ATE333113T1 - Photomaskenanordnung, mit einem porösen pellicle- rahmen; und herstellungsmethode desselben. - Google Patents

Photomaskenanordnung, mit einem porösen pellicle- rahmen; und herstellungsmethode desselben.

Info

Publication number
ATE333113T1
ATE333113T1 AT03781312T AT03781312T ATE333113T1 AT E333113 T1 ATE333113 T1 AT E333113T1 AT 03781312 T AT03781312 T AT 03781312T AT 03781312 T AT03781312 T AT 03781312T AT E333113 T1 ATE333113 T1 AT E333113T1
Authority
AT
Austria
Prior art keywords
frame
gel
photomask
production
ppm
Prior art date
Application number
AT03781312T
Other languages
English (en)
Inventor
Rahul Ganguli
Troy Robinson
D Laurence Meixner
Original Assignee
Yazaki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yazaki Corp filed Critical Yazaki Corp
Application granted granted Critical
Publication of ATE333113T1 publication Critical patent/ATE333113T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT03781312T 2002-10-02 2003-09-30 Photomaskenanordnung, mit einem porösen pellicle- rahmen; und herstellungsmethode desselben. ATE333113T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41559802P 2002-10-02 2002-10-02
US41573202P 2002-10-02 2002-10-02
US10/646,356 US7014961B2 (en) 2002-10-02 2003-08-22 Photomask assembly incorporating a porous frame

Publications (1)

Publication Number Publication Date
ATE333113T1 true ATE333113T1 (de) 2006-08-15

Family

ID=32776972

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03781312T ATE333113T1 (de) 2002-10-02 2003-09-30 Photomaskenanordnung, mit einem porösen pellicle- rahmen; und herstellungsmethode desselben.

Country Status (7)

Country Link
US (2) US7014961B2 (de)
EP (1) EP1550002B1 (de)
JP (1) JP2006515932A (de)
AT (1) ATE333113T1 (de)
AU (1) AU2003288923A1 (de)
DE (1) DE60306794T2 (de)
WO (1) WO2004031856A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG141416A1 (en) * 2003-04-30 2008-04-28 Asml Netherlands Bv Lithographic apparatus,device manufacturing methods, mask and method of characterising a mask and/or pellicle
US7110195B2 (en) * 2004-04-28 2006-09-19 International Business Machines Corporation Monolithic hard pellicle
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
EP1879522A2 (de) 2005-04-28 2008-01-23 The Regents of The University of California Zusammensetzungen mit nanostrukturen für das wachstum von zellen, gewebe und künstlichen organen sowie verfahren zu ihrer herstellung und verwendung
DE102005052046A1 (de) * 2005-10-31 2007-05-03 Infineon Technologies Ag Photomaske und Verfahren zur Verwendung der Photomaske in einer Belichtungsanlage
JP2008256925A (ja) * 2007-04-04 2008-10-23 Shin Etsu Chem Co Ltd ペリクル
JP5411595B2 (ja) * 2009-06-24 2014-02-12 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
US20110085968A1 (en) * 2009-10-13 2011-04-14 The Regents Of The University Of California Articles comprising nano-materials for geometry-guided stem cell differentiation and enhanced bone growth
DE102010015884B4 (de) * 2010-03-09 2015-05-28 Kla-Tencor Mie Gmbh Verfahren zur reproduzierbaren Bestimmung der Position von Strukturen auf einer Maske mit Pellicle-Rahmen
CN102436520B (zh) * 2011-09-21 2013-05-08 西安理工大学 二维多孔材料等效弹性模量的计算方法
IN2015DN02055A (de) 2012-09-17 2015-08-14 Grace W R & Co
EP3137209B1 (de) 2014-05-02 2022-10-05 W.R. Grace & CO. - CONN. Funktionalisiertes trägermaterial und verfahren zur herstellung und verwendung eines funktionalisierten trägermaterials
US10494291B2 (en) 2014-10-23 2019-12-03 Corning Incorporated Hygroscopic additives for silica soot compacts and methods for forming optical quality glass
EP3034476A1 (de) * 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung
JP6491472B2 (ja) * 2014-12-25 2019-03-27 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
JP6460778B2 (ja) * 2014-12-25 2019-01-30 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
KR102756848B1 (ko) * 2015-02-03 2025-01-16 에이에스엠엘 네델란즈 비.브이. 마스크 어셈블리 및 연관된 방법
US10793466B2 (en) 2015-02-27 2020-10-06 Corning Incorporated Nanoparticle additives for silica soot compacts and methods for strengthening silica soot compacts
JP6370255B2 (ja) * 2015-04-07 2018-08-08 信越化学工業株式会社 ペリクル用フレーム及びそれを用いたペリクル
KR102401580B1 (ko) * 2015-06-04 2022-05-24 삼성전자주식회사 펠리클 조립체의 제조 방법 및 펠리클 조립체를 포함하는 포토마스크 조립체의 제조 방법
SG10201911134QA (en) 2015-06-05 2020-01-30 Grace W R & Co Adsorbent bioprocessing clarification agents and methods of making and using the same
US9759997B2 (en) 2015-12-17 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle assembly and method for advanced lithography
JP2018010087A (ja) * 2016-07-12 2018-01-18 日本軽金属株式会社 ペリクル枠及びペリクル
TWI742603B (zh) * 2020-04-09 2021-10-11 伊諾司生技股份有限公司 一種具有空腔的感測器

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Publication number Priority date Publication date Assignee Title
US4833051A (en) 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
SG43949A1 (en) * 1987-09-30 1997-11-14 Canon Kk X-ray mask support and process for preparation thereof
JPH03166545A (ja) 1989-11-27 1991-07-18 Hitachi Electron Eng Co Ltd Ｉｃレチクル保護用のペリクル枠
JPH04196117A (ja) 1990-11-26 1992-07-15 Seiko Epson Corp 半導体製造装置
US5344677A (en) 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
US5529819A (en) 1995-04-17 1996-06-25 Inko Industrial Corporation Pellicle assembly with vent structure
US5814381A (en) 1997-04-04 1998-09-29 Inko Industrial Corporation Pellicle assembly having a vented frame
US6099792A (en) 1998-10-07 2000-08-08 Yazaki Corporation Sol-gel process using porous mold
JP2001133960A (ja) 1999-11-08 2001-05-18 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル及びペリクルの使用方法
US6507390B1 (en) * 2000-02-10 2003-01-14 Asml Us, Inc. Method and apparatus for a reticle with purged pellicle-to-reticle gap
JP2002196478A (ja) * 2000-12-27 2002-07-12 Semiconductor Leading Edge Technologies Inc フォトマスクユニット、フォトマスク装置、投影露光装置、投影露光方法及び半導体装置
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
JP2003043670A (ja) * 2001-07-30 2003-02-13 Asahi Glass Co Ltd ペリクル
WO2003080520A1 (en) * 2002-03-15 2003-10-02 Yazaki Corporation Method for making thin fused glass articles
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame

Also Published As

Publication number Publication date
AU2003288923A1 (en) 2004-04-23
EP1550002B1 (de) 2006-07-12
US7014961B2 (en) 2006-03-21
WO2004031856A3 (en) 2004-09-10
WO2004031856A2 (en) 2004-04-15
DE60306794T2 (de) 2007-08-09
US20040151990A1 (en) 2004-08-05
US20060141371A1 (en) 2006-06-29
DE60306794D1 (de) 2006-08-24
AU2003288923A8 (en) 2004-04-23
US7476474B2 (en) 2009-01-13
JP2006515932A (ja) 2006-06-08
EP1550002A2 (de) 2005-07-06

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