 2007-12-20 유니버시티 오브 노스캐롤라이나 앳 채플 힐 액정 디스플레이에서 사용되는 낮은 표면 에너지 고분자물질
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
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US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
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JP5456465B2 (ja) * 2007-06-04 2014-03-26 丸善石油化学株式会社 微細加工品およびその製造方法
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Also Published As

Publication number Publication date
AU2001228987A1 (en) 2001-07-31
DE60121302T2 (de) 2007-06-28
EP1257878A1 (de) 2002-11-20
WO2001053889A1 (en) 2001-07-26
US20030127580A1 (en) 2003-07-10
DE60121302D1 (de) 2006-08-17
US6923930B2 (en) 2005-08-02
EP1257878B1 (de) 2006-07-05

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