ATE332873T1 - Zusammensetzung mit einer oxidierenden und komplexierenden verbindung - Google Patents

Zusammensetzung mit einer oxidierenden und komplexierenden verbindung

Info

Publication number
ATE332873T1
ATE332873T1 AT01271916T AT01271916T ATE332873T1 AT E332873 T1 ATE332873 T1 AT E332873T1 AT 01271916 T AT01271916 T AT 01271916T AT 01271916 T AT01271916 T AT 01271916T AT E332873 T1 ATE332873 T1 AT E332873T1
Authority
AT
Austria
Prior art keywords
oxidizing
compound
complexing
composition containing
complexing compound
Prior art date
Application number
AT01271916T
Other languages
English (en)
Inventor
Rita Vos
Paul Mertens
Albrecht Fester
Oliver Doll
Bernd Kolbesen
Original Assignee
Imec Inter Uni Micro Electr
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec Inter Uni Micro Electr, Air Prod & Chem filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of ATE332873T1 publication Critical patent/ATE332873T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K15/00—Anti-oxidant compositions; Compositions inhibiting chemical change
    • C09K15/04—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds
    • C09K15/30—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds containing heterocyclic ring with at least one nitrogen atom as ring member
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01—Hydrogen peroxide
    • C01B15/037—Stabilisation by additives
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3902—Organic or inorganic per-compounds combined with specific additives
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06L—DRY-CLEANING, WASHING OR BLEACHING FIBRES, FILAMENTS, THREADS, YARNS, FABRICS, FEATHERS OR MADE-UP FIBROUS GOODS; BLEACHING LEATHER OR FURS
    • D06L4/00—Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs
    • D06L4/10—Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs using agents which develop oxygen
    • D06L4/12—Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs using agents which develop oxygen combined with specific additives
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Textile Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AT01271916T 2000-12-22 2001-12-21 Zusammensetzung mit einer oxidierenden und komplexierenden verbindung ATE332873T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25792800P 2000-12-22 2000-12-22

Publications (1)

Publication Number Publication Date
ATE332873T1 true ATE332873T1 (de) 2006-08-15

Family

ID=22978385

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01271916T ATE332873T1 (de) 2000-12-22 2001-12-21 Zusammensetzung mit einer oxidierenden und komplexierenden verbindung

Country Status (11)

Country Link
US (1) US7160482B2 (de)
EP (1) EP1345848B1 (de)
JP (1) JP3958687B2 (de)
KR (1) KR100863159B1 (de)
CN (1) CN100515928C (de)
AT (1) ATE332873T1 (de)
AU (1) AU2002218892A1 (de)
DE (1) DE60121468T2 (de)
IL (1) IL156551A0 (de)
TW (1) TW583310B (de)
WO (1) WO2002051961A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090325362A1 (en) * 2003-01-07 2009-12-31 Nabil Chhaimi Method of recycling an epitaxied donor wafer
DE602004009584T2 (de) * 2003-06-27 2008-08-07 Interuniversitair Microelektronica Centrum (Imec) Halbleiterreinigungslösung
WO2006081406A1 (en) * 2005-01-27 2006-08-03 Advanced Technology Materials, Inc. Compositions for processing of semiconductor substrates
WO2006125462A1 (en) * 2005-05-25 2006-11-30 Freescale Semiconductor, Inc Cleaning solution for a semiconductor wafer
US8034227B2 (en) * 2005-06-30 2011-10-11 Akzo Nobel N.V. Chemical process
US20070012578A1 (en) * 2005-06-30 2007-01-18 Akzo Nobel N.V. Chemical process
SG10201508243UA (en) * 2005-10-05 2015-11-27 Entegris Inc Oxidizing aqueous cleaner for the removal of post-etch residues
GB0520380D0 (en) 2005-10-07 2005-11-16 Unilever Plc Stain removal
KR100663375B1 (ko) * 2006-01-18 2007-01-02 삼성전자주식회사 금속질화막을 게이트전극으로 채택하는 반도체소자의제조방법
DE602006014551D1 (de) * 2006-10-31 2010-07-08 Soitec Silicon On Insulator Verfahren zur Charakterisierung von Defekten auf Silizium-Oberflächen, Ätzlösung für Silizium-Oberflächen und Verfahren zur Behandlung von Silizium-Oberflächen mit der Ätzlösung
CN101270325A (zh) * 2007-03-23 2008-09-24 安集微电子（上海）有限公司 一种清洗液及其应用
TWI426125B (zh) * 2007-11-20 2014-02-11 Anji Microelectronics Co Ltd 清洗液及其應用
CN102051836A (zh) * 2009-10-29 2011-05-11 海茂株式会社 纸浆制造排水的处理方法
US9090467B2 (en) 2010-07-27 2015-07-28 Clariant Finance (Bvi) Limited Method of stabilizing hydrogen peroxide or hydrogen peroxide donor substances with hydroxypyridones or salts therof
MX2013001095A (es) * 2010-07-27 2013-03-12 Clariant Finance Bvi Ltd Composiciones que comprenden peroxido de hidrogeno o sustancias donadoras de peroxido de hidrogeno.
US20120295447A1 (en) * 2010-11-24 2012-11-22 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
DE102010054866A1 (de) * 2010-12-17 2011-08-18 Clariant International Ltd. Zusammensetzungen enthaltend Wasserstoffperoxid oder Wasserstoffperoxid freisetzende Substanzen
EP2697352A1 (de) * 2011-04-12 2014-02-19 The Procter and Gamble Company Metallbleichkatalysatoren
US9443739B2 (en) * 2011-08-01 2016-09-13 Basf Se Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound
PL2744881T3 (pl) 2011-08-15 2016-07-29 Procter & Gamble Kompozycja detergentowa zawierająca związki pirydynol-n-tlenków
DE102013217034A1 (de) * 2013-08-27 2015-03-05 Henkel Ag & Co. Kgaa Wasch- und Reinigungsmittel mit verbesserter Leistung
CN107076716A (zh) * 2015-01-14 2017-08-18 栗田工业株式会社 氧化剂浓度的测定方法及测定装置以及电子材料洗净装置
EP3274699B1 (de) * 2015-03-26 2023-12-20 Life Technologies Corporation Verfahren zur behandlung von fet-sensorarrays und resultierenden sensorvorrichtungen
CN110965086A (zh) * 2019-11-21 2020-04-07 武汉奥邦表面技术有限公司 一种酸性镀锌除杂剂及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2624655A (en) * 1949-10-13 1953-01-06 Buffalo Electro Chem Co Stable aqueous hydrogen peroxide and method of preparing same
US3903244A (en) 1973-02-02 1975-09-02 Fmc Corp Stabilized hydrogen peroxide
US4239643A (en) 1979-01-02 1980-12-16 Monsanto Company Peroxide stabilization
GB8308054D0 (en) * 1983-03-24 1983-05-05 Hider R C Pharmaceutical compositions
CA2059841A1 (en) 1991-01-24 1992-07-25 Ichiro Hayashida Surface treating solutions and cleaning method
JP3075290B2 (ja) 1991-02-28 2000-08-14 三菱瓦斯化学株式会社 半導体基板の洗浄液
GB9217099D0 (en) 1992-08-12 1992-09-23 British Tech Group Pharmaceutical compositions
US5419847A (en) * 1993-05-13 1995-05-30 The Procter & Gamble Company Translucent, isotropic aqueous liquid bleach composition
DE19631363C1 (de) * 1996-08-02 1998-02-12 Siemens Ag Wässrige Reinigungslösung für ein Halbleitersubstrat
EP1006112A1 (de) * 1998-12-01 2000-06-07 Cerebrus Pharmaceuticals Limited 3-Hydroxy-2(1H)-pyridinon- oder 3-hydroxy-4(1H)-pyridinon- Derivate verwendbar als reaktive Sauerstoffspezies-Fänger (ROS)
EP1091395A1 (de) 1999-09-30 2001-04-11 Interuniversitair Microelektronica Centrum Vzw Reinigungslösung für Behandlung von Halbleitersubstraten

Also Published As

Publication number Publication date
US7160482B2 (en) 2007-01-09
AU2002218892A1 (en) 2002-07-08
WO2002051961A2 (en) 2002-07-04
US20050009207A1 (en) 2005-01-13
EP1345848B1 (de) 2006-07-12
KR100863159B1 (ko) 2008-10-13
JP2004534862A (ja) 2004-11-18
DE60121468D1 (de) 2006-08-24
DE60121468T2 (de) 2007-03-29
WO2002051961A3 (en) 2002-10-17
EP1345848A2 (de) 2003-09-24
JP3958687B2 (ja) 2007-08-15
CN100515928C (zh) 2009-07-22
KR20030091950A (ko) 2003-12-03
IL156551A0 (en) 2004-01-04
TW583310B (en) 2004-04-11
CN1486279A (zh) 2004-03-31

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