ATE352184T1 - Laser-belichtungsgerät für platten - Google Patents
Laser-belichtungsgerät für plattenInfo
- Publication number
- ATE352184T1 ATE352184T1 AT00402850T AT00402850T ATE352184T1 AT E352184 T1 ATE352184 T1 AT E352184T1 AT 00402850 T AT00402850 T AT 00402850T AT 00402850 T AT00402850 T AT 00402850T AT E352184 T1 ATE352184 T1 AT E352184T1
- Authority
- AT
- Austria
- Prior art keywords
- panel
- laser
- plates
- exposure device
- laser exposure
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000000644 propagated effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Polymerisation Methods In General (AREA)
- Facsimile Scanning Arrangements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9913886A FR2800968B1 (fr) | 1999-11-05 | 1999-11-05 | Machine d'exposition d'un panneau a un rayonnement laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE352184T1 true ATE352184T1 (de) | 2007-02-15 |
Family
ID=9551765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00402850T ATE352184T1 (de) | 1999-11-05 | 2000-10-16 | Laser-belichtungsgerät für platten |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6323936B1 (de) |
| EP (1) | EP1098557B1 (de) |
| JP (1) | JP2001201864A (de) |
| KR (1) | KR100707880B1 (de) |
| CN (1) | CN1223958C (de) |
| AT (1) | ATE352184T1 (de) |
| CA (1) | CA2324850A1 (de) |
| DE (1) | DE60032996T2 (de) |
| ES (1) | ES2280185T3 (de) |
| FR (1) | FR2800968B1 (de) |
| TW (1) | TW478219B (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2830719A1 (fr) * | 2001-10-04 | 2003-04-11 | Automa Tech Sa | Composition pour realiser des circuits imprimes et machine et installation utilisant cette composition |
| US6864963B2 (en) * | 2002-03-19 | 2005-03-08 | Chi Mei Optoelectronics Corporation | Position measuring system with multiple bar mirrors |
| JP3998141B2 (ja) * | 2003-03-13 | 2007-10-24 | 株式会社リコー | 静電潜像現像用キャリアおよびそれを用いた静電潜像現像剤並びにプロセスカートリッジ |
| US7030963B2 (en) * | 2004-05-03 | 2006-04-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN102096903B (zh) * | 2009-12-14 | 2013-01-02 | 北大方正集团有限公司 | 一种页面光栅化文字平滑处理方法及系统 |
| JP6627875B2 (ja) * | 2015-06-17 | 2020-01-08 | 株式会社ニコン | パターン描画装置およびパターン描画方法 |
| TWI620038B (zh) | 2017-01-11 | 2018-04-01 | 財團法人工業技術研究院 | 曝光方法和系統以及雷射直接成像系統 |
| CN112068400A (zh) * | 2020-09-01 | 2020-12-11 | 浙江大学 | 一种实现高通量并行激光扫描直写超分辨光刻的方法和装置 |
| CN112739011A (zh) * | 2020-11-30 | 2021-04-30 | 胜宏科技(惠州)股份有限公司 | 一种三层盲孔印制板制作方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01191164A (ja) * | 1988-01-26 | 1989-08-01 | Minolta Camera Co Ltd | 現像装置 |
| DE4225946C2 (de) * | 1992-08-06 | 1997-07-17 | Krause Biagosch Gmbh | Vorrichtung zur Laser-Belichtung eines Druckformträgers |
| DE69519221T2 (de) * | 1995-02-22 | 2001-06-13 | Barco Graphics, Zwijnaarde | Abtastgerät |
| JPH0966595A (ja) * | 1995-08-30 | 1997-03-11 | Kaneda Kikai Seisakusho:Kk | 新聞印刷用刷版の製作方法 |
| JPH1191164A (ja) * | 1997-09-22 | 1999-04-06 | Nec Corp | カラーレーザプリンタ |
| US5933216A (en) * | 1997-10-16 | 1999-08-03 | Anvik Corporation | Double-sided patterning system using dual-wavelength output of an excimer laser |
| US6205364B1 (en) * | 1999-02-02 | 2001-03-20 | Creo Ltd. | Method and apparatus for registration control during processing of a workpiece particularly during producing images on substrates in preparing printed circuit boards |
-
1999
- 1999-11-05 FR FR9913886A patent/FR2800968B1/fr not_active Expired - Fee Related
-
2000
- 2000-10-16 DE DE60032996T patent/DE60032996T2/de not_active Expired - Fee Related
- 2000-10-16 US US09/688,953 patent/US6323936B1/en not_active Expired - Fee Related
- 2000-10-16 ES ES00402850T patent/ES2280185T3/es not_active Expired - Lifetime
- 2000-10-16 AT AT00402850T patent/ATE352184T1/de not_active IP Right Cessation
- 2000-10-16 EP EP00402850A patent/EP1098557B1/de not_active Expired - Lifetime
- 2000-10-24 KR KR1020000062626A patent/KR100707880B1/ko not_active Expired - Fee Related
- 2000-10-31 CA CA002324850A patent/CA2324850A1/en not_active Abandoned
- 2000-11-03 CN CNB001338099A patent/CN1223958C/zh not_active Expired - Fee Related
- 2000-11-04 TW TW089123311A patent/TW478219B/zh not_active IP Right Cessation
- 2000-11-06 JP JP2000337545A patent/JP2001201864A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| ES2280185T3 (es) | 2007-09-16 |
| KR100707880B1 (ko) | 2007-04-13 |
| FR2800968B1 (fr) | 2002-09-13 |
| TW478219B (en) | 2002-03-01 |
| EP1098557A1 (de) | 2001-05-09 |
| DE60032996T2 (de) | 2007-11-08 |
| FR2800968A1 (fr) | 2001-05-11 |
| JP2001201864A (ja) | 2001-07-27 |
| CA2324850A1 (en) | 2001-05-05 |
| CN1223958C (zh) | 2005-10-19 |
| CN1295305A (zh) | 2001-05-16 |
| US6323936B1 (en) | 2001-11-27 |
| DE60032996D1 (de) | 2007-03-08 |
| KR20010051215A (ko) | 2001-06-25 |
| EP1098557B1 (de) | 2007-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
Ref document number: 1098557 Country of ref document: EP |
|
| REN | Ceased due to non-payment of the annual fee |