ATE374961T1 - Zoomvorrichtung, insbesondere zoomvorrichtung für eine beleuchtungsvorrichtung einer mikrolithographie-projektionsvorrichtung - Google Patents

Zoomvorrichtung, insbesondere zoomvorrichtung für eine beleuchtungsvorrichtung einer mikrolithographie-projektionsvorrichtung

Info

Publication number
ATE374961T1
ATE374961T1 AT02758488T AT02758488T ATE374961T1 AT E374961 T1 ATE374961 T1 AT E374961T1 AT 02758488 T AT02758488 T AT 02758488T AT 02758488 T AT02758488 T AT 02758488T AT E374961 T1 ATE374961 T1 AT E374961T1
Authority
AT
Austria
Prior art keywords
plane
zoom
image plane
image
illumination
Prior art date
Application number
AT02758488T
Other languages
English (en)
Inventor
Jess Koehler
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of ATE374961T1 publication Critical patent/ATE374961T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/144—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only
    • G02B15/1441—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive
    • G02B15/144113—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive arranged +-++
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/16—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group
    • G02B15/163—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group
    • G02B15/167—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses
    • G02B15/173—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses arranged +-+
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
AT02758488T 2001-09-05 2002-08-30 Zoomvorrichtung, insbesondere zoomvorrichtung für eine beleuchtungsvorrichtung einer mikrolithographie-projektionsvorrichtung ATE374961T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10144244A DE10144244A1 (de) 2001-09-05 2001-09-05 Zoom-System, insbesondere für eine Beleuchtungseinrichtung

Publications (1)

Publication Number Publication Date
ATE374961T1 true ATE374961T1 (de) 2007-10-15

Family

ID=7698294

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02758488T ATE374961T1 (de) 2001-09-05 2002-08-30 Zoomvorrichtung, insbesondere zoomvorrichtung für eine beleuchtungsvorrichtung einer mikrolithographie-projektionsvorrichtung

Country Status (7)

Country Link
US (1) US6900946B2 (de)
EP (1) EP1423758B1 (de)
JP (1) JP2005503011A (de)
KR (1) KR20040044540A (de)
AT (1) ATE374961T1 (de)
DE (2) DE10144244A1 (de)
WO (1) WO2003023521A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060268251A1 (en) * 2003-07-16 2006-11-30 Markus Deguenther Illumination system for a microlithographic projection exposure apparatus
JP2005301054A (ja) * 2004-04-14 2005-10-27 Canon Inc 照明光学系及びそれを用いた露光装置
US7283209B2 (en) * 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US7835076B2 (en) * 2005-10-27 2010-11-16 Yale University Optical system for illumination of an evanescent field
US7352789B2 (en) * 2006-01-12 2008-04-01 Semiconductor Energy Laboratory Co., Ltd. Laser light irradiation apparatus and laser light irradiation method
JP5100127B2 (ja) * 2006-01-12 2012-12-19 株式会社半導体エネルギー研究所 レ−ザー光照射装置
US7508514B2 (en) * 2006-06-23 2009-03-24 Asml Holding N.V. Correction of off-axis translation of optical elements in an optical zoom assembly
US7706078B2 (en) 2006-09-14 2010-04-27 Semiconductor Energy Laboratory Co., Ltd. Laser light irradiation apparatus and laser light irradiation method
JP5210574B2 (ja) * 2006-09-14 2013-06-12 株式会社半導体エネルギー研究所 レーザ照射装置
KR100946248B1 (ko) * 2008-01-09 2010-03-09 주식회사 프로텍 회절광학소자에 의해 형성된 다중 빔을 이용하여 다중노광을 수행하는 다중 노광시스템
DE102009037366A1 (de) * 2009-08-13 2011-02-17 Carl Zeiss Microlmaging Gmbh Mikroskop, insbesondere zur Messung von Totalreflexions-Fluoreszenz, und Betriebsverfahren für ein solches
JP5165099B2 (ja) * 2010-12-10 2013-03-21 キヤノン株式会社 撮像装置及びレンズユニット
US9551914B2 (en) * 2011-03-07 2017-01-24 Microsoft Technology Licensing, Llc Illuminator with refractive optical element
JP5971965B2 (ja) * 2012-02-07 2016-08-17 キヤノン株式会社 面形状計測方法、面形状計測装置、プログラム、および、光学素子の製造方法
US9479686B2 (en) 2014-02-19 2016-10-25 Melvyn H Kreitzer Zoom lens optical system
KR101913654B1 (ko) * 2017-05-30 2018-12-28 학교법인 한동대학교 주밍기구가 포함된 빔 균질기
CN109884801B (zh) * 2018-12-31 2024-10-18 苏州大学 连续变焦激光整形系统
CN110850599A (zh) * 2019-08-19 2020-02-28 上海鲲游光电科技有限公司 红外泛光照明组件
US12162093B2 (en) 2020-08-25 2024-12-10 Ii-Vi Delaware, Inc. High leverage beam wobbling
US12275084B2 (en) 2020-08-25 2025-04-15 Ii-Vi Delaware, Inc. Dynamic beam deflection and shaping for laser process

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
DE4124311A1 (de) 1991-07-23 1993-01-28 Zeiss Carl Fa Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE4421053A1 (de) * 1994-06-17 1995-12-21 Zeiss Carl Fa Beleuchtungseinrichtung
EP0687956B2 (de) 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
JPH10209028A (ja) * 1997-01-16 1998-08-07 Nikon Corp 照明光学装置及び半導体素子の製造方法
EP1014196A3 (de) * 1998-12-17 2002-05-29 Nikon Corporation Beleuchtungsverfahren und -System für einen optischen Projektionsapparat
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
EP1256033B1 (de) * 2000-02-16 2007-07-25 ASML Holding N.V. Zoom-beleuchtungssystem zur verwendung in der photolithographie

Also Published As

Publication number Publication date
DE10144244A1 (de) 2003-03-20
DE60222786T2 (de) 2008-07-17
EP1423758A1 (de) 2004-06-02
KR20040044540A (ko) 2004-05-28
US20040257669A1 (en) 2004-12-23
EP1423758B1 (de) 2007-10-03
WO2003023521A1 (en) 2003-03-20
JP2005503011A (ja) 2005-01-27
DE60222786D1 (de) 2007-11-15
US6900946B2 (en) 2005-05-31

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