ATE350335T1 - Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride - Google Patents

Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride

Info

Publication number: ATE350335T1
Authority: AT; Austria
Prior art keywords: volatile metal; sulfur; removal; metal hydrides; containing sulfur
Prior art date: 2003-11-19

Application number

AT04027072T

Other languages

English (en)

Inventor

Rajiv K Agarwal

George L Ryals

Wei Cao

John Frederick Cirucci

Robert W Apollo

Daniel Mcnesby

Original Assignee

Air Prod & Chem

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-11-19

Filing date

2004-11-15

Publication date

2007-01-15

2004-11-15 Application filed by Air Prod & Chem filed Critical Air Prod & Chem

2007-01-15 Application granted granted Critical

2007-01-15 Publication of ATE350335T1 publication Critical patent/ATE350335T1/de

Links

239000012535 impurity Substances 0.000 title abstract 6
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title abstract 5
229910052717 sulfur Inorganic materials 0.000 title abstract 5
239000011593 sulfur Substances 0.000 title abstract 5
229910052987 metal hydride Inorganic materials 0.000 title abstract 4
150000004681 metal hydrides Chemical class 0.000 title abstract 4
239000000463 material Substances 0.000 abstract 3
239000013014 purified material Substances 0.000 abstract 2
230000002378 acidificating effect Effects 0.000 abstract 1
239000003463 adsorbent Substances 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
239000000047 product Substances 0.000 abstract 1
238000000746 purification Methods 0.000 abstract 1
239000012264 purified product Substances 0.000 abstract 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C01B6/065—Hydrides of arsenic or antimony
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/48—Sulfur compounds
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/06—Hydrogen phosphides
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/34—Purification; Stabilisation

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Engineering & Computer Science (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Analytical Chemistry (AREA)
Health & Medical Sciences (AREA)
Environmental & Geological Engineering (AREA)
Biomedical Technology (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Gas Separation By Absorption (AREA)
Separation Of Gases By Adsorption (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

AT04027072T 2003-11-19 2004-11-15 Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride ATE350335T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US10/717,050 US7250072B2 (en)	2003-11-19	2003-11-19	Removal of sulfur-containing impurities from volatile metal hydrides

Publications (1)

Publication Number	Publication Date
ATE350335T1 true ATE350335T1 (de)	2007-01-15

Family

ID=34435747

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT04027072T ATE350335T1 (de)	2003-11-19	2004-11-15	Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride

Country Status (8)

Country	Link
US (1)	US7250072B2 (de)
EP (1)	EP1533272B1 (de)
JP (1)	JP4173854B2 (de)
KR (1)	KR100613678B1 (de)
CN (1)	CN1308226C (de)
AT (1)	ATE350335T1 (de)
DE (1)	DE602004004042T2 (de)
TW (1)	TWI297324B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7087102B2 (en) *	2004-02-26	2006-08-08	Air Products And Chemicals, Inc.	Process for purification of germane
WO2007021463A2 (en) *	2005-08-09	2007-02-22	Exxonmobil Research And Engineering Company	Tetraorganoammonium and tetraorganophosphonium salts for acid gas scrubbing process
CN104918679B (zh) *	2012-07-17	2017-03-08	西门子公司	用于吸收二氧化碳的洗涤液和用于通过二氧化锗加速该吸收的方法
CN106215629A (zh) *	2016-08-31	2016-12-14	贵州开磷集团股份有限公司	一种磷酸萃取尾气的洗涤方法和装置
CN107697886B (zh) *	2017-11-10	2020-02-18	中国工程物理研究院材料研究所	一种金属氢化物薄片制备方法
CN115814565B (zh) *	2022-11-30	2024-05-31	攀钢集团攀枝花钢铁研究院有限公司	一种推板窑煅烧制备钒氮合金的钾钠吸收方法及吸收剂

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CS192658B1 (en)	1976-01-22	1979-09-17	Dusan Sichrovsky	Method of preparing high pure arsenic
US4107099A (en) *	1977-02-10	1978-08-15	Ventron Corporation	Borohydride exchange resins and their uses as reducing agents and in preparation of volatile metal hydrides
US4564509A (en)	1983-06-30	1986-01-14	Northeast Semiconductor Inc.	Method and apparatus for improved gettering for reactant gases
JPS6016802A (ja)	1983-07-01	1985-01-28	Olympus Optical Co Ltd	半導体用原料ガスの純化剤およびその使用方法
NZ223528A (en) *	1987-02-19	1991-08-27	Dow Chemical Co	Process and scrubbing solution for removal of h 2 s and/or co 2 from gas streams
US4983363A (en)	1987-03-24	1991-01-08	Advanced Technology Materials, Inc.	Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
JP3105529B2 (ja)	1990-09-17	2000-11-06	日本酸素株式会社	アルシンの精製方法
JP3537484B2 (ja)	1994-03-31	2004-06-14	日本酸素株式会社	ホスフィンの精製方法及びその装置
JPH10130285A (ja)	1996-10-31	1998-05-19	Furukawa Co Ltd	有機金属化合物の精製法
US6461411B1 (en)	2000-12-04	2002-10-08	Matheson Tri-Gas	Method and materials for purifying hydride gases, inert gases, and non-reactive gases

2003
- 2003-11-19 US US10/717,050 patent/US7250072B2/en not_active Expired - Fee Related
2004
- 2004-11-15 DE DE602004004042T patent/DE602004004042T2/de not_active Expired - Fee Related
- 2004-11-15 EP EP04027072A patent/EP1533272B1/de not_active Expired - Lifetime
- 2004-11-15 KR KR1020040093024A patent/KR100613678B1/ko not_active Expired - Fee Related
- 2004-11-15 AT AT04027072T patent/ATE350335T1/de not_active IP Right Cessation
- 2004-11-17 TW TW093135311A patent/TWI297324B/zh not_active IP Right Cessation
- 2004-11-19 JP JP2004335794A patent/JP4173854B2/ja not_active Expired - Fee Related
- 2004-11-19 CN CNB2004101005672A patent/CN1308226C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR100613678B1 (ko)	2006-08-21
DE602004004042D1 (de)	2007-02-15
KR20050048477A (ko)	2005-05-24
CN1636863A (zh)	2005-07-13
EP1533272A1 (de)	2005-05-25
TW200520826A (en)	2005-07-01
CN1308226C (zh)	2007-04-04
DE602004004042T2 (de)	2007-06-28
JP2005145816A (ja)	2005-06-09
EP1533272B1 (de)	2007-01-03
US20050106090A1 (en)	2005-05-19
US7250072B2 (en)	2007-07-31
JP4173854B2 (ja)	2008-10-29
TWI297324B (en)	2008-06-01

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Legal Events

Date	Code	Title	Description
2007-07-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties