ATE358194T1 - Vorrichtung und verfahren zur elektrochemischen beschichtung - Google Patents
Vorrichtung und verfahren zur elektrochemischen beschichtungInfo
- Publication number
- ATE358194T1 ATE358194T1 AT01272605T AT01272605T ATE358194T1 AT E358194 T1 ATE358194 T1 AT E358194T1 AT 01272605 T AT01272605 T AT 01272605T AT 01272605 T AT01272605 T AT 01272605T AT E358194 T1 ATE358194 T1 AT E358194T1
- Authority
- AT
- Austria
- Prior art keywords
- layers
- coated
- substrate
- thin layers
- deposited
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 2
- 229920001940 conductive polymer Polymers 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 230000000704 physical effect Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Battery Mounting, Suspending (AREA)
- Sealing Battery Cases Or Jackets (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10100297A DE10100297A1 (de) | 2001-01-04 | 2001-01-04 | Vorrichtung und Verahren zur elektrochemischen Beschichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE358194T1 true ATE358194T1 (de) | 2007-04-15 |
Family
ID=7669816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01272605T ATE358194T1 (de) | 2001-01-04 | 2001-09-24 | Vorrichtung und verfahren zur elektrochemischen beschichtung |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1534880B1 (de) |
| AT (1) | ATE358194T1 (de) |
| AU (1) | AU2002223435A1 (de) |
| DE (3) | DE10100297A1 (de) |
| WO (1) | WO2002053806A2 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10132408C2 (de) * | 2001-07-04 | 2003-08-21 | Fraunhofer Ges Forschung | Elektrode mit veränderbarer Form |
| DE10141056C2 (de) | 2001-08-22 | 2003-12-24 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch leitfähigen Schichten in Durchlaufanlagen |
| DE102004056158B3 (de) * | 2004-11-17 | 2006-03-30 | Siemens Ag | Verfahren zum Überwachen eines elektrochemischen Behandlungsprozesses und für dieses Verfahren geeignete Elektrodenanordnung |
| JP6993288B2 (ja) * | 2018-05-07 | 2022-01-13 | 株式会社荏原製作所 | めっき装置 |
| DE102018004841B9 (de) | 2018-06-13 | 2020-12-03 | Hooshiar Mahdjour | Verfahren und Vorrichtung zur automatisierten Regelung der Ströme in einem Galvanikbad |
| TW202449233A (zh) | 2023-04-25 | 2024-12-16 | 德商德國艾托特克有限兩合公司 | 進行電解之設備與方法,及用於此設備之電極單元 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61279695A (ja) * | 1985-06-04 | 1986-12-10 | Central Glass Co Ltd | 電解合成法による薄膜の形成方法 |
| JPH04143299A (ja) * | 1990-10-03 | 1992-05-18 | Fujitsu Ltd | 電解メッキ方法 |
| US5156730A (en) * | 1991-06-25 | 1992-10-20 | International Business Machines | Electrode array and use thereof |
| JP3207909B2 (ja) * | 1992-02-07 | 2001-09-10 | ティーディーケイ株式会社 | 電気めっき方法および電気めっき用分割型不溶性電極 |
| DE19717489B4 (de) * | 1997-04-25 | 2008-04-10 | Sms Demag Ag | Anordnung zur elektrogalvanischen Metallbeschichtung eines Bandes |
| AU6773000A (en) * | 1999-08-26 | 2001-03-19 | Cvc Products, Inc. | Apparatus and method for electroplating a material layer onto a wafer |
| JP2003535974A (ja) * | 2000-06-05 | 2003-12-02 | アプライド マテリアルズ インコーポレイテッド | プログラマブルアノード装置及び関連する方法 |
-
2001
- 2001-01-04 DE DE10100297A patent/DE10100297A1/de not_active Withdrawn
- 2001-09-24 WO PCT/DE2001/003676 patent/WO2002053806A2/de not_active Ceased
- 2001-09-24 DE DE10195773T patent/DE10195773D2/de not_active Expired - Fee Related
- 2001-09-24 EP EP01272605A patent/EP1534880B1/de not_active Expired - Lifetime
- 2001-09-24 AU AU2002223435A patent/AU2002223435A1/en not_active Abandoned
- 2001-09-24 DE DE50112278T patent/DE50112278D1/de not_active Expired - Lifetime
- 2001-09-24 AT AT01272605T patent/ATE358194T1/de active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002053806A3 (de) | 2005-03-24 |
| AU2002223435A1 (en) | 2002-07-16 |
| DE10195773D2 (de) | 2004-01-22 |
| EP1534880A2 (de) | 2005-06-01 |
| DE10100297A1 (de) | 2002-07-18 |
| WO2002053806A2 (de) | 2002-07-11 |
| DE50112278D1 (de) | 2007-05-10 |
| EP1534880B1 (de) | 2007-03-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEIH | Change in the person of patent owner |