ATE357493T1 - Waschmittelzusammensetzung - Google Patents

Waschmittelzusammensetzung

Info

Publication number
ATE357493T1
ATE357493T1 AT01273201T AT01273201T ATE357493T1 AT E357493 T1 ATE357493 T1 AT E357493T1 AT 01273201 T AT01273201 T AT 01273201T AT 01273201 T AT01273201 T AT 01273201T AT E357493 T1 ATE357493 T1 AT E357493T1
Authority
AT
Austria
Prior art keywords
cleaning composition
chain
cleaned
branched
straight
Prior art date
Application number
AT01273201T
Other languages
English (en)
Inventor
Junichi Maeno
Shugo Kawakami
Kazutaka Zenfuku
Original Assignee
Arakawa Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arakawa Chem Ind filed Critical Arakawa Chem Ind
Application granted granted Critical
Publication of ATE357493T1 publication Critical patent/ATE357493T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/86—Mixtures of anionic, cationic, and non-ionic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C11D3/2006—Monohydric alcohols
    • C11D3/2034—Monohydric alcohols aromatic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • C23G5/036—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds having also nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/34—Derivatives of acids of phosphorus
    • C11D1/345—Phosphates or phosphites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/42—Amino alcohols or amino ethers
    • C11D1/44—Ethers of polyoxyalkylenes with amino alcohols; Condensation products of epoxyalkanes with amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Emergency Medicine (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)
AT01273201T 2001-01-05 2001-12-28 Waschmittelzusammensetzung ATE357493T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001000303A JP4025953B2 (ja) 2001-01-05 2001-01-05 洗浄剤組成物

Publications (1)

Publication Number Publication Date
ATE357493T1 true ATE357493T1 (de) 2007-04-15

Family

ID=18869116

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01273201T ATE357493T1 (de) 2001-01-05 2001-12-28 Waschmittelzusammensetzung

Country Status (9)

Country Link
US (1) US7018964B2 (de)
EP (1) EP1295935B1 (de)
JP (1) JP4025953B2 (de)
KR (1) KR100564900B1 (de)
CN (1) CN100480365C (de)
AT (1) ATE357493T1 (de)
DE (1) DE60127405D1 (de)
TW (1) TWI246534B (de)
WO (1) WO2002055645A1 (de)

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JP4154999B2 (ja) * 2002-11-01 2008-09-24 東ソー株式会社 洗浄方法
KR100516886B1 (ko) * 2002-12-09 2005-09-23 제일모직주식회사 실리콘 웨이퍼의 최종 연마용 슬러리 조성물
US7238653B2 (en) * 2003-03-10 2007-07-03 Hynix Semiconductor Inc. Cleaning solution for photoresist and method for forming pattern using the same
JP2007219009A (ja) 2006-02-14 2007-08-30 Az Electronic Materials Kk レジスト基板用処理液とそれを用いたレジスト基板の処理方法
JP5452020B2 (ja) * 2006-03-17 2014-03-26 荒川化学工業株式会社 鉛フリーハンダフラックス除去用洗浄剤組成物、鉛フリーハンダフラックス除去用すすぎ剤、及び鉛フリーハンダフラックスの除去方法
KR101530321B1 (ko) * 2007-08-08 2015-06-19 아라까와 가가꾸 고교 가부시끼가이샤 무연 땜납 플럭스 제거용 세정제 조성물 및 무연 땜납 플럭스의 제거 방법
JP5789194B2 (ja) * 2008-12-08 2015-10-07 ハンツマン ペトロケミカル エルエルシーＨｕｎｔｓｍａｎ Ｐｅｔｒｏｃｈｅｍｉｃａｌ ＬＬＣ アミン溶媒溶液に存在するアミン由来汚染物質および／またはアミン溶媒溶液の分解の低下
US9221081B1 (en) 2011-08-01 2015-12-29 Novellus Systems, Inc. Automated cleaning of wafer plating assembly
US9228270B2 (en) 2011-08-15 2016-01-05 Novellus Systems, Inc. Lipseals and contact elements for semiconductor electroplating apparatuses
US10066311B2 (en) 2011-08-15 2018-09-04 Lam Research Corporation Multi-contact lipseals and associated electroplating methods
US9988734B2 (en) 2011-08-15 2018-06-05 Lam Research Corporation Lipseals and contact elements for semiconductor electroplating apparatuses
JP5696981B2 (ja) * 2011-09-02 2015-04-08 荒川化学工業株式会社 はんだ付けフラックス用洗浄剤組成物
DE102011082136B4 (de) * 2011-09-05 2013-04-11 Vacuumschmelze Gmbh & Co. Kg Reinigungsmittelzusammensetzung sowie ein Verfahren zum Entfernen von ausgehärteten Gießharzen, Klebstoffen, Montageschäumen, Lackfilmen und Lackresten
SG11201406133WA (en) * 2012-03-28 2014-10-30 Novellus Systems Inc Methods and apparatuses for cleaning electroplating substrate holders
TWI609100B (zh) 2012-03-30 2017-12-21 諾發系統有限公司 使用反向電流除鍍以清洗電鍍基板夾持具
CN102989712B (zh) * 2012-10-17 2014-11-12 张志明 抽油烟机洗涤方法
US10416092B2 (en) 2013-02-15 2019-09-17 Lam Research Corporation Remote detection of plating on wafer holding apparatus
US9746427B2 (en) 2013-02-15 2017-08-29 Novellus Systems, Inc. Detection of plating on wafer holding apparatus
KR102135187B1 (ko) 2013-12-26 2020-07-17 동우 화인켐 주식회사 포토레지스트 박리액 조성물
US9637677B2 (en) 2014-09-04 2017-05-02 Ideal Energy Solutions IP Control, LLC Aqueous cleaning composition and method
KR20160084038A (ko) 2015-01-05 2016-07-13 황보기만 침출성 세제볼 및 그제법
US10053793B2 (en) 2015-07-09 2018-08-21 Lam Research Corporation Integrated elastomeric lipseal and cup bottom for reducing wafer sticking
CN106807117A (zh) * 2016-12-27 2017-06-09 广东中联邦精细化工有限公司 一种线路板清洗专用消泡剂

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US3673099A (en) 1970-10-19 1972-06-27 Bell Telephone Labor Inc Process and composition for stripping cured resins from substrates
US4428871A (en) 1981-09-23 1984-01-31 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4664721A (en) 1981-12-07 1987-05-12 Intercontinental Chemical Corporation Printing screen cleaning and reclaiming compositions
JPS6191299A (ja) 1984-10-12 1986-05-09 川研ファインケミカル株式会社 硬質表面洗浄剤
DK600484D0 (da) 1984-12-14 1984-12-14 Cps Kemi Aps Vaeske til fortynding og/eller fjernelse af trykkeri- og serigrafifarver
JPH0715110B2 (ja) 1986-04-30 1995-02-22 花王株式会社 繊維類のしみおよび着色除去用組成物
US4744834A (en) 1986-04-30 1988-05-17 Noor Haq Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide
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JPS6350838A (ja) 1986-08-21 1988-03-03 Japan Synthetic Rubber Co Ltd 剥離液
US4812255A (en) 1987-03-04 1989-03-14 Gaf Corporation Paint removing compositions
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EP0389829A1 (de) 1989-03-13 1990-10-03 BASF Corporation Abbeizmittel für auf Wasser basierende Lacke und für Firnis auf Holz
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DE4004630A1 (de) 1990-02-15 1991-08-22 Beutelrock Geb Wehrmann Caroli Mittel zur lackentfernung
JPH0434000A (ja) * 1990-05-30 1992-02-05 Hitachi Ltd フラックス洗浄剤およびそれを用いた半田付け電子部品の洗浄方法
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Also Published As

Publication number Publication date
EP1295935B1 (de) 2007-03-21
EP1295935A1 (de) 2003-03-26
WO2002055645A1 (fr) 2002-07-18
TWI246534B (en) 2006-01-01
US20030181349A1 (en) 2003-09-25
CN1411502A (zh) 2003-04-16
CN100480365C (zh) 2009-04-22
JP2002201492A (ja) 2002-07-19
EP1295935A4 (de) 2004-06-09
US7018964B2 (en) 2006-03-28
KR20020075471A (ko) 2002-10-04
KR100564900B1 (ko) 2006-03-30
DE60127405D1 (de) 2007-05-03
JP4025953B2 (ja) 2007-12-26

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties