ATE383655T1 - Doppelaufhärtungs-b-stapelbare unterfüllung für das wafer-niveau - Google Patents

Doppelaufhärtungs-b-stapelbare unterfüllung für das wafer-niveau

Info

Publication number
ATE383655T1
ATE383655T1 AT02805072T AT02805072T ATE383655T1 AT E383655 T1 ATE383655 T1 AT E383655T1 AT 02805072 T AT02805072 T AT 02805072T AT 02805072 T AT02805072 T AT 02805072T AT E383655 T1 ATE383655 T1 AT E383655T1
Authority
AT
Austria
Prior art keywords
wafer level
dual curing
level backing
stackable wafer
composition
Prior art date
Application number
AT02805072T
Other languages
English (en)
Inventor
Bodan Ma
Sun-Hee Lehmann
Quinn Tong
Original Assignee
Nat Starch Chem Invest
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21799738&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE383655(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nat Starch Chem Invest filed Critical Nat Starch Chem Invest
Application granted granted Critical
Publication of ATE383655T1 publication Critical patent/ATE383655T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/01Manufacture or treatment
    • H10W74/012Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/013Manufacture or treatment of die-attach connectors
    • H10W72/01331Manufacture or treatment of die-attach connectors using blanket deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • H10W72/07331Connecting techniques
    • H10W72/07337Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • H10W72/07338Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/352Materials of die-attach connectors comprising metals or metalloids, e.g. solders
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/353Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H10W72/354Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/853On the same surface
    • H10W72/856Bump connectors and die-attach connectors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Wire Bonding (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Solid Fuels And Fuel-Associated Substances (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Looms (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
AT02805072T 2001-12-14 2002-11-19 Doppelaufhärtungs-b-stapelbare unterfüllung für das wafer-niveau ATE383655T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/020,638 US6833629B2 (en) 2001-12-14 2001-12-14 Dual cure B-stageable underfill for wafer level

Publications (1)

Publication Number Publication Date
ATE383655T1 true ATE383655T1 (de) 2008-01-15

Family

ID=21799738

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02805072T ATE383655T1 (de) 2001-12-14 2002-11-19 Doppelaufhärtungs-b-stapelbare unterfüllung für das wafer-niveau

Country Status (11)

Country Link
US (1) US6833629B2 (de)
EP (1) EP1461829B2 (de)
JP (1) JP4299140B2 (de)
KR (1) KR100932998B1 (de)
CN (1) CN1307701C (de)
AT (1) ATE383655T1 (de)
AU (1) AU2002366498A1 (de)
DE (1) DE60224581T2 (de)
DK (1) DK1461829T3 (de)
TW (1) TWI238476B (de)
WO (1) WO2003052813A2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833629B2 (en) 2001-12-14 2004-12-21 National Starch And Chemical Investment Holding Corporation Dual cure B-stageable underfill for wafer level
US20030129438A1 (en) * 2001-12-14 2003-07-10 Becker Kevin Harris Dual cure B-stageable adhesive for die attach
US20030162911A1 (en) * 2002-01-31 2003-08-28 Yue Xiao No flow underfill composition
US7473995B2 (en) * 2002-03-25 2009-01-06 Intel Corporation Integrated heat spreader, heat sink or heat pipe with pre-attached phase change thermal interface material and method of making an electronic assembly
US7846778B2 (en) * 2002-02-08 2010-12-07 Intel Corporation Integrated heat spreader, heat sink or heat pipe with pre-attached phase change thermal interface material and method of making an electronic assembly
US20060194064A1 (en) * 2002-03-01 2006-08-31 Xiao Allison Y Underfill encapsulant for wafer packaging and method for its application
US7037399B2 (en) * 2002-03-01 2006-05-02 National Starch And Chemical Investment Holding Corporation Underfill encapsulant for wafer packaging and method for its application
US20060147719A1 (en) * 2002-11-22 2006-07-06 Slawomir Rubinsztajn Curable composition, underfill, and method
US20050049334A1 (en) * 2003-09-03 2005-03-03 Slawomir Rubinsztain Solvent-modified resin system containing filler that has high Tg, transparency and good reliability in wafer level underfill applications
US7022410B2 (en) * 2003-12-16 2006-04-04 General Electric Company Combinations of resin compositions and methods of use thereof
US7176044B2 (en) 2002-11-25 2007-02-13 Henkel Corporation B-stageable die attach adhesives
US20040158008A1 (en) * 2003-02-06 2004-08-12 Xiping He Room temperature printable adhesive paste
US6885108B2 (en) * 2003-03-18 2005-04-26 Micron Technology, Inc. Protective layers formed on semiconductor device components so as to reduce or eliminate the occurrence of delamination thereof and cracking therein
WO2005030890A1 (ja) 2003-09-30 2005-04-07 Kansai Paint Co., Ltd. 塗料組成物及び塗膜形成方法
KR100975088B1 (ko) 2003-11-21 2010-08-11 로드코포레이션 이중 단계 웨이퍼 적용 언더필
US6908789B1 (en) * 2003-12-15 2005-06-21 Intel Corporation Method of making a microelectronic assembly
US7560519B2 (en) * 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
DE102005046280B4 (de) 2005-09-27 2007-11-08 Infineon Technologies Ag Halbleiterbauteil mit einem Halbleiterchip sowie Verfahren zur Herstellung desselben
US20080039560A1 (en) * 2006-08-11 2008-02-14 General Electric Company Syneretic composition, associated method and article
US20080039542A1 (en) * 2006-08-11 2008-02-14 General Electric Company Composition and associated method
US20080039608A1 (en) * 2006-08-11 2008-02-14 General Electric Company Oxetane composition, associated method and article
US20080121845A1 (en) * 2006-08-11 2008-05-29 General Electric Company Oxetane composition, associated method and article
KR100792950B1 (ko) * 2007-01-19 2008-01-08 엘에스전선 주식회사 반도체 패키징 방법
TW200948888A (en) * 2008-04-16 2009-12-01 Henkel Corp Flow controllable B-stageable composition
WO2009141949A1 (ja) * 2008-05-23 2009-11-26 パナソニック株式会社 実装構造体の製造方法、および実装構造体
US9093448B2 (en) 2008-11-25 2015-07-28 Lord Corporation Methods for protecting a die surface with photocurable materials
CN102224583B (zh) * 2008-11-25 2014-09-10 洛德公司 使用光固化性材料保护晶片表面的方法
TWI456012B (zh) * 2010-06-08 2014-10-11 漢高智慧財產控股公司 使用脈衝式uv光源之晶圓背面塗覆方法
JP6175515B2 (ja) * 2013-01-23 2017-08-02 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング アンダーフィル組成物およびそれを使用したパッケージング工程
WO2015017615A1 (en) * 2013-08-02 2015-02-05 Alpha Metals, Inc. Dual-side reinforcement flux for encapsulation
KR102592641B1 (ko) * 2015-10-07 2023-10-24 헨켈 아게 운트 코. 카게아아 3d tsv 패키지용 제제 및 그의 용도
JP6224188B1 (ja) * 2016-08-08 2017-11-01 太陽インキ製造株式会社 半導体封止材
WO2026055282A1 (en) * 2024-09-05 2026-03-12 Henkel Ag & Co. Kgaa Non-conductive films for electronic devices and encapsulation applications

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3746686A (en) 1971-07-12 1973-07-17 Shell Oil Co Process for curing polyepoxides with polycarboxylic acid salts of an imidazole compound and compositions thereof
JPS535920B2 (de) 1974-06-03 1978-03-02
JPS592445B2 (ja) 1978-11-10 1984-01-18 三菱電機株式会社 耐熱性樹脂の製造法
US4401499A (en) * 1980-06-09 1983-08-30 Sumitomo Bakelite Company Limited Crosslinked resin of epoxy compound and isocyanate and process for producing same
JPS5718815A (en) 1980-07-04 1982-01-30 Mitsubishi Heavy Ind Ltd Bearing device
US4426243A (en) 1981-12-01 1984-01-17 Illinois Tool Works Inc. Room-temperature-curable, quick-setting acrylic/epoxy adhesives and methods of bonding
JPS59197154A (ja) 1983-04-22 1984-11-08 Hitachi Ltd 半導体装置およびその製造法
DE3572182D1 (en) 1984-04-28 1989-09-14 Ciba Geigy Ag Curable compositions
JPS61237436A (ja) 1985-04-15 1986-10-22 Toshiba Chem Corp 半導体素子の製造方法
JPS62275123A (ja) 1986-05-23 1987-11-30 Toray Ind Inc プリプレグ用樹脂組成物
JPS6381187A (ja) 1986-09-25 1988-04-12 Ibiden Co Ltd 熱硬化性接着シ−ト
JPS63154780A (ja) 1986-12-18 1988-06-28 Ibiden Co Ltd 接着剤組成物及びその接着剤としての使用方法
US4816531A (en) 1987-02-05 1989-03-28 Shell Oil Company Bismaleimide resin composition containing epoxy resin and a phenolic curing agent therefor
US5082880A (en) * 1988-09-12 1992-01-21 Mitsui Toatsu Chemicals, Inc. Semiconductor sealing composition containing epoxy resin and polymaleimide
US5208188A (en) 1989-10-02 1993-05-04 Advanced Micro Devices, Inc. Process for making a multilayer lead frame assembly for an integrated circuit structure and multilayer integrated circuit die package formed by such process
US5081167A (en) 1990-07-16 1992-01-14 Shell Oil Company Cyanamide-cured maleimide/epoxy resin blend
US5128746A (en) * 1990-09-27 1992-07-07 Motorola, Inc. Adhesive and encapsulant material with fluxing properties
US5261156A (en) 1991-02-28 1993-11-16 Semiconductor Energy Laboratory Co., Ltd. Method of electrically connecting an integrated circuit to an electric device
DE4130329A1 (de) 1991-09-12 1993-03-18 Bayer Ag Waermehaertbare reaktionsharzgemische, ein verfahren zu ihrer herstellung und die verwendung zur herstellung von press-massen und formkoerpern
US5728633A (en) * 1992-01-23 1998-03-17 Jacobs; Richard L. Interpenetrating network compositions and structures
US5510633A (en) 1994-06-08 1996-04-23 Xerox Corporation Porous silicon light emitting diode arrays and method of fabrication
US5579573A (en) * 1994-10-11 1996-12-03 Ford Motor Company Method for fabricating an undercoated chip electrically interconnected to a substrate
US5494981A (en) * 1995-03-03 1996-02-27 Minnesota Mining And Manufacturing Company Epoxy-cyanate ester compositions that form interpenetrating networks via a Bronsted acid
US5654081A (en) * 1995-07-05 1997-08-05 Ford Motor Company Integrated circuit assembly with polymeric underfill body
CN1057402C (zh) * 1996-03-01 2000-10-11 台湾通用器材股份有限公司 半导体的封装方法
JP2891184B2 (ja) 1996-06-13 1999-05-17 日本電気株式会社 半導体装置及びその製造方法
US5756405A (en) * 1996-09-10 1998-05-26 International Business Machines Corporation Technique for forming resin-impregnated fiberglass sheets
US6333206B1 (en) * 1996-12-24 2001-12-25 Nitto Denko Corporation Process for the production of semiconductor device
JPH1129748A (ja) * 1997-05-12 1999-02-02 Fujitsu Ltd 接着剤、接着方法及び実装基板の組み立て体
JP2001510944A (ja) * 1997-07-21 2001-08-07 アギラ テクノロジーズ インコーポレイテッド 半導体フリップチップ・パッケージおよびその製造方法
ATE320460T1 (de) 1997-07-24 2006-04-15 Henkel Corp Hitzehärtende harzzusammensetzungen verwendbar als unterfüllungs dichtungsmassen
US6300686B1 (en) * 1997-10-02 2001-10-09 Matsushita Electric Industrial Co., Ltd. Semiconductor chip bonded to a thermal conductive sheet having a filled through hole for electrical connection
US20010020071A1 (en) 1997-10-10 2001-09-06 Capote Miguel Albert High performance cyanate-bismaleimide-epoxy resin compositions for printed circuits and encapsulants
WO1999021917A1 (en) * 1997-10-23 1999-05-06 Ciba Specialty Chemicals Holding Inc. Hardener for anhydride group-containing polymers
JP3184485B2 (ja) 1997-11-06 2001-07-09 三井金属鉱業株式会社 銅張積層板用樹脂組成物、樹脂付き銅箔、多層銅張り積層板および多層プリント配線板
US6194490B1 (en) 1998-02-27 2001-02-27 Vantico, Inc. Curable composition comprising epoxidized natural oils
US6265776B1 (en) 1998-04-27 2001-07-24 Fry's Metals, Inc. Flip chip with integrated flux and underfill
US6228678B1 (en) 1998-04-27 2001-05-08 Fry's Metals, Inc. Flip chip with integrated mask and underfill
JP4098403B2 (ja) 1998-06-01 2008-06-11 富士通株式会社 接着剤、接着方法及び実装基板の組み立て体
AU4688699A (en) 1998-06-22 2000-01-10 Loctite Corporation Thermosetting resin compositions useful as underfill sealants
US6063828A (en) 1998-07-02 2000-05-16 National Starch And Chemical Investment Holding Corporation Underfill encapsulant compositions for use in electronic devices
US6057381A (en) 1998-07-02 2000-05-02 National Starch And Chemical Investment Holding Corporation Method of making an electronic component using reworkable underfill encapsulants
US6350840B1 (en) 1998-07-02 2002-02-26 National Starch And Chemical Investment Holding Corporation Underfill encapsulants prepared from allylated amide compounds
WO2000034032A1 (en) 1998-12-07 2000-06-15 Dexter Corporation Underfill film compositions
US6528345B1 (en) 1999-03-03 2003-03-04 Intel Corporation Process line for underfilling a controlled collapse
US6331446B1 (en) * 1999-03-03 2001-12-18 Intel Corporation Process for underfilling a controlled collapse chip connection (C4) integrated circuit package with an underfill material that is heated to a partial gel state
JP2001015551A (ja) * 1999-06-29 2001-01-19 Toshiba Corp 半導体装置およびその製造方法
JP3601443B2 (ja) 1999-11-30 2004-12-15 日立化成工業株式会社 接着フィルムとその製造方法、半導体搭載用配線基板及び半導体装置
JP3562465B2 (ja) 1999-11-30 2004-09-08 日立化成工業株式会社 接着剤組成物、接着フィルム及び半導体搭載用配線基板
KR20010054743A (ko) 1999-12-08 2001-07-02 윤종용 이중 언더필 영역을 포함하는 반도체 패키지
JP2001205211A (ja) * 2000-01-28 2001-07-31 Sanyo Electric Co Ltd プラズマ洗浄装置
JP2001323246A (ja) 2000-03-07 2001-11-22 Sony Chem Corp 電極接続用接着剤及びこれを用いた接着方法
US6498260B2 (en) * 2000-03-29 2002-12-24 Georgia Tech Research Corp. Thermally degradable epoxy underfills for flip-chip applications
US6307001B1 (en) 2000-05-18 2001-10-23 National Starch And Chemical Investment Holding Corporation Curable hybrid electron donor compounds containing vinyl ether
US6441213B1 (en) 2000-05-18 2002-08-27 National Starch And Chemical Investment Holding Corporation Adhesion promoters containing silane, carbamate or urea, and donor or acceptor functionality
WO2002048234A2 (en) * 2000-12-14 2002-06-20 Dow Global Technologies Inc. Epoxy resins and process for making the same
US6686425B2 (en) * 2001-06-08 2004-02-03 Adhesives Research, Inc. High Tg acrylic polymer and epoxy-containing blend therefor as pressure sensitive adhesive
US6833629B2 (en) 2001-12-14 2004-12-21 National Starch And Chemical Investment Holding Corporation Dual cure B-stageable underfill for wafer level

Also Published As

Publication number Publication date
JP4299140B2 (ja) 2009-07-22
CN1605122A (zh) 2005-04-06
JP2005513779A (ja) 2005-05-12
DE60224581D1 (de) 2008-02-21
KR100932998B1 (ko) 2009-12-21
WO2003052813A2 (en) 2003-06-26
CN1307701C (zh) 2007-03-28
US20030141592A1 (en) 2003-07-31
EP1461829A2 (de) 2004-09-29
EP1461829B2 (de) 2014-04-02
EP1461829B1 (de) 2008-01-09
TWI238476B (en) 2005-08-21
TW200305608A (en) 2003-11-01
US6833629B2 (en) 2004-12-21
DE60224581T2 (de) 2009-01-22
DK1461829T3 (da) 2008-05-19
KR20040068145A (ko) 2004-07-30
AU2002366498A1 (en) 2003-06-30
WO2003052813A3 (en) 2004-02-19

Similar Documents

Publication Publication Date Title
ATE383655T1 (de) Doppelaufhärtungs-b-stapelbare unterfüllung für das wafer-niveau
DE60127179D1 (de) Schleifartikel zur modifizierung einer halbleiterscheibe
ATE317314T1 (de) Schleifscheibe mit schleifsegmenten
PT1276398E (pt) Bota de futebol
ATE227194T1 (de) Polierkissen fur einen halbleitersubstrat
ATE391141T1 (de) Schlagzähes polyharnstoffurethan und polyharnstoffurethan-präpolymer mit niedrigem nco/oh-verhältnis
WO2000020864A8 (en) Immunotherapy of b cell involvement in progression of solid, nonlymphoid tumors
SG152899A1 (en) Chemical mechanical planarization or polishing pad with sections having varied groove patterns
DE502004007928D1 (de) Verankerung für vorgespannte und/oder belastete zugelemente
TW200509321A (en) Composite lid for land grid array (LGA) flip-chip package assembly
WO2002027363A3 (en) Method of bonding wafers with controlled height and associated structures
DE60323405D1 (de) Zuverlässige gegenkontaktstruktur und techniken zu ihrer herstellung
MY133452A (en) Polishing method for wafer and holding plate
TW200603946A (en) Polishing pad for electrochemical mechanical polishing
WO2005092010A3 (en) Chemical mechanical polishing retaining ring
TW200614330A (en) Semiconductor processing components and semiconductor processing utilizing same
DE50112334D1 (de) Heterostruktur mit rückseitiger donatordotierung
NL1013684A1 (nl) Verknopingsmiddel voor fotolaklaag, en fotolaklaagsamenstelling welke dezelfde omvat.
TW200520216A (en) Heterostructure resistor and method of forming the same
ZA202109364B (en) Material plate
EP0930646A3 (de) Halbleitervorrichtung mit Überchipanschlüssen, die eine dünne Platte aufweist, und deren Herstellungsverfahren
IT8420360A0 (it) Strato di tessuto rivestito di polimero, prodotto che utilizza lo strato e procedimento di fabbricazione dello stesso.
TR200102760T2 (tr) Tekstil muamele bileşimleri, hazırlanış ve kullanımları
MY128152A (en) Semiconductor device and process for producing the same, and tablet comprising epoxy resin composition
SE9701154L (sv) Diken med plan onvansida

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties