ATE373831T1 - Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung - Google Patents
Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendungInfo
- Publication number
- ATE373831T1 ATE373831T1 AT04732418T AT04732418T ATE373831T1 AT E373831 T1 ATE373831 T1 AT E373831T1 AT 04732418 T AT04732418 T AT 04732418T AT 04732418 T AT04732418 T AT 04732418T AT E373831 T1 ATE373831 T1 AT E373831T1
- Authority
- AT
- Austria
- Prior art keywords
- electrodes
- inspected
- sheet
- probe
- part exposed
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/0735—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card arranged on a flexible frame or film
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Materials For Medical Uses (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003134450 | 2003-05-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE373831T1 true ATE373831T1 (de) | 2007-10-15 |
Family
ID=33447150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04732418T ATE373831T1 (de) | 2003-05-13 | 2004-05-12 | Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7391227B2 (de) |
| EP (1) | EP1624309B1 (de) |
| KR (1) | KR101057517B1 (de) |
| CN (1) | CN1788202A (de) |
| AT (1) | ATE373831T1 (de) |
| DE (1) | DE602004009057T2 (de) |
| TW (1) | TWI239685B (de) |
| WO (1) | WO2004102208A1 (de) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7446545B2 (en) * | 2003-05-08 | 2008-11-04 | Unitechno Inc. | Anisotropically conductive sheet |
| TWI239685B (en) | 2003-05-13 | 2005-09-11 | Jsr Corp | Flaky probe, its manufacturing method and its application |
| TW200540430A (en) * | 2004-04-27 | 2005-12-16 | Jsr Corp | Sheet-like probe, method of producing the probe, and application of the probe |
| US7656176B2 (en) * | 2004-10-29 | 2010-02-02 | Jsr Corporation | Probe member for wafer inspection, probe card for wafer inspection and wafer inspection equipment |
| EP1811310A4 (de) * | 2004-11-12 | 2012-02-29 | Jsr Corp | Sondenglied zur waferinspektion, sondenkarten zu waferinspektion und wafer-inspektionsvorrichtung |
| JP2006194620A (ja) * | 2005-01-11 | 2006-07-27 | Tokyo Electron Ltd | プローブカード及び検査用接触構造体 |
| US20070054512A1 (en) * | 2005-09-08 | 2007-03-08 | International Business Machines Corporation | Topography compensating land grid array interposer |
| SG148075A1 (en) * | 2007-06-04 | 2008-12-31 | Mjc Probe Inc | Low leakage circuit board for probe card and low leakage probe card, and fabrication method of sames |
| KR100886712B1 (ko) * | 2007-07-27 | 2009-03-04 | 주식회사 하이닉스반도체 | 반도체 패키지 및 이의 제조 방법 |
| US8250441B2 (en) | 2007-12-11 | 2012-08-21 | Wi-Lan Inc. | Outer coding framework for application packet error rate minimization |
| KR101232691B1 (ko) * | 2008-02-29 | 2013-02-13 | 니혼 하츠쵸 가부시키가이샤 | 배선기판 및 프로브 카드 |
| US20090267698A1 (en) * | 2008-04-27 | 2009-10-29 | Realtek Semiconductor Corp. | Dual supply inverter for voltage controlled ring oscillator |
| TW201011830A (en) * | 2008-09-03 | 2010-03-16 | United Test Ct Inc | Self-adhesive semiconductor wafer |
| CN102273016B (zh) * | 2009-01-15 | 2013-11-06 | 保力马科技株式会社 | 连接器 |
| US8509036B2 (en) | 2010-12-09 | 2013-08-13 | Tdk Corporation | Method of burn-in testing for thermally assisted head |
| US8957692B2 (en) | 2010-12-02 | 2015-02-17 | Tdk Corporation | Method for performing burn-in test |
| JP5597564B2 (ja) * | 2011-02-04 | 2014-10-01 | 株式会社日本マイクロニクス | プローブ装置及びその製造方法 |
| JP2012204530A (ja) * | 2011-03-24 | 2012-10-22 | Toshiba Corp | 半導体装置の製造方法 |
| JP5389970B2 (ja) * | 2012-03-26 | 2014-01-15 | シャープ株式会社 | 撮像モジュール、および撮像モジュールの製造方法 |
| JP6256454B2 (ja) * | 2015-11-30 | 2018-01-10 | 株式会社デンソー | ヒータプレート、このヒータプレートを用いる熱流束センサの製造装置、このヒータプレートの製造方法、及び、このヒータプレートの製造装置 |
| JP6706076B2 (ja) * | 2016-01-14 | 2020-06-03 | 新光電気工業株式会社 | プローブガイド板及びその製造方法とプローブ装置 |
| US11128072B1 (en) | 2020-07-22 | 2021-09-21 | TE Connectivity Services Gmbh | Electrical connector assembly having variable height contacts |
| US11509080B2 (en) | 2020-07-22 | 2022-11-22 | Te Connectivity Solutions Gmbh | Electrical connector assembly having hybrid conductive polymer contacts |
| US11509084B2 (en) | 2020-07-24 | 2022-11-22 | Te Connectivity Solutions Gmbh | Electrical connector assembly having hybrid conductive polymer contacts |
| US11894629B2 (en) | 2021-03-09 | 2024-02-06 | Tyco Electronics Japan G.K. | Electrical interconnect with conductive polymer contacts having tips with different shapes and sizes |
| US12051865B2 (en) | 2021-12-28 | 2024-07-30 | Te Connectivity Solutions Gmbh | Socket connector |
| WO2023155122A1 (zh) * | 2022-02-18 | 2023-08-24 | 宁德时代新能源科技股份有限公司 | 极片检测的方法和装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5207585A (en) * | 1990-10-31 | 1993-05-04 | International Business Machines Corporation | Thin interface pellicle for dense arrays of electrical interconnects |
| US5487999A (en) * | 1991-06-04 | 1996-01-30 | Micron Technology, Inc. | Method for fabricating a penetration limited contact having a rough textured surface |
| KR100196195B1 (ko) * | 1991-11-18 | 1999-06-15 | 이노우에 쥰이치 | 프로우브 카드 |
| JP2867209B2 (ja) * | 1993-08-27 | 1999-03-08 | 日東電工株式会社 | フレキシブル回路基板と接触対象物との接続方法およびその構造 |
| KR0140034B1 (ko) * | 1993-12-16 | 1998-07-15 | 모리시다 요이치 | 반도체 웨이퍼 수납기, 반도체 웨이퍼의 검사용 집적회로 단자와 프로브 단자와의 접속방법 및 그 장치, 반도체 집적회로의 검사방법, 프로브카드 및 그 제조방법 |
| JPH0837212A (ja) * | 1994-07-22 | 1996-02-06 | Tokyo Electron Ltd | プローブヘッドおよびそれを用いた検査方法 |
| US5896038A (en) * | 1996-11-08 | 1999-04-20 | W. L. Gore & Associates, Inc. | Method of wafer level burn-in |
| JP3188876B2 (ja) * | 1997-12-29 | 2001-07-16 | インターナショナル・ビジネス・マシーンズ・コーポレ−ション | プロダクト・チップをテストする方法、テスト・ヘッド及びテスト装置 |
| JP2000106482A (ja) * | 1998-07-29 | 2000-04-11 | Sony Chem Corp | フレキシブル基板製造方法 |
| US6552555B1 (en) * | 1998-11-19 | 2003-04-22 | Custom One Design, Inc. | Integrated circuit testing apparatus |
| JP4083350B2 (ja) * | 1999-06-30 | 2008-04-30 | Hoya株式会社 | バンプ付きメンブレンリングの製造方法 |
| JP2001056346A (ja) * | 1999-08-19 | 2001-02-27 | Fujitsu Ltd | プローブカード及び複数の半導体装置が形成されたウエハの試験方法 |
| US6690184B1 (en) * | 2000-08-31 | 2004-02-10 | Micron Technology, Inc. | Air socket for testing integrated circuits |
| JP3631451B2 (ja) * | 2001-02-05 | 2005-03-23 | 松下電器産業株式会社 | 半導体集積回路の検査装置および検査方法 |
| JP2003077559A (ja) * | 2001-08-31 | 2003-03-14 | Jsr Corp | 異方導電性コネクターおよびその製造方法並びにその応用製品 |
| JP3685192B2 (ja) * | 2002-08-09 | 2005-08-17 | Jsr株式会社 | 異方導電性コネクターおよび導電性ペースト組成物、プローブ部材並びにウエハ検査装置およびウエハ検査方法 |
| TWI239685B (en) | 2003-05-13 | 2005-09-11 | Jsr Corp | Flaky probe, its manufacturing method and its application |
-
2004
- 2004-05-06 TW TW093112778A patent/TWI239685B/zh not_active IP Right Cessation
- 2004-05-12 AT AT04732418T patent/ATE373831T1/de not_active IP Right Cessation
- 2004-05-12 EP EP04732418A patent/EP1624309B1/de not_active Expired - Lifetime
- 2004-05-12 CN CNA2004800128809A patent/CN1788202A/zh active Pending
- 2004-05-12 US US10/556,782 patent/US7391227B2/en not_active Expired - Lifetime
- 2004-05-12 WO PCT/JP2004/006385 patent/WO2004102208A1/ja not_active Ceased
- 2004-05-12 KR KR1020057021523A patent/KR101057517B1/ko not_active Expired - Fee Related
- 2004-05-12 DE DE602004009057T patent/DE602004009057T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1624309A1 (de) | 2006-02-08 |
| DE602004009057D1 (de) | 2007-10-31 |
| EP1624309B1 (de) | 2007-09-19 |
| KR20060011864A (ko) | 2006-02-03 |
| TW200428699A (en) | 2004-12-16 |
| TWI239685B (en) | 2005-09-11 |
| KR101057517B1 (ko) | 2011-08-17 |
| US20070069743A1 (en) | 2007-03-29 |
| DE602004009057T2 (de) | 2008-07-03 |
| US7391227B2 (en) | 2008-06-24 |
| EP1624309A4 (de) | 2006-05-31 |
| WO2004102208A1 (ja) | 2004-11-25 |
| CN1788202A (zh) | 2006-06-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE373831T1 (de) | Plattenförmige sonde, prozess zu ihrer herstellung und ihrer anwendung | |
| TW200602645A (en) | Method of manufacturing sheetlike probe and its application | |
| ATE494645T1 (de) | ßANISOTROPER LEITFÄHIGER VERBINDER, HERSTELLUNGSVERFAHREN DAFÜR UND SONDENGLIEDß | |
| US7771220B2 (en) | Electrical connecting apparatus | |
| TW382114B (en) | Probe apparatus for display panel and probe positioning method | |
| DE60314164D1 (de) | Prüfverbinder mit anisotroper leitfähigkeit | |
| JP2004095547A5 (de) | ||
| CN102200552A (zh) | 硅片的方块电阻的测试方法及设备 | |
| EP1353366A3 (de) | Nichtinvasive, elektrische Messung an Halbleiterscheiben | |
| TW200745578A (en) | Inspection apparatus of testing a flat panel display and method of fabricating the same | |
| TWI256476B (en) | Connector for measurement of electrical resistance and production process thereof, and measuring apparatus and measuring method of electrical resistance for circuit board | |
| TW200505100A (en) | Anisotropic conductive sheet and its manufacturing method, adaptor device and its manufacturing method, and circuit device electric test instrument | |
| JP2005300545A5 (de) | ||
| KR20180130687A (ko) | 전자 소자 검사용 프로브 | |
| TW200633314A (en) | Probe member for wafer inspection, probe card for wafer inspection and wafer inspection apparatus | |
| KR20190011869A (ko) | 전기 비저항 측정 장치 | |
| KR920006749A (ko) | 프로우브 장치 | |
| JP2008076268A (ja) | 検査用治具 | |
| TW201132997A (en) | Substrate inspection device | |
| MY138997A (en) | Double side probing of semiconductor devices | |
| JP2005093603A5 (de) | ||
| TW201250261A (en) | Electrical connecting apparatus and testing apparatus using the same | |
| CN210166447U (zh) | 太阳能电池的电压测量设备 | |
| KR100452537B1 (ko) | 접촉자 블록 및 전기적 접속장치 | |
| TW200619635A (en) | Sheet-like probe, its manufacturing method, and its application |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |