TWI297324B - Removal of sulfur-containing impurities from volatile metal hydrides - Google Patents

Removal of sulfur-containing impurities from volatile metal hydrides Download PDF

Info

Publication number: TWI297324B
Authority: TW; Taiwan
Prior art keywords: sulfur; feed; volatile metal; purified; impurities
Prior art date: 2003-11-19

Application number

TW093135311A

Other languages

English (en)

Chinese (zh)

Other versions

TW200520826A (en

Inventor

Rajiv K Agarwal

George L Ryals

Wei Cao

John Frederick Cirucci

Robert W Apollo

Daniel Mcnesby

Original Assignee

Air Prod & Chem

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-11-19

Filing date

2004-11-17

Publication date

2008-06-01

2004-11-17 Application filed by Air Prod & Chem filed Critical Air Prod & Chem

2005-07-01 Publication of TW200520826A publication Critical patent/TW200520826A/zh

2008-06-01 Application granted granted Critical

2008-06-01 Publication of TWI297324B publication Critical patent/TWI297324B/zh

Links

239000012535 impurity Substances 0.000 title claims abstract description 49
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title claims abstract description 26
229910052717 sulfur Inorganic materials 0.000 title claims abstract description 25
239000011593 sulfur Substances 0.000 title claims abstract description 25
229910052987 metal hydride Inorganic materials 0.000 title claims abstract description 23
150000004681 metal hydrides Chemical class 0.000 title claims abstract description 23
239000000463 material Substances 0.000 claims abstract description 21
238000000034 method Methods 0.000 claims abstract description 21
239000003463 adsorbent Substances 0.000 claims abstract description 16
230000002378 acidificating effect Effects 0.000 claims abstract description 14
239000000047 product Substances 0.000 claims abstract description 11
239000013014 purified material Substances 0.000 claims abstract description 7
239000012264 purified product Substances 0.000 claims abstract description 4
239000000126 substance Substances 0.000 claims description 22
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 15
229910000037 hydrogen sulfide Inorganic materials 0.000 claims description 13
239000010457 zeolite Substances 0.000 claims description 13
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 12
229910021536 Zeolite Inorganic materials 0.000 claims description 12
HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 12
150000001875 compounds Chemical class 0.000 claims description 11
229910002092 carbon dioxide Inorganic materials 0.000 claims description 8
239000001569 carbon dioxide Substances 0.000 claims description 8
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 7
239000002274 desiccant Substances 0.000 claims description 7
229910052751 metal Inorganic materials 0.000 claims description 7
239000002184 metal Substances 0.000 claims description 7
229910052707 ruthenium Inorganic materials 0.000 claims description 7
XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 6
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
239000007864 aqueous solution Substances 0.000 claims description 4
239000002594 sorbent Substances 0.000 claims description 4
229910001507 metal halide Inorganic materials 0.000 claims description 3
150000005309 metal halides Chemical class 0.000 claims description 3
229910000073 phosphorus hydride Inorganic materials 0.000 claims description 3
150000007514 bases Chemical class 0.000 claims description 2
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
239000000908 ammonium hydroxide Substances 0.000 claims 1
238000007254 oxidation reaction Methods 0.000 claims 1
238000000746 purification Methods 0.000 abstract description 16
238000001179 sorption measurement Methods 0.000 description 18
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 8
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
239000000356 contaminant Substances 0.000 description 5
239000002243 precursor Substances 0.000 description 5
239000002250 absorbent Substances 0.000 description 4
230000002745 absorbent Effects 0.000 description 4
238000002474 experimental method Methods 0.000 description 4
239000007789 gas Substances 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
239000003513 alkali Substances 0.000 description 3
229910002091 carbon monoxide Inorganic materials 0.000 description 3
239000001257 hydrogen Substances 0.000 description 3
229910052739 hydrogen Inorganic materials 0.000 description 3
150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 3
238000005406 washing Methods 0.000 description 3
230000002411 adverse Effects 0.000 description 2
239000012670 alkaline solution Substances 0.000 description 2
238000005229 chemical vapour deposition Methods 0.000 description 2
230000000052 comparative effect Effects 0.000 description 2
238000001816 cooling Methods 0.000 description 2
150000002371 helium Chemical class 0.000 description 2
239000001307 helium Substances 0.000 description 2
229910052734 helium Inorganic materials 0.000 description 2
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
239000000203 mixture Substances 0.000 description 2
239000000243 solution Substances 0.000 description 2
XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
239000012085 test solution Substances 0.000 description 2
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
206010036790 Productive cough Diseases 0.000 description 1
KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
239000005864 Sulphur Substances 0.000 description 1
125000000217 alkyl group Chemical group 0.000 description 1
150000001408 amides Chemical class 0.000 description 1
239000002585 base Substances 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
150000001622 bismuth compounds Chemical class 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
229910002090 carbon oxide Inorganic materials 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
239000002826 coolant Substances 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000012895 dilution Substances 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000012467 final product Substances 0.000 description 1
-1 getters Substances 0.000 description 1
150000004678 hydrides Chemical class 0.000 description 1
210000004072 lung Anatomy 0.000 description 1
VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000012521 purified sample Substances 0.000 description 1
239000002994 raw material Substances 0.000 description 1
239000012429 reaction media Substances 0.000 description 1
229910052703 rhodium Inorganic materials 0.000 description 1
239000010948 rhodium Substances 0.000 description 1
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
239000000523 sample Substances 0.000 description 1
239000012312 sodium hydride Substances 0.000 description 1
229910000104 sodium hydride Inorganic materials 0.000 description 1
239000007787 solid Substances 0.000 description 1
210000003802 sputum Anatomy 0.000 description 1
208000024794 sputum Diseases 0.000 description 1
150000003464 sulfur compounds Chemical class 0.000 description 1
150000004772 tellurides Chemical group 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
231100000167 toxic agent Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
239000003440 toxic substance Substances 0.000 description 1
239000002023 wood Substances 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C01B6/065—Hydrides of arsenic or antimony
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/48—Sulfur compounds
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/06—Hydrogen phosphides
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/34—Purification; Stabilisation

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Engineering & Computer Science (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Analytical Chemistry (AREA)
Health & Medical Sciences (AREA)
Environmental & Geological Engineering (AREA)
Biomedical Technology (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Gas Separation By Absorption (AREA)
Separation Of Gases By Adsorption (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

TW093135311A 2003-11-19 2004-11-17 Removal of sulfur-containing impurities from volatile metal hydrides TWI297324B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US10/717,050 US7250072B2 (en)	2003-11-19	2003-11-19	Removal of sulfur-containing impurities from volatile metal hydrides

Publications (2)

Publication Number	Publication Date
TW200520826A TW200520826A (en)	2005-07-01
TWI297324B true TWI297324B (en)	2008-06-01

Family

ID=34435747

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW093135311A TWI297324B (en)	2003-11-19	2004-11-17	Removal of sulfur-containing impurities from volatile metal hydrides

Country Status (8)

Country	Link
US (1)	US7250072B2 (de)
EP (1)	EP1533272B1 (de)
JP (1)	JP4173854B2 (de)
KR (1)	KR100613678B1 (de)
CN (1)	CN1308226C (de)
AT (1)	ATE350335T1 (de)
DE (1)	DE602004004042T2 (de)
TW (1)	TWI297324B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7087102B2 (en) *	2004-02-26	2006-08-08	Air Products And Chemicals, Inc.	Process for purification of germane
WO2007021463A2 (en) *	2005-08-09	2007-02-22	Exxonmobil Research And Engineering Company	Tetraorganoammonium and tetraorganophosphonium salts for acid gas scrubbing process
CN104918679B (zh) *	2012-07-17	2017-03-08	西门子公司	用于吸收二氧化碳的洗涤液和用于通过二氧化锗加速该吸收的方法
CN106215629A (zh) *	2016-08-31	2016-12-14	贵州开磷集团股份有限公司	一种磷酸萃取尾气的洗涤方法和装置
CN107697886B (zh) *	2017-11-10	2020-02-18	中国工程物理研究院材料研究所	一种金属氢化物薄片制备方法
CN115814565B (zh) *	2022-11-30	2024-05-31	攀钢集团攀枝花钢铁研究院有限公司	一种推板窑煅烧制备钒氮合金的钾钠吸收方法及吸收剂

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CS192658B1 (en)	1976-01-22	1979-09-17	Dusan Sichrovsky	Method of preparing high pure arsenic
US4107099A (en) *	1977-02-10	1978-08-15	Ventron Corporation	Borohydride exchange resins and their uses as reducing agents and in preparation of volatile metal hydrides
US4564509A (en)	1983-06-30	1986-01-14	Northeast Semiconductor Inc.	Method and apparatus for improved gettering for reactant gases
JPS6016802A (ja)	1983-07-01	1985-01-28	Olympus Optical Co Ltd	半導体用原料ガスの純化剤およびその使用方法
NZ223528A (en) *	1987-02-19	1991-08-27	Dow Chemical Co	Process and scrubbing solution for removal of h 2 s and/or co 2 from gas streams
US4983363A (en)	1987-03-24	1991-01-08	Advanced Technology Materials, Inc.	Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
JP3105529B2 (ja)	1990-09-17	2000-11-06	日本酸素株式会社	アルシンの精製方法
JP3537484B2 (ja)	1994-03-31	2004-06-14	日本酸素株式会社	ホスフィンの精製方法及びその装置
JPH10130285A (ja)	1996-10-31	1998-05-19	Furukawa Co Ltd	有機金属化合物の精製法
US6461411B1 (en)	2000-12-04	2002-10-08	Matheson Tri-Gas	Method and materials for purifying hydride gases, inert gases, and non-reactive gases

2003
- 2003-11-19 US US10/717,050 patent/US7250072B2/en not_active Expired - Fee Related
2004
- 2004-11-15 DE DE602004004042T patent/DE602004004042T2/de not_active Expired - Fee Related
- 2004-11-15 EP EP04027072A patent/EP1533272B1/de not_active Expired - Lifetime
- 2004-11-15 KR KR1020040093024A patent/KR100613678B1/ko not_active Expired - Fee Related
- 2004-11-15 AT AT04027072T patent/ATE350335T1/de not_active IP Right Cessation
- 2004-11-17 TW TW093135311A patent/TWI297324B/zh not_active IP Right Cessation
- 2004-11-19 JP JP2004335794A patent/JP4173854B2/ja not_active Expired - Fee Related
- 2004-11-19 CN CNB2004101005672A patent/CN1308226C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR100613678B1 (ko)	2006-08-21
DE602004004042D1 (de)	2007-02-15
KR20050048477A (ko)	2005-05-24
CN1636863A (zh)	2005-07-13
EP1533272A1 (de)	2005-05-25
TW200520826A (en)	2005-07-01
CN1308226C (zh)	2007-04-04
DE602004004042T2 (de)	2007-06-28
JP2005145816A (ja)	2005-06-09
ATE350335T1 (de)	2007-01-15
EP1533272B1 (de)	2007-01-03
US20050106090A1 (en)	2005-05-19
US7250072B2 (en)	2007-07-31
JP4173854B2 (ja)	2008-10-29

Legal Events

Date	Code	Title	Description
2012-03-01	MM4A	Annulment or lapse of patent due to non-payment of fees

Publication	Publication Date	Title
KR920010082B1 (ko)	1992-11-14	3불화 질소가스의 정제방법
US6461411B1 (en)	2002-10-08	Method and materials for purifying hydride gases, inert gases, and non-reactive gases
JP2001089131A (ja)	2001-04-03	三塩化硼素の精製プロセス及び装置
US4406867A (en)	1983-09-27	Process for the purification of non-reacting gases
JP5535648B2 (ja)	2014-07-02	二酸化塩素を生産するための方法
TWI297324B (en)	2008-06-01	Removal of sulfur-containing impurities from volatile metal hydrides
US4313916A (en)	1982-02-02	Process for the purification of non-reacting gases
JP4423199B2 (ja)	2010-03-03	ポリスルファンの変換法
CN101189185A (zh)	2008-05-28	三氟化氮的纯化
JP7128808B2 (ja)	2022-08-31	回収二酸化炭素の精製方法、および回収二酸化炭素の精製工程を包含するメチオニンの製造方法
EP0020051B1 (de)	1983-12-07	Verfahren zur Reinigung nicht reagierender Gase
US6790419B1 (en)	2004-09-14	Purification of gaseous inorganic halide
CN1942407A (zh)	2007-04-04	从有机液体中催化去除溶解氧的方法
JP2022056613A (ja)	2022-04-11	酸素同位体標識一酸化炭素の製造方法、及び酸素同位体標識二酸化炭素の製造方法
JP7684584B2 (ja)	2025-05-28	組成物の供給方法、組成物及びドライエッチング方法
JP4363089B2 (ja)	2009-11-11	炭酸ガスの処理方法
JP2025538099A (ja)	2025-11-26	硫化カルボニルの合成方法及び合成装置
KR830002405B1 (ko)	1983-10-26	비반응 가스의 정화공정
SU865359A1 (ru)	1981-09-23	Способ получени поглотител окиси углерода
JPH0925103A (ja)	1997-01-28	精ヨウ化水素の製造方法
JPH09122437A (ja)	1997-05-13	ガスの処理方法
JPS623762B2 (de)	1987-01-27
JP2001026403A (ja)	2001-01-30	アリールアルコール及びその誘導体を含有する塩化水素の精製方法
JPH10194716A (ja)	1998-07-28	一酸化炭素ガスの精製方法