ATE373071T1 - Zusammensetzung und verfahren zur behandlung von halbleitersubstraten - Google Patents

Zusammensetzung und verfahren zur behandlung von halbleitersubstraten

Info

Publication number
ATE373071T1
ATE373071T1 AT04447282T AT04447282T ATE373071T1 AT E373071 T1 ATE373071 T1 AT E373071T1 AT 04447282 T AT04447282 T AT 04447282T AT 04447282 T AT04447282 T AT 04447282T AT E373071 T1 ATE373071 T1 AT E373071T1
Authority
AT
Austria
Prior art keywords
composition
semiconductor substrates
treating semiconductor
substrate
cleaning
Prior art date
Application number
AT04447282T
Other languages
English (en)
Inventor
Waele Rita De
Rita Vos
Original Assignee
Imec Inter Uni Micro Electr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec Inter Uni Micro Electr filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of ATE373071T1 publication Critical patent/ATE373071T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/044—Hydroxides or bases
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3418—Toluene -, xylene -, cumene -, benzene - or naphthalene sulfonates or sulfates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
AT04447282T 2003-12-18 2004-12-17 Zusammensetzung und verfahren zur behandlung von halbleitersubstraten ATE373071T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US53152603P 2003-12-18 2003-12-18

Publications (1)

Publication Number Publication Date
ATE373071T1 true ATE373071T1 (de) 2007-09-15

Family

ID=34520289

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04447282T ATE373071T1 (de) 2003-12-18 2004-12-17 Zusammensetzung und verfahren zur behandlung von halbleitersubstraten

Country Status (4)

Country Link
US (2) US7432233B2 (de)
EP (1) EP1544284B1 (de)
AT (1) ATE373071T1 (de)
DE (1) DE602004008863T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602004009584T2 (de) * 2003-06-27 2008-08-07 Interuniversitair Microelektronica Centrum (Imec) Halbleiterreinigungslösung
CN101270325A (zh) * 2007-03-23 2008-09-24 安集微电子（上海）有限公司 一种清洗液及其应用
US20120295447A1 (en) * 2010-11-24 2012-11-22 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
JP6054736B2 (ja) * 2012-12-21 2016-12-27 花王株式会社 水硬性組成物
US10097521B2 (en) 2015-11-20 2018-10-09 Cisco Technology, Inc. Transparent encryption in a content centric network
RU2639433C2 (ru) * 2016-04-12 2017-12-21 Общество с ограниченной ответственностью "АНГАРА ДЕВЕЛОПМЕНТ", ООО "АНГАРА ДЕВЕЛОПМЕНТ" Раствор для удаления отложений различной природы
US11428482B2 (en) 2016-04-12 2022-08-30 Angara Global Ltd. Industrial cleaning systems, including solutions for removing various types of deposits, and cognitive cleaning
US10122624B2 (en) 2016-07-25 2018-11-06 Cisco Technology, Inc. System and method for ephemeral entries in a forwarding information base in a content centric network
RU2696990C2 (ru) * 2017-12-26 2019-08-08 Общество с ограниченной ответственностью "АНГАРА ДЕВЕЛОПМЕНТ" (ООО "АНГАРА ДЕВЕЛОПМЕНТ") Раствор для очистки поверхности от отложений различной природы
CN114038736B (zh) * 2021-11-10 2022-06-21 重庆臻宝实业有限公司 用于半导体材料的清洗方法
CN114574290B (zh) * 2022-01-21 2023-06-20 北京通美晶体技术股份有限公司 一种磷化铟清洗用清洗液及其制备方法与清洗方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE264012C (de) 1900-01-01
US3640825A (en) 1970-04-27 1972-02-08 Texaco Inc Drilling fluid
US4210498A (en) 1974-11-20 1980-07-01 Matsushita Electric Industrial Co., Ltd. Method of increasing the amplification of a transistor through use of organic compounds
JPS594698B2 (ja) 1975-09-08 1984-01-31 カブシキガイシヤ ケイアイピ− デンシフクシヤキニオケル セイギヨシンゴウハツセイソウチ
JPS61100919A (ja) * 1984-10-22 1986-05-19 ニチコン株式会社 アルミニウム電解コンデンサの駆動用電解液
US5022926A (en) 1988-06-10 1991-06-11 W. R. Grace & Co.-Conn. Corrosion control
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
CA2059841A1 (en) 1991-01-24 1992-07-25 Ichiro Hayashida Surface treating solutions and cleaning method
JP3075290B2 (ja) 1991-02-28 2000-08-14 三菱瓦斯化学株式会社 半導体基板の洗浄液
DE4136590A1 (de) 1991-11-07 1993-05-13 Bosch Gmbh Robert Pumpe
TW274630B (de) 1994-01-28 1996-04-21 Wako Zunyaku Kogyo Kk
US5466389A (en) 1994-04-20 1995-11-14 J. T. Baker Inc. PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates
KR100429440B1 (ko) 1995-07-27 2004-07-15 미쓰비시 가가꾸 가부시키가이샤 기체의표면처리방법및그에사용되는표면처리조성물
US6066609A (en) 1997-07-31 2000-05-23 Siemens Aktiengesellschaft Aqueous solution for cleaning a semiconductor substrate
EP1029703B1 (de) 1999-02-16 2004-05-12 Oji Paper Co., Ltd. Tintenstrahlaufzeichnungsmaterial mit verbesserter Lichtechtheit
KR100360397B1 (ko) * 1999-11-26 2002-11-18 삼성전자 주식회사 레지스트 제거용 조성물 및 이를 이용한 레지스트 제거 방법
US6599370B2 (en) * 2000-10-16 2003-07-29 Mallinckrodt Inc. Stabilized alkaline compositions for cleaning microelectronic substrates
FR2836142A1 (fr) 2002-02-15 2003-08-22 Rhodia Chimie Sa Procede de preparation d'une composition liquide d'un compose diphenolique de haute purete et composition obtenue

Also Published As

Publication number Publication date
US20060247142A1 (en) 2006-11-02
EP1544284A1 (de) 2005-06-22
EP1544284B1 (de) 2007-09-12
US7422019B2 (en) 2008-09-09
DE602004008863D1 (de) 2007-10-25
US7432233B2 (en) 2008-10-07
US20050159323A1 (en) 2005-07-21
DE602004008863T2 (de) 2008-06-12

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