ATE377632T1 - Verfahren zur herstellung eines hydrophoben kieselsäurepulvers - Google Patents
Verfahren zur herstellung eines hydrophoben kieselsäurepulversInfo
- Publication number
- ATE377632T1 ATE377632T1 AT05025044T AT05025044T ATE377632T1 AT E377632 T1 ATE377632 T1 AT E377632T1 AT 05025044 T AT05025044 T AT 05025044T AT 05025044 T AT05025044 T AT 05025044T AT E377632 T1 ATE377632 T1 AT E377632T1
- Authority
- AT
- Austria
- Prior art keywords
- hydrophobic
- silica
- producing
- silicic acid
- acid powder
- Prior art date
Links
- 230000002209 hydrophobic effect Effects 0.000 title abstract 6
- 239000000843 powder Substances 0.000 title abstract 3
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 235000012239 silicon dioxide Nutrition 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 239000008119 colloidal silica Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 230000002431 foraging effect Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000002002 slurry Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/149—Coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004331319 | 2004-11-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE377632T1 true ATE377632T1 (de) | 2007-11-15 |
Family
ID=35759142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05025044T ATE377632T1 (de) | 2004-11-16 | 2005-11-16 | Verfahren zur herstellung eines hydrophoben kieselsäurepulvers |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20060112860A1 (de) |
| EP (1) | EP1657283B1 (de) |
| AT (1) | ATE377632T1 (de) |
| DE (1) | DE602005003192T2 (de) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2275039T3 (es) | 2003-04-24 | 2007-06-01 | Goldschmidt Gmbh | Procedimiento para la produccion de revestimientos laminares desprendibles, repelentes de la suciedad y del agua. |
| US8034173B2 (en) * | 2003-12-18 | 2011-10-11 | Evonik Degussa Gmbh | Processing compositions and method of forming the same |
| US20070202425A1 (en) * | 2006-02-27 | 2007-08-30 | Kousuke Satou | Toner and image forming apparatus |
| US8435474B2 (en) * | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
| US8202502B2 (en) * | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
| US8455165B2 (en) * | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
| US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
| JPWO2008123373A1 (ja) * | 2007-03-27 | 2010-07-15 | 扶桑化学工業株式会社 | コロイダルシリカ及びその製造方法 |
| JP4579265B2 (ja) * | 2007-04-25 | 2010-11-10 | 信越化学工業株式会社 | 高度の流動性を有する疎水性球状シリカ微粒子、その製造方法、それを用いた静電荷像現像用トナー外添剤およびそれを含有する有機樹脂組成物 |
| JP5194563B2 (ja) * | 2007-05-28 | 2013-05-08 | 信越化学工業株式会社 | 耐擦傷性コーティング組成物、及び被覆物品 |
| JP2009015260A (ja) * | 2007-07-09 | 2009-01-22 | Sharp Corp | トナー用外添剤、それを用いたトナーおよび画像形成装置 |
| EP2145929B1 (de) * | 2008-07-18 | 2020-06-24 | Evonik Operations GmbH | Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel |
| TWI488746B (zh) * | 2009-02-13 | 2015-06-21 | Toyo Aluminium Kk | 層積體及容器 |
| JP5591530B2 (ja) * | 2009-06-24 | 2014-09-17 | 日揮触媒化成株式会社 | シリカ系微粒子分散ゾルの製造方法、シリカ系微粒子分散ゾル、該分散ゾルを含む塗料組成物、硬化性塗膜および硬化性塗膜付き基材 |
| JP5477192B2 (ja) * | 2010-06-23 | 2014-04-23 | 富士ゼロックス株式会社 | シリカ粒子の製造方法 |
| JP5811620B2 (ja) | 2010-12-13 | 2015-11-11 | 富士ゼロックス株式会社 | シリカ粒子の製造方法 |
| JP5906635B2 (ja) * | 2011-09-26 | 2016-04-20 | 富士ゼロックス株式会社 | シリカ粒子分散液の製造方法 |
| US9321515B2 (en) | 2012-03-02 | 2016-04-26 | Sea-Bird Electronics, Inc. | Fluid-based buoyancy compensation |
| CN103451946A (zh) * | 2012-05-31 | 2013-12-18 | 陈曦 | 一种多功能纤维的制备方法 |
| CN104745145A (zh) * | 2013-12-26 | 2015-07-01 | 安集微电子（上海）有限公司 | 一种二氧化硅颗粒改性的制备方法及应用 |
| CN106414328B (zh) * | 2014-06-03 | 2019-01-22 | Az电子材料（卢森堡）有限公司 | 表面改性二氧化硅纳米颗粒的制造方法以及表面改性二氧化硅纳米颗粒 |
| DE102015211812A1 (de) * | 2015-06-25 | 2016-12-29 | Wacker Chemie Ag | Wirtschaftliches Verfahren zur Herstellung von organisch modifizierten Lyo- oder Aerogelen |
| CN111040472B (zh) * | 2019-11-12 | 2021-09-14 | 中国石油天然气集团公司 | 改性纳米二氧化硅及其改性方法、防腐涂料和涂层 |
| CN113213492B (zh) * | 2021-05-26 | 2022-11-22 | 华北水利水电大学 | 超疏水二氧化硅气凝胶及其制备方法、超疏水多孔膜及其制备方法和应用 |
| MY207235A (en) | 2021-08-31 | 2025-02-07 | Nissan Chemical Corp | Dispersion of surface-treated silica-containing inorganic oxide particles and method for producing same |
| CN115246729A (zh) * | 2022-08-08 | 2022-10-28 | 温州吉邦科技发展有限公司 | 一种抗裂防渗的干混抹灰砂浆及其加工工艺 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2403783C2 (de) * | 1974-01-26 | 1982-10-21 | Bayer Ag, 5090 Leverkusen | Verfahren zur Herstellung hydrophobierter pyrogener Kieselsäure |
| JPS58145614A (ja) | 1982-02-23 | 1983-08-30 | Shokubai Kasei Kogyo Kk | 有機溶剤に均質に分散可能な粉末状シリカとその製造法 |
| JPH0764544B2 (ja) | 1989-12-15 | 1995-07-12 | 信越化学工業株式会社 | シリカ粉末の製造方法 |
| JP3284743B2 (ja) | 1994-04-19 | 2002-05-20 | 東レ株式会社 | 粒子分散性に優れたポリエステル組成物の製造方法 |
| DE19756831A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
| US5919298A (en) * | 1998-01-12 | 1999-07-06 | Dow Corning Corporation | Method for preparing hydrophobic fumed silica |
| JP3756339B2 (ja) | 1998-05-18 | 2006-03-15 | 信越化学工業株式会社 | シラン表面処理シリカ系微粒子、その製造方法およびそれを含有する有機樹脂組成物 |
| DE69927427T2 (de) * | 1998-05-18 | 2006-03-16 | Shin-Etsu Chemical Co., Ltd. | Mit Silan oberflächenbehandelte Kieselsäureteilchen, Verfahren zu ihrer Herstellung und ihre Verwendung |
| US6051672A (en) * | 1998-08-24 | 2000-04-18 | Dow Corning Corporation | Method for making hydrophobic non-aggregated colloidal silica |
| JP2000256008A (ja) | 1999-03-08 | 2000-09-19 | Tokuyama Corp | 疎水性煙霧シリカ及びその製造方法 |
| US6184408B1 (en) | 1999-04-28 | 2001-02-06 | Dow Corning Corporation | Method for preparation of hydrophobic precipitated silica |
| JP4828032B2 (ja) | 2001-03-05 | 2011-11-30 | 株式会社トクヤマ | 疎水性シリカ粉末およびその製造方法 |
| JP2004168559A (ja) | 2002-11-15 | 2004-06-17 | Nippon Aerosil Co Ltd | 高分散高疎水性シリカ粉末とその製造方法 |
-
2005
- 2005-11-14 US US11/271,746 patent/US20060112860A1/en not_active Abandoned
- 2005-11-16 DE DE602005003192T patent/DE602005003192T2/de not_active Expired - Lifetime
- 2005-11-16 AT AT05025044T patent/ATE377632T1/de not_active IP Right Cessation
- 2005-11-16 EP EP05025044A patent/EP1657283B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20060112860A1 (en) | 2006-06-01 |
| EP1657283A1 (de) | 2006-05-17 |
| EP1657283B1 (de) | 2007-11-07 |
| DE602005003192T2 (de) | 2008-08-28 |
| DE602005003192D1 (de) | 2007-12-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |