ATE373831T1 - Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung - Google Patents

Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung

Info

Publication number
ATE373831T1
ATE373831T1 AT04732418T AT04732418T ATE373831T1 AT E373831 T1 ATE373831 T1 AT E373831T1 AT 04732418 T AT04732418 T AT 04732418T AT 04732418 T AT04732418 T AT 04732418T AT E373831 T1 ATE373831 T1 AT E373831T1
Authority
AT
Austria
Prior art keywords
electrodes
inspected
sheet
probe
part exposed
Prior art date
Application number
AT04732418T
Other languages
English (en)
Inventor
Kazuo Inoue
Katsumi Sato
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Application granted granted Critical
Publication of ATE373831T1 publication Critical patent/ATE373831T1/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/0735Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card arranged on a flexible frame or film
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Materials For Medical Uses (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
AT04732418T 2003-05-13 2004-05-12 Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung ATE373831T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003134450 2003-05-13

Publications (1)

Publication Number Publication Date
ATE373831T1 true ATE373831T1 (de) 2007-10-15

Family

ID=33447150

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04732418T ATE373831T1 (de) 2003-05-13 2004-05-12 Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung

Country Status (8)

Country Link
US (1) US7391227B2 (de)
EP (1) EP1624309B1 (de)
KR (1) KR101057517B1 (de)
CN (1) CN1788202A (de)
AT (1) ATE373831T1 (de)
DE (1) DE602004009057T2 (de)
TW (1) TWI239685B (de)
WO (1) WO2004102208A1 (de)

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US7446545B2 (en) * 2003-05-08 2008-11-04 Unitechno Inc. Anisotropically conductive sheet
TWI239685B (en) 2003-05-13 2005-09-11 Jsr Corp Flaky probe, its manufacturing method and its application
TW200540430A (en) * 2004-04-27 2005-12-16 Jsr Corp Sheet-like probe, method of producing the probe, and application of the probe
US7656176B2 (en) * 2004-10-29 2010-02-02 Jsr Corporation Probe member for wafer inspection, probe card for wafer inspection and wafer inspection equipment
EP1811310A4 (de) * 2004-11-12 2012-02-29 Jsr Corp Sondenglied zur waferinspektion, sondenkarten zu waferinspektion und wafer-inspektionsvorrichtung
JP2006194620A (ja) * 2005-01-11 2006-07-27 Tokyo Electron Ltd プローブカード及び検査用接触構造体
US20070054512A1 (en) * 2005-09-08 2007-03-08 International Business Machines Corporation Topography compensating land grid array interposer
SG148075A1 (en) * 2007-06-04 2008-12-31 Mjc Probe Inc Low leakage circuit board for probe card and low leakage probe card, and fabrication method of sames
KR100886712B1 (ko) * 2007-07-27 2009-03-04 주식회사 하이닉스반도체 반도체 패키지 및 이의 제조 방법
US8250441B2 (en) 2007-12-11 2012-08-21 Wi-Lan Inc. Outer coding framework for application packet error rate minimization
KR101232691B1 (ko) * 2008-02-29 2013-02-13 니혼 하츠쵸 가부시키가이샤 배선기판 및 프로브 카드
US20090267698A1 (en) * 2008-04-27 2009-10-29 Realtek Semiconductor Corp. Dual supply inverter for voltage controlled ring oscillator
TW201011830A (en) * 2008-09-03 2010-03-16 United Test Ct Inc Self-adhesive semiconductor wafer
CN102273016B (zh) * 2009-01-15 2013-11-06 保力马科技株式会社 连接器
US8509036B2 (en) 2010-12-09 2013-08-13 Tdk Corporation Method of burn-in testing for thermally assisted head
US8957692B2 (en) 2010-12-02 2015-02-17 Tdk Corporation Method for performing burn-in test
JP5597564B2 (ja) * 2011-02-04 2014-10-01 株式会社日本マイクロニクス プローブ装置及びその製造方法
JP2012204530A (ja) * 2011-03-24 2012-10-22 Toshiba Corp 半導体装置の製造方法
JP5389970B2 (ja) * 2012-03-26 2014-01-15 シャープ株式会社 撮像モジュール、および撮像モジュールの製造方法
JP6256454B2 (ja) * 2015-11-30 2018-01-10 株式会社デンソー ヒータプレート、このヒータプレートを用いる熱流束センサの製造装置、このヒータプレートの製造方法、及び、このヒータプレートの製造装置
JP6706076B2 (ja) * 2016-01-14 2020-06-03 新光電気工業株式会社 プローブガイド板及びその製造方法とプローブ装置
US11128072B1 (en) 2020-07-22 2021-09-21 TE Connectivity Services Gmbh Electrical connector assembly having variable height contacts
US11509080B2 (en) 2020-07-22 2022-11-22 Te Connectivity Solutions Gmbh Electrical connector assembly having hybrid conductive polymer contacts
US11509084B2 (en) 2020-07-24 2022-11-22 Te Connectivity Solutions Gmbh Electrical connector assembly having hybrid conductive polymer contacts
US11894629B2 (en) 2021-03-09 2024-02-06 Tyco Electronics Japan G.K. Electrical interconnect with conductive polymer contacts having tips with different shapes and sizes
US12051865B2 (en) 2021-12-28 2024-07-30 Te Connectivity Solutions Gmbh Socket connector
WO2023155122A1 (zh) * 2022-02-18 2023-08-24 宁德时代新能源科技股份有限公司 极片检测的方法和装置

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US5207585A (en) * 1990-10-31 1993-05-04 International Business Machines Corporation Thin interface pellicle for dense arrays of electrical interconnects
US5487999A (en) * 1991-06-04 1996-01-30 Micron Technology, Inc. Method for fabricating a penetration limited contact having a rough textured surface
KR100196195B1 (ko) * 1991-11-18 1999-06-15 이노우에 쥰이치 프로우브 카드
JP2867209B2 (ja) * 1993-08-27 1999-03-08 日東電工株式会社 フレキシブル回路基板と接触対象物との接続方法およびその構造
KR0140034B1 (ko) * 1993-12-16 1998-07-15 모리시다 요이치 반도체 웨이퍼 수납기, 반도체 웨이퍼의 검사용 집적회로 단자와 프로브 단자와의 접속방법 및 그 장치, 반도체 집적회로의 검사방법, 프로브카드 및 그 제조방법
JPH0837212A (ja) * 1994-07-22 1996-02-06 Tokyo Electron Ltd プローブヘッドおよびそれを用いた検査方法
US5896038A (en) * 1996-11-08 1999-04-20 W. L. Gore & Associates, Inc. Method of wafer level burn-in
JP3188876B2 (ja) * 1997-12-29 2001-07-16 インターナショナル・ビジネス・マシーンズ・コーポレ−ション プロダクト・チップをテストする方法、テスト・ヘッド及びテスト装置
JP2000106482A (ja) * 1998-07-29 2000-04-11 Sony Chem Corp フレキシブル基板製造方法
US6552555B1 (en) * 1998-11-19 2003-04-22 Custom One Design, Inc. Integrated circuit testing apparatus
JP4083350B2 (ja) * 1999-06-30 2008-04-30 Hoya株式会社 バンプ付きメンブレンリングの製造方法
JP2001056346A (ja) * 1999-08-19 2001-02-27 Fujitsu Ltd プローブカード及び複数の半導体装置が形成されたウエハの試験方法
US6690184B1 (en) * 2000-08-31 2004-02-10 Micron Technology, Inc. Air socket for testing integrated circuits
JP3631451B2 (ja) * 2001-02-05 2005-03-23 松下電器産業株式会社 半導体集積回路の検査装置および検査方法
JP2003077559A (ja) * 2001-08-31 2003-03-14 Jsr Corp 異方導電性コネクターおよびその製造方法並びにその応用製品
JP3685192B2 (ja) * 2002-08-09 2005-08-17 Jsr株式会社 異方導電性コネクターおよび導電性ペースト組成物、プローブ部材並びにウエハ検査装置およびウエハ検査方法
TWI239685B (en) 2003-05-13 2005-09-11 Jsr Corp Flaky probe, its manufacturing method and its application

Also Published As

Publication number Publication date
EP1624309A1 (de) 2006-02-08
DE602004009057D1 (de) 2007-10-31
EP1624309B1 (de) 2007-09-19
KR20060011864A (ko) 2006-02-03
TW200428699A (en) 2004-12-16
TWI239685B (en) 2005-09-11
KR101057517B1 (ko) 2011-08-17
US20070069743A1 (en) 2007-03-29
DE602004009057T2 (de) 2008-07-03
US7391227B2 (en) 2008-06-24
EP1624309A4 (de) 2006-05-31
WO2004102208A1 (ja) 2004-11-25
CN1788202A (zh) 2006-06-14

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Legal Events

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