ATE332575T1 - Herstellungsverfahren einer photoelektrischen dünnschicht-umwandlungsanordnung aus amorphem silizium - Google Patents

Herstellungsverfahren einer photoelektrischen dünnschicht-umwandlungsanordnung aus amorphem silizium

Info

Publication number
ATE332575T1
ATE332575T1 AT99307040T AT99307040T ATE332575T1 AT E332575 T1 ATE332575 T1 AT E332575T1 AT 99307040 T AT99307040 T AT 99307040T AT 99307040 T AT99307040 T AT 99307040T AT E332575 T1 ATE332575 T1 AT E332575T1
Authority
AT
Austria
Prior art keywords
gas
photoelectric conversion
amorphous silicon
thin film
type
Prior art date
Application number
AT99307040T
Other languages
English (en)
Inventor
Masashi Yoshimi
Kenji Yamamoto
Original Assignee
Kaneka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12851221&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE332575(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kaneka Corp filed Critical Kaneka Corp
Application granted granted Critical
Publication of ATE332575T1 publication Critical patent/ATE332575T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17—Photovoltaic cells having only PIN junction potential barriers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
AT99307040T 1999-02-26 1999-09-03 Herstellungsverfahren einer photoelektrischen dünnschicht-umwandlungsanordnung aus amorphem silizium ATE332575T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11050152A JP3046965B1 (ja) 1999-02-26 1999-02-26 非晶質シリコン系薄膜光電変換装置の製造方法

Publications (1)

Publication Number Publication Date
ATE332575T1 true ATE332575T1 (de) 2006-07-15

Family

ID=12851221

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99307040T ATE332575T1 (de) 1999-02-26 1999-09-03 Herstellungsverfahren einer photoelektrischen dünnschicht-umwandlungsanordnung aus amorphem silizium

Country Status (6)

Country Link
US (1) US6326304B1 (de)
EP (1) EP1032054B1 (de)
JP (1) JP3046965B1 (de)
AT (1) ATE332575T1 (de)
AU (1) AU761280B2 (de)
DE (1) DE69932227T2 (de)

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JP2004095953A (ja) * 2002-09-02 2004-03-25 Canon Inc 窒化シリコンの堆積膜形成方法
JP2007208093A (ja) 2006-02-03 2007-08-16 Canon Inc 堆積膜の形成方法及び光起電力素子の形成方法
UA81965C2 (xx) * 2006-02-14 2008-02-25 Александра Николаевна Шмирева Інтегральний тонкоплівковий фотомодуль$интегральный тонкопленочный модуль
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JP2008115460A (ja) * 2006-10-12 2008-05-22 Canon Inc 半導体素子の形成方法及び光起電力素子の形成方法
US7501305B2 (en) 2006-10-23 2009-03-10 Canon Kabushiki Kaisha Method for forming deposited film and photovoltaic element
US8203071B2 (en) * 2007-01-18 2012-06-19 Applied Materials, Inc. Multi-junction solar cells and methods and apparatuses for forming the same
US7582515B2 (en) * 2007-01-18 2009-09-01 Applied Materials, Inc. Multi-junction solar cells and methods and apparatuses for forming the same
US20080173350A1 (en) * 2007-01-18 2008-07-24 Applied Materials, Inc. Multi-junction solar cells and methods and apparatuses for forming the same
US20080245414A1 (en) * 2007-04-09 2008-10-09 Shuran Sheng Methods for forming a photovoltaic device with low contact resistance
US7875486B2 (en) 2007-07-10 2011-01-25 Applied Materials, Inc. Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning
US20090104733A1 (en) * 2007-10-22 2009-04-23 Yong Kee Chae Microcrystalline silicon deposition for thin film solar applications
WO2009059238A1 (en) 2007-11-02 2009-05-07 Applied Materials, Inc. Plasma treatment between deposition processes
US7833885B2 (en) 2008-02-11 2010-11-16 Applied Materials, Inc. Microcrystalline silicon thin film transistor
US8076222B2 (en) * 2008-02-11 2011-12-13 Applied Materials, Inc. Microcrystalline silicon thin film transistor
US7888167B2 (en) * 2008-04-25 2011-02-15 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method for manufacturing the same
JP5377061B2 (ja) * 2008-05-09 2013-12-25 株式会社半導体エネルギー研究所 光電変換装置
US7955890B2 (en) * 2008-06-24 2011-06-07 Applied Materials, Inc. Methods for forming an amorphous silicon film in display devices
US8895842B2 (en) * 2008-08-29 2014-11-25 Applied Materials, Inc. High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells
KR101531700B1 (ko) * 2008-12-01 2015-06-25 주성엔지니어링(주) 박막형 태양전지의 제조방법
JP5379845B2 (ja) * 2009-03-02 2013-12-25 株式会社カネカ 薄膜太陽電池モジュール
JP4712127B2 (ja) * 2009-06-30 2011-06-29 三洋電機株式会社 太陽電池の製造方法及び製造装置
US20110114177A1 (en) * 2009-07-23 2011-05-19 Applied Materials, Inc. Mixed silicon phase film for high efficiency thin film silicon solar cells
WO2011046664A2 (en) * 2009-10-15 2011-04-21 Applied Materials, Inc. A barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells
US20110126875A1 (en) * 2009-12-01 2011-06-02 Hien-Minh Huu Le Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition
US20110232753A1 (en) * 2010-03-23 2011-09-29 Applied Materials, Inc. Methods of forming a thin-film solar energy device
KR20130093490A (ko) * 2010-04-16 2013-08-22 텔 솔라 아게 광전지 적용에서 미정질 물질의 증착 방법 및 장치
US8927857B2 (en) 2011-02-28 2015-01-06 International Business Machines Corporation Silicon: hydrogen photovoltaic devices, such as solar cells, having reduced light induced degradation and method of making such devices
CN103608925B (zh) 2011-07-13 2017-06-13 应用材料公司 制造薄膜晶体管器件的方法
KR20180118803A (ko) 2011-10-07 2018-10-31 어플라이드 머티어리얼스, 인코포레이티드 아르곤 가스 희석으로 실리콘 함유 층을 증착하기 위한 방법들
CN113755816B (zh) * 2021-09-09 2023-12-19 理想万里晖真空装备(泰兴)有限公司 用于改善反应腔粉尘的预镀膜方法及所形成的预镀膜

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Also Published As

Publication number Publication date
EP1032054A2 (de) 2000-08-30
JP2000252484A (ja) 2000-09-14
AU761280B2 (en) 2003-05-29
JP3046965B1 (ja) 2000-05-29
AU4473399A (en) 2000-08-31
EP1032054B1 (de) 2006-07-05
EP1032054A3 (de) 2002-01-30
US6326304B1 (en) 2001-12-04
DE69932227D1 (de) 2006-08-17
DE69932227T2 (de) 2007-06-06

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