ATE356894T1 - Verfahren und vorrichtung zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase - Google Patents

Verfahren und vorrichtung zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase

Info

Publication number
ATE356894T1
ATE356894T1 AT03714256T AT03714256T ATE356894T1 AT E356894 T1 ATE356894 T1 AT E356894T1 AT 03714256 T AT03714256 T AT 03714256T AT 03714256 T AT03714256 T AT 03714256T AT E356894 T1 ATE356894 T1 AT E356894T1
Authority
AT
Austria
Prior art keywords
vapor
chamber
vaporization chamber
reagents
chemical deposition
Prior art date
Application number
AT03714256T
Other languages
English (en)
Inventor
Douglas M Nelson
Original Assignee
Pilkington North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington North America Inc filed Critical Pilkington North America Inc
Application granted granted Critical
Publication of ATE356894T1 publication Critical patent/ATE356894T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/228—In rotating vessels; vessels with movable parts horizontally placed cylindrical container or drum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Physical Vapour Deposition (AREA)
AT03714256T 2002-03-29 2003-03-19 Verfahren und vorrichtung zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase ATE356894T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36911002P 2002-03-29 2002-03-29

Publications (1)

Publication Number Publication Date
ATE356894T1 true ATE356894T1 (de) 2007-04-15

Family

ID=28791925

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03714256T ATE356894T1 (de) 2002-03-29 2003-03-19 Verfahren und vorrichtung zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase

Country Status (12)

Country Link
US (2) US6827974B2 (de)
EP (1) EP1501964B1 (de)
JP (1) JP4317459B2 (de)
KR (1) KR20040101358A (de)
CN (1) CN100443630C (de)
AT (1) ATE356894T1 (de)
AU (1) AU2003218262A1 (de)
BR (1) BR0308846A (de)
DE (1) DE60312504T2 (de)
MX (1) MXPA04009247A (de)
RU (1) RU2303078C2 (de)
WO (1) WO2003085164A1 (de)

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US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
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US6926775B2 (en) 2003-02-11 2005-08-09 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7584942B2 (en) 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
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US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US20080260539A1 (en) * 2005-10-07 2008-10-23 Aker Kvaerner Subsea As Apparatus and Method For Controlling Supply of Barrier Gas in a Compressor Module
WO2007130447A2 (en) * 2006-05-05 2007-11-15 Pilkington Group Limited Method for depositing zinc oxide coatings on flat glass
US7736698B2 (en) * 2006-05-05 2010-06-15 Pilkington Group Limited Method of depositing zinc oxide coatings on a substrate
BRPI0716385A2 (pt) * 2006-08-29 2013-01-01 Pilkington Group Ltd E Arkema Inc método para preparar um artigo de vidro revestido com óxido de zinco dopado, de baixa resistividade, método de deposição de vapor quìmico sob pressão atmosférica para preparar um artigo de vidro revestido com óxido de zinco dopado, método de deposição de vapor quìmico sob pressão atmosférica para preparar um artigo revestido com óxido de zinco dopado, e artigo de vidro
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RU2388770C2 (ru) * 2008-07-24 2010-05-10 Химический факультет МГУ имени М.В. Ломоносова Способ получения тонких пленок химических соединений и установка для его осуществления
DE102010016926A1 (de) 2009-05-16 2010-12-30 Eichler Gmbh & Co.Kg Verfahren und Beschichtungsanlage zur elektrostatischen Lackierung (Pulverbeschichtung) von elektrisch nicht leitenden Teilen
US9095856B2 (en) 2010-02-10 2015-08-04 Dresser-Rand Company Separator fluid collector and method
US8663483B2 (en) 2010-07-15 2014-03-04 Dresser-Rand Company Radial vane pack for rotary separators
WO2012009158A2 (en) 2010-07-15 2012-01-19 Dresser-Rand Company Enhanced in-line rotary separator
US8657935B2 (en) 2010-07-20 2014-02-25 Dresser-Rand Company Combination of expansion and cooling to enhance separation
US8821362B2 (en) 2010-07-21 2014-09-02 Dresser-Rand Company Multiple modular in-line rotary separator bundle
JP5936144B2 (ja) 2010-09-09 2016-06-15 ドレッサー ランド カンパニーＤｒｅｓｓｅｒ−Ｒａｎｄ Ｃｏｍｐａｎｙ 洗浄可能に制御された排水管
US20120276291A1 (en) * 2011-04-28 2012-11-01 Bird Chester D Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
KR102040758B1 (ko) 2011-08-05 2019-11-05 쓰리엠 이노베이티브 프로퍼티즈 캄파니 증기 처리 시스템 및 방법
US9156041B1 (en) * 2012-05-07 2015-10-13 The United States Of America As Represented By The Secretary Of The Army Dimethylmethylphosphonate vapor generator
US11517831B2 (en) 2019-06-25 2022-12-06 George Andrew Rabroker Abatement system for pyrophoric chemicals and method of use
CN110965046B (zh) * 2019-12-31 2024-05-28 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
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Also Published As

Publication number Publication date
DE60312504D1 (de) 2007-04-26
JP2005521796A (ja) 2005-07-21
US20030185979A1 (en) 2003-10-02
JP4317459B2 (ja) 2009-08-19
WO2003085164A1 (en) 2003-10-16
RU2303078C2 (ru) 2007-07-20
DE60312504T2 (de) 2007-11-22
US6827974B2 (en) 2004-12-07
AU2003218262A1 (en) 2003-10-20
EP1501964A1 (de) 2005-02-02
BR0308846A (pt) 2005-02-01
CN100443630C (zh) 2008-12-17
EP1501964B1 (de) 2007-03-14
CN1656248A (zh) 2005-08-17
MXPA04009247A (es) 2005-01-25
US7596305B2 (en) 2009-09-29
RU2004131823A (ru) 2005-10-10
US20050066894A1 (en) 2005-03-31
KR20040101358A (ko) 2004-12-02

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