ATE358191T1 - Verfahren zur abscheidung von oxyden und nitriden mit zusammensetzungsgradienten - Google Patents

Verfahren zur abscheidung von oxyden und nitriden mit zusammensetzungsgradienten

Info

Publication number
ATE358191T1
ATE358191T1 AT01107778T AT01107778T ATE358191T1 AT E358191 T1 ATE358191 T1 AT E358191T1 AT 01107778 T AT01107778 T AT 01107778T AT 01107778 T AT01107778 T AT 01107778T AT E358191 T1 ATE358191 T1 AT E358191T1
Authority
AT
Austria
Prior art keywords
metalloid
metal
result
precursors
substrate
Prior art date
Application number
AT01107778T
Other languages
English (en)
Inventor
Yoshihide Senzaki
John Anthony Thomas Norman
Arthur Kenneth Hochberg
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Application granted granted Critical
Publication of ATE358191T1 publication Critical patent/ATE358191T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Saccharide Compounds (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Ceramic Products (AREA)
AT01107778T 2000-04-10 2001-04-04 Verfahren zur abscheidung von oxyden und nitriden mit zusammensetzungsgradienten ATE358191T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/546,867 US6537613B1 (en) 2000-04-10 2000-04-10 Process for metal metalloid oxides and nitrides with compositional gradients

Publications (1)

Publication Number Publication Date
ATE358191T1 true ATE358191T1 (de) 2007-04-15

Family

ID=24182359

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01107778T ATE358191T1 (de) 2000-04-10 2001-04-04 Verfahren zur abscheidung von oxyden und nitriden mit zusammensetzungsgradienten

Country Status (8)

Country Link
US (1) US6537613B1 (de)
EP (1) EP1146140B1 (de)
JP (1) JP3588334B2 (de)
KR (1) KR100418461B1 (de)
AT (1) ATE358191T1 (de)
DE (1) DE60127486T2 (de)
HK (1) HK1039967B (de)
TW (1) TWI242055B (de)

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Also Published As

Publication number Publication date
KR100418461B1 (ko) 2004-02-14
JP3588334B2 (ja) 2004-11-10
HK1039967A1 (en) 2002-05-17
DE60127486T2 (de) 2007-12-13
HK1039967B (en) 2007-09-14
TWI242055B (en) 2005-10-21
KR20010090776A (ko) 2001-10-19
EP1146140B1 (de) 2007-03-28
DE60127486D1 (de) 2007-05-10
US6537613B1 (en) 2003-03-25
EP1146140A1 (de) 2001-10-17
JP2002033317A (ja) 2002-01-31

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