ATE332517T1 - Form zur nanobedruckung - Google Patents

Form zur nanobedruckung

Info

Publication number
ATE332517T1
ATE332517T1 AT01942726T AT01942726T ATE332517T1 AT E332517 T1 ATE332517 T1 AT E332517T1 AT 01942726 T AT01942726 T AT 01942726T AT 01942726 T AT01942726 T AT 01942726T AT E332517 T1 ATE332517 T1 AT E332517T1
Authority
AT
Austria
Prior art keywords
mold
layer
reaction
nanoprinting
metal
Prior art date
Application number
AT01942726T
Other languages
English (en)
Inventor
Torbjoern Ling
Lars Montelius
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0000173A external-priority patent/SE517093C2/sv
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE332517T1 publication Critical patent/ATE332517T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
AT01942726T 2000-01-21 2001-01-19 Form zur nanobedruckung ATE332517T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17728400P 2000-01-21 2000-01-21
SE0000173A SE517093C2 (sv) 2000-01-21 2000-01-21 Form för nanoprägling

Publications (1)

Publication Number Publication Date
ATE332517T1 true ATE332517T1 (de) 2006-07-15

Family

ID=26654958

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01942726T ATE332517T1 (de) 2000-01-21 2001-01-19 Form zur nanobedruckung

Country Status (6)

Country Link
US (1) US6923930B2 (de)
EP (1) EP1257878B1 (de)
AT (1) ATE332517T1 (de)
AU (1) AU2001228987A1 (de)
DE (1) DE60121302T2 (de)
WO (1) WO2001053889A1 (de)

Families Citing this family (77)

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JP2004505273A (ja) 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
CN100365507C (zh) 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
SE519573C2 (sv) * 2001-07-05 2003-03-11 Obducat Ab Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
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WO2004000567A1 (en) * 2002-06-20 2003-12-31 Obducat Ab Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
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US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
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US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
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US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
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US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
ATE501464T1 (de) * 2003-11-21 2011-03-15 Obducat Ab Nanoimprint lithographie in mehrschichtsystemem
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
MXPA06006738A (es) * 2003-12-19 2006-08-31 Univ North Carolina Metodos para fabricar micro- y nano-estructuras aisladas utilizando litografia suave o de impresion.
KR100595515B1 (ko) * 2003-12-31 2006-07-03 엘지전자 주식회사 미세 구조물 성형용 금형 및 미세 구조 성형용 금형의단층막 이형제 코팅 방법
DE102004002851A1 (de) * 2004-01-19 2005-08-11 Maschinenfabrik Rieter Ag Vliesführungseinrichtung einer Kämmmaschine
AU2005220150A1 (en) * 2004-02-13 2005-09-15 The University Of North Carolina At Chapel Hill Functional materials and novel methods for the fabrication of microfluidic devices
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
EP1600811A1 (de) * 2004-05-28 2005-11-30 Obducat AB Modifizierte Metallformen für Imprint-Verfahren
ATE413632T1 (de) * 2004-05-28 2008-11-15 Obducat Ab Modifizierte metallform zur verwendung bei druckprozessen
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US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
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US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
EP1853967A4 (de) * 2005-02-03 2009-11-11 Univ North Carolina Polymermaterial mit niedriger oberflächenenergie zur verwendung in flüssigkristallanzeigen
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
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US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
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US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
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US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US7388661B2 (en) * 2006-10-20 2008-06-17 Hewlett-Packard Development Company, L.P. Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS)
US7391511B1 (en) 2007-01-31 2008-06-24 Hewlett-Packard Development Company, L.P. Raman signal-enhancing structures and Raman spectroscopy systems including such structures
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JP5456465B2 (ja) * 2007-06-04 2014-03-26 丸善石油化学株式会社 微細加工品およびその製造方法
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
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Also Published As

Publication number Publication date
DE60121302T2 (de) 2007-06-28
WO2001053889A1 (en) 2001-07-26
EP1257878A1 (de) 2002-11-20
US20030127580A1 (en) 2003-07-10
EP1257878B1 (de) 2006-07-05
AU2001228987A1 (en) 2001-07-31
DE60121302D1 (de) 2006-08-17
US6923930B2 (en) 2005-08-02

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