ATE349558T1 - Elektrodenanordnung, herstellungsverfahren dafür und verwendung davon - Google Patents

Elektrodenanordnung, herstellungsverfahren dafür und verwendung davon

Info

Publication number
ATE349558T1
ATE349558T1 AT02770333T AT02770333T ATE349558T1 AT E349558 T1 ATE349558 T1 AT E349558T1 AT 02770333 T AT02770333 T AT 02770333T AT 02770333 T AT02770333 T AT 02770333T AT E349558 T1 ATE349558 T1 AT E349558T1
Authority
AT
Austria
Prior art keywords
production method
electrode arrangement
surface coating
electrode
pore
Prior art date
Application number
AT02770333T
Other languages
English (en)
Inventor
Atle Mundheim
Lasse Kroknes
Original Assignee
Oro As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oro As filed Critical Oro As
Application granted granted Critical
Publication of ATE349558T1 publication Critical patent/ATE349558T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137—Spraying in vacuum or in an inert atmosphere
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Secondary Cells (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Ceramic Capacitors (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
AT02770333T 2001-10-10 2002-10-08 Elektrodenanordnung, herstellungsverfahren dafür und verwendung davon ATE349558T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NO20014941A NO324550B1 (no) 2001-10-10 2001-10-10 Anordning ved elektrode, fremgangsmate til fremstilling derav samt anvendelse derav

Publications (1)

Publication Number Publication Date
ATE349558T1 true ATE349558T1 (de) 2007-01-15

Family

ID=19912908

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02770333T ATE349558T1 (de) 2001-10-10 2002-10-08 Elektrodenanordnung, herstellungsverfahren dafür und verwendung davon

Country Status (12)

Country Link
US (1) US7374647B2 (de)
EP (1) EP1446516B1 (de)
CN (1) CN100378251C (de)
AT (1) ATE349558T1 (de)
BR (1) BR0213166A (de)
DE (1) DE60217167T2 (de)
DK (1) DK1446516T3 (de)
EA (1) EA007032B1 (de)
ES (1) ES2279886T3 (de)
MX (1) MXPA04003324A (de)
NO (1) NO324550B1 (de)
WO (1) WO2003038155A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20050373A1 (it) * 2005-03-09 2006-09-10 Nora Elettrodi S P A Elettrodo cilindrico
EP1896633A2 (de) * 2005-06-15 2008-03-12 Danfoss A/S Korrosionsbeständiger gegenstand mit aussenschicht aus einem edelmetall
DE102005033836B4 (de) * 2005-07-20 2009-11-19 Institut für Rundfunktechnik GmbH Verfahren zum Weiterleiten von Nutzungsberechtigungsinformationen
CN102033144B (zh) * 2009-09-30 2013-10-23 株式会社神户制钢所 电接点构件
US20140209466A1 (en) 2013-01-31 2014-07-31 Wyatt Technology Corporation Corrosion resistant electrodes for electrophoretic mobility measurements and method for their fabrication
US10819462B2 (en) 2017-10-23 2020-10-27 General Electric Company System and method for protecting communication in time-sensitive networks using shared secret information
US11072356B2 (en) 2016-06-30 2021-07-27 Transportation Ip Holdings, Llc Vehicle control system
US10814893B2 (en) 2016-03-21 2020-10-27 Ge Global Sourcing Llc Vehicle control system
CN110818198B (zh) * 2019-11-26 2022-04-29 重庆龙健金属制造有限公司 一种高盐重金属废水复合处理方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU541149B2 (en) 1979-12-26 1984-12-20 Asahi Kasei Kogyo Kabushiki Kaisha Hydrogen evolution electrode
DE3689059T2 (de) * 1985-08-02 1994-04-21 Daiki Engineering Co Oberflächenaktivierte amorphe Legierungen und übersättigte Legierungen für Elektroden, verwendbar zur Elektrolyse von Lösungen und Verfahren zur Aktivierung der Oberflächen.
US4702813A (en) * 1986-12-16 1987-10-27 The Standard Oil Company Multi-layered amorphous metal-based oxygen anodes
JPH03116490A (ja) * 1989-09-28 1991-05-17 Nec Corp スタティックｒａｍ
JP3044797B2 (ja) * 1991-02-04 2000-05-22 ダイソー株式会社 酸素発生用陽極の製法
GB9224595D0 (en) 1991-12-13 1993-01-13 Ici Plc Cathode for use in electrolytic cell
JP3116490B2 (ja) * 1991-12-24 2000-12-11 ダイソー株式会社 酸素発生用陽極の製法
GB9316926D0 (en) * 1993-08-13 1993-09-29 Ici Plc Electrode
JP3259869B2 (ja) * 1993-08-24 2002-02-25 ペルメレック電極株式会社 電解用電極基体及びその製造方法
JP3259870B2 (ja) * 1993-08-24 2002-02-25 ペルメレック電極株式会社 電解用電極基体及びその製造方法
JPH09125292A (ja) * 1995-11-01 1997-05-13 Permelec Electrode Ltd 電極基体
RU2140466C1 (ru) 1996-04-19 1999-10-27 Седельников Николай Георгиевич Иридиево-титановый электрод и способ его изготовления
JPH10165956A (ja) * 1996-12-16 1998-06-23 Hitachi Plant Eng & Constr Co Ltd 有機成分の除去方法及び装置
JP2001181536A (ja) * 1999-12-22 2001-07-03 Risuisha:Kk 貴金属含有無機質コーティング剤及びコーティング層

Also Published As

Publication number Publication date
EP1446516A1 (de) 2004-08-18
WO2003038155A1 (en) 2003-05-08
DK1446516T3 (da) 2007-05-07
DE60217167D1 (de) 2007-02-08
DE60217167T2 (de) 2007-10-31
NO20014941L (no) 2003-07-14
NO20014941D0 (no) 2001-10-10
US20040251129A1 (en) 2004-12-16
EA200400525A1 (ru) 2004-12-30
MXPA04003324A (es) 2005-01-25
ES2279886T3 (es) 2007-09-01
EP1446516B1 (de) 2006-12-27
CN1585837A (zh) 2005-02-23
EA007032B1 (ru) 2006-06-30
NO324550B1 (no) 2007-11-19
CN100378251C (zh) 2008-04-02
BR0213166A (pt) 2004-09-14
US7374647B2 (en) 2008-05-20

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Legal Events

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