ATE542785T1 - Verfahren zur elektrophoretischen beschichtung - Google Patents

Verfahren zur elektrophoretischen beschichtung

Info

Publication number
ATE542785T1
ATE542785T1 AT05254950T AT05254950T ATE542785T1 AT E542785 T1 ATE542785 T1 AT E542785T1 AT 05254950 T AT05254950 T AT 05254950T AT 05254950 T AT05254950 T AT 05254950T AT E542785 T1 ATE542785 T1 AT E542785T1
Authority
AT
Austria
Prior art keywords
deposition
epd
depositing
complex shaped
electrophoretic coating
Prior art date
Application number
AT05254950T
Other languages
English (en)
Inventor
Tania Bhatia
John E Holowczak
Neil Baldwin
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Application granted granted Critical
Publication of ATE542785T1 publication Critical patent/ATE542785T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/89Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00Electrophoretic coating characterised by the process
    • C25D13/02Electrophoretic coating characterised by the process with inorganic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Turbine Rotor Nozzle Sealing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
AT05254950T 2004-08-09 2005-08-09 Verfahren zur elektrophoretischen beschichtung ATE542785T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/914,905 US20060027923A1 (en) 2004-08-09 2004-08-09 Coating process to enable electrophoretic deposition

Publications (1)

Publication Number Publication Date
ATE542785T1 true ATE542785T1 (de) 2012-02-15

Family

ID=35266801

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05254950T ATE542785T1 (de) 2004-08-09 2005-08-09 Verfahren zur elektrophoretischen beschichtung

Country Status (4)

Country Link
US (2) US20060027923A1 (de)
EP (1) EP1626040B1 (de)
JP (1) JP2006052467A (de)
AT (1) ATE542785T1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1996341B1 (de) * 2006-02-20 2018-09-26 Kang N. Lee Artikel mit umgebungsbarriere-beschichtungssystem
CN105765112A (zh) * 2014-02-14 2016-07-13 惠普发展公司,有限责任合伙企业 具有绝缘层的衬底
CN106471158B (zh) * 2014-06-23 2019-05-31 惠普发展公司有限责任合伙企业 制造多层涂层的方法以及涂覆的基材
CN105154957B (zh) * 2015-08-25 2018-10-02 福建省诺希科技园发展有限公司 一种型材挤压模具表面强化复合材料制备方法
US10384978B2 (en) 2016-08-22 2019-08-20 General Electric Company Thermal barrier coating repair compositions and methods of use thereof
US12176125B2 (en) 2020-07-15 2024-12-24 Ge Aviation Systems Llc Method of making an insulated conductive component
US11551993B2 (en) 2020-08-28 2023-01-10 Ge Aviation Systems Llc Power overlay module and method of assembling
CN114276142B (zh) * 2022-01-25 2022-09-02 中南大学 一种涂敷-反应熔渗制备多元超高温陶瓷涂层的方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5881995A (ja) 1981-11-09 1983-05-17 Mitsui Toatsu Chem Inc 金属酸化物膜の形成方法
JPS63176374A (ja) * 1987-01-14 1988-07-20 日本碍子株式会社 ガラスカプセル化粉末成形体の製造法
JPH0347977A (ja) 1989-07-17 1991-02-28 Matsushita Electric Ind Co Ltd 回路部品の製造方法
US5415748A (en) * 1994-02-23 1995-05-16 United Technologies Corporation Process for the electrophoretic deposition of defect-free metallic oxide coatings
JP2740152B2 (ja) * 1996-02-22 1998-04-15 株式会社東芝 アルミナ被覆焼結体の製造方法
US6258237B1 (en) * 1998-12-30 2001-07-10 Cerd, Ltd. Electrophoretic diamond coating and compositions for effecting same
US6410148B1 (en) * 1999-04-15 2002-06-25 General Electric Co. Silicon based substrate with environmental/ thermal barrier layer
US6254935B1 (en) * 1999-04-15 2001-07-03 United Technologies Corporation Method for applying a barrier layer to a silicon based substrate
JP3763117B2 (ja) 1999-09-28 2006-04-05 独立行政法人科学技術振興機構 簡易でかつ再現性に富む自立ゼオライト膜の製造方法
US6780787B2 (en) * 2002-03-21 2004-08-24 Lam Research Corporation Low contamination components for semiconductor processing apparatus and methods for making components
US6838157B2 (en) * 2002-09-23 2005-01-04 Siemens Westinghouse Power Corporation Method and apparatus for instrumenting a gas turbine component having a barrier coating
US6770353B1 (en) * 2003-01-13 2004-08-03 Hewlett-Packard Development Company, L.P. Co-deposited films with nano-columnar structures and formation process
US7115319B2 (en) * 2003-10-08 2006-10-03 Honeywell International, Inc. Braze-based protective coating for silicon nitride
US7323247B2 (en) * 2003-11-21 2008-01-29 Honeywell International, Inc. Oxidation barrier coatings for silicon based ceramics

Also Published As

Publication number Publication date
US7538045B2 (en) 2009-05-26
EP1626040A3 (de) 2007-02-28
JP2006052467A (ja) 2006-02-23
EP1626040A2 (de) 2006-02-15
EP1626040B1 (de) 2012-01-25
US20060027923A1 (en) 2006-02-09
US20060244143A1 (en) 2006-11-02

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