ATE371858T1 - Anlage zur abgasidentifizierung - Google Patents

Anlage zur abgasidentifizierung

Info

Publication number
ATE371858T1
ATE371858T1 AT00400069T AT00400069T ATE371858T1 AT E371858 T1 ATE371858 T1 AT E371858T1 AT 00400069 T AT00400069 T AT 00400069T AT 00400069 T AT00400069 T AT 00400069T AT E371858 T1 ATE371858 T1 AT E371858T1
Authority
AT
Austria
Prior art keywords
gas
generator
source
exhaust gas
analyzing
Prior art date
Application number
AT00400069T
Other languages
English (en)
Inventor
Eric Chevalier
Philippe Maquin
Roland Bernard
Original Assignee
Alcatel Lucent
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Lucent filed Critical Alcatel Lucent
Application granted granted Critical
Publication of ATE371858T1 publication Critical patent/ATE371858T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
AT00400069T 1999-01-22 2000-01-13 Anlage zur abgasidentifizierung ATE371858T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9900723A FR2788854B1 (fr) 1999-01-22 1999-01-22 Systeme et procede d'identification d'effluents gazeux, equipement pourvu d'un tel systeme

Publications (1)

Publication Number Publication Date
ATE371858T1 true ATE371858T1 (de) 2007-09-15

Family

ID=9541144

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00400069T ATE371858T1 (de) 1999-01-22 2000-01-13 Anlage zur abgasidentifizierung

Country Status (6)

Country Link
US (1) US6643014B2 (de)
EP (1) EP1022559B1 (de)
JP (2) JP2000214092A (de)
AT (1) ATE371858T1 (de)
DE (1) DE60036145T2 (de)
FR (1) FR2788854B1 (de)

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US6791692B2 (en) * 2000-11-29 2004-09-14 Lightwind Corporation Method and device utilizing plasma source for real-time gas sampling
GB0101835D0 (en) * 2001-01-24 2001-03-07 Casect Ltd Analysable package
US7123361B1 (en) 2003-03-05 2006-10-17 Verionix Incorporated Microplasma emission spectrometer
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
WO2005012855A2 (en) * 2003-07-25 2005-02-10 Lightwind Corporation Method and apparatus for chemical monitoring
FR2865314B1 (fr) * 2004-01-20 2006-04-28 Cit Alcatel Station de controle et de purge de mini-environnement
US7309842B1 (en) 2004-03-19 2007-12-18 Verionix Incorporated Shielded monolithic microplasma source for prevention of continuous thin film formation
DE102004061269A1 (de) * 2004-12-10 2006-06-14 Siemens Ag Verfahren zum Reinigen eines Werkstückes mit Halogenionen
FR2880105B1 (fr) * 2004-12-23 2007-04-20 Cie Financiere Alcatel Sa Dispositif et procede de pilotage de l'operation de deshydratation durant un traitement de lyophilisation
FR2887072A1 (fr) * 2005-06-08 2006-12-15 Alcatel Sa Systeme spectographique ameliore avec source plasma
GB2441582A (en) * 2006-09-01 2008-03-12 Gencoa Ltd Process monitoring and control
US20080090310A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Substrate processing apparatus and substrate processing termination detection method
FR2907219B1 (fr) * 2006-10-17 2008-12-12 Alcatel Sa Caracterisation de gaz par spectrometrie optique a emission
US9997325B2 (en) 2008-07-17 2018-06-12 Verity Instruments, Inc. Electron beam exciter for use in chemical analysis in processing systems
FR2955927B1 (fr) * 2010-02-01 2012-04-06 Alcatel Lucent Dispositif et procede de pilotage d'une operation de deshydratation durant un traitement de lyophilisation
CN103048377B (zh) * 2011-10-17 2015-06-10 中国科学院化学研究所 极紫外(euv)光刻胶超高真空热处理检测装置与方法
JP6568050B2 (ja) 2013-03-13 2019-08-28 ラドム コーポレイションＲａｄｏｍ Ｃｏｒｐｏｒａｔｉｏｎ 誘電体共振器を使用するマイクロ波プラズマ分光計
DE102014000343A1 (de) * 2014-01-11 2015-07-16 Dräger Safety AG & Co. KGaA Gasmessgerät
ES2589964B1 (es) * 2015-04-17 2017-09-05 Abengoa Solar New Technologies, S.A. Sistema y método de análisis del gas presente en el espacio interanular de receptores solares de tubo
US10900907B2 (en) 2017-02-17 2021-01-26 Radom Corporation Portable plasma source for optical spectroscopy
KR101931324B1 (ko) 2017-09-14 2018-12-20 (주)나노텍 셀프 플라즈마 챔버의 오염 억제 장치
CN111197157A (zh) * 2018-11-16 2020-05-26 长鑫存储技术有限公司 具有工艺腔室实时监控功能的半导体制造装置
CN109959647B (zh) * 2019-04-17 2021-08-31 广东省新材料研究所 一种光谱诊断辅助装置
JP7343944B2 (ja) * 2021-01-29 2023-09-13 アトナープ株式会社 ガス分析装置および制御方法
KR102686910B1 (ko) 2021-08-09 2024-07-19 삼성전자주식회사 반도체 소자의 제조 장치 및 반도체 소자의 제조 방법

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US3843257A (en) * 1971-11-30 1974-10-22 Monsanto Res Corp Microwave-excited emission detector
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
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JPH0754293B2 (ja) * 1989-01-09 1995-06-07 横河電機株式会社 微粒子測定装置
JPH0411460U (de) * 1990-05-22 1992-01-30
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams
DE19505104A1 (de) * 1995-02-15 1996-08-22 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Verfahren und Anordnung zur Bestimmung der Reinheit und/oder des Drucks von Gasen für elektrische Lampen
JP3571404B2 (ja) * 1995-03-03 2004-09-29 アネルバ株式会社 プラズマｃｖｄ装置及びその場クリーニング後処理方法
US5825485A (en) * 1995-11-03 1998-10-20 Cohn; Daniel R. Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual
DE19544506C2 (de) * 1995-11-29 2000-08-10 Peter R Perzl Vorrichtung und Verfahren zur Analyse von Flüssigkeitszusammensetzungen mit Hilfe direkter Glimmentladung
US5986747A (en) * 1998-09-24 1999-11-16 Applied Materials, Inc. Apparatus and method for endpoint detection in non-ionizing gaseous reactor environments
US6366346B1 (en) * 1998-11-19 2002-04-02 Applied Materials, Inc. Method and apparatus for optical detection of effluent composition

Also Published As

Publication number Publication date
DE60036145T2 (de) 2008-05-21
US20030160956A1 (en) 2003-08-28
JP2010078616A (ja) 2010-04-08
EP1022559A1 (de) 2000-07-26
FR2788854A1 (fr) 2000-07-28
US6643014B2 (en) 2003-11-04
JP2000214092A (ja) 2000-08-04
FR2788854B1 (fr) 2001-05-04
DE60036145D1 (de) 2007-10-11
EP1022559B1 (de) 2007-08-29

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