ATE337568T1 - Selektive abscheidung eines materials auf ein substrat gemaess eines interferenzmusters - Google Patents

Selektive abscheidung eines materials auf ein substrat gemaess eines interferenzmusters

Info

Publication number
ATE337568T1
ATE337568T1 AT01923075T AT01923075T ATE337568T1 AT E337568 T1 ATE337568 T1 AT E337568T1 AT 01923075 T AT01923075 T AT 01923075T AT 01923075 T AT01923075 T AT 01923075T AT E337568 T1 ATE337568 T1 AT E337568T1
Authority
AT
Austria
Prior art keywords
interference pattern
substrate
substrate according
material onto
selective deposition
Prior art date
Application number
AT01923075T
Other languages
English (en)
Inventor
Robert S Moshrefzadeh
Todd A Ballen
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/542,256 external-priority patent/US6391528B1/en
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE337568T1 publication Critical patent/ATE337568T1/de

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Polarising Elements (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
AT01923075T 2000-04-03 2001-04-02 Selektive abscheidung eines materials auf ein substrat gemaess eines interferenzmusters ATE337568T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/542,256 US6391528B1 (en) 2000-04-03 2000-04-03 Methods of making wire grid optical elements by preferential deposition of material on a substrate
US09/820,299 US20010028925A1 (en) 2000-04-03 2001-03-28 Selective deposition of material on a substrate according to an interference pattern

Publications (1)

Publication Number Publication Date
ATE337568T1 true ATE337568T1 (de) 2006-09-15

Family

ID=27066973

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01923075T ATE337568T1 (de) 2000-04-03 2001-04-02 Selektive abscheidung eines materials auf ein substrat gemaess eines interferenzmusters

Country Status (8)

Country Link
EP (1) EP1269225B1 (de)
JP (1) JP2003529680A (de)
CN (1) CN1241036C (de)
AT (1) ATE337568T1 (de)
AU (1) AU2001249804A1 (de)
DE (1) DE60122482T2 (de)
ES (1) ES2270997T3 (de)
WO (1) WO2001075491A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7001529B2 (en) * 2002-10-18 2006-02-21 Lam Research Corporation Pre-endpoint techniques in photoresist etching
US7368744B2 (en) * 2006-02-17 2008-05-06 Asml Netherlands B.V. Photon sieve for optical systems in micro-lithography
ES2620092T3 (es) * 2007-04-26 2017-06-27 Hyet Energy Systems B.V. Módulo fotovoltaico que comprende una capa con puntos de conducción
SG11201510785PA (en) * 2013-08-08 2016-02-26 Applied Materials Inc Photonic activation of reactants for sub-micron feature formation using depleted beams
CN105695951B (zh) * 2016-04-20 2018-10-02 肖志凯 一种适用于局部生长薄膜和涂层的装置及其应用
CN106947954B (zh) * 2017-04-27 2019-06-18 京东方科技集团股份有限公司 一种气相沉积设备及薄膜的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289381A (en) * 1979-07-02 1981-09-15 Hughes Aircraft Company High selectivity thin film polarizer
FR2542327B1 (de) * 1983-03-07 1986-03-07 Bensoussan Marcel
US4746934A (en) * 1986-07-07 1988-05-24 Tektronix, Inc. Color image copying system using a cathode-ray tube with diffraction grating face plate
JPH0720766A (ja) * 1993-06-29 1995-01-24 Canon Inc ホログラムの作製方法及び表示装置
JP3704843B2 (ja) * 1995-10-24 2005-10-12 凸版印刷株式会社 非接触非破壊の材料評価方法とその装置及び弾性波励起方法と弾性波励起装置
JP3624561B2 (ja) * 1996-03-12 2005-03-02 旭硝子株式会社 光変調素子及び光ヘッド装置
GB2329484A (en) * 1997-09-22 1999-03-24 Northern Telecom Ltd Writing Bragg reflection gratings in optical waveguides

Also Published As

Publication number Publication date
JP2003529680A (ja) 2003-10-07
EP1269225B1 (de) 2006-08-23
EP1269225A1 (de) 2003-01-02
DE60122482D1 (de) 2006-10-05
CN1422388A (zh) 2003-06-04
DE60122482T2 (de) 2007-05-24
AU2001249804A1 (en) 2001-10-15
CN1241036C (zh) 2006-02-08
ES2270997T3 (es) 2007-04-16
WO2001075491A1 (en) 2001-10-11

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Legal Events

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