ATE384042T1 - Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte - Google Patents

Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte

Info

Publication number
ATE384042T1
ATE384042T1 AT04746440T AT04746440T ATE384042T1 AT E384042 T1 ATE384042 T1 AT E384042T1 AT 04746440 T AT04746440 T AT 04746440T AT 04746440 T AT04746440 T AT 04746440T AT E384042 T1 ATE384042 T1 AT E384042T1
Authority
AT
Austria
Prior art keywords
cross
producing
polymerization initiators
cationic polymerization
linking products
Prior art date
Application number
AT04746440T
Other languages
English (en)
Inventor
Masashi Date
Hideki Kimura
Shinji Yamashita
Jiro Yamamoto
Original Assignee
San Apro Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by San Apro Ltd filed Critical San Apro Ltd
Application granted granted Critical
Publication of ATE384042T1 publication Critical patent/ATE384042T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
AT04746440T 2003-06-25 2004-06-25 Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte ATE384042T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003180712 2003-06-25

Publications (1)

Publication Number Publication Date
ATE384042T1 true ATE384042T1 (de) 2008-02-15

Family

ID=33549508

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04746440T ATE384042T1 (de) 2003-06-25 2004-06-25 Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte

Country Status (6)

Country Link
US (3) US20060247401A1 (de)
EP (1) EP1640363B1 (de)
JP (1) JP4602252B2 (de)
AT (1) ATE384042T1 (de)
DE (1) DE602004011341T2 (de)
WO (1) WO2005000801A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060172230A1 (en) * 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications
GB0516515D0 (en) * 2005-08-11 2005-09-21 Sun Chemical Bv A jet ink and ink jet printing process
JP4934306B2 (ja) * 2005-09-28 2012-05-16 サンアプロ株式会社 スルホニウム塩の製造方法
EP1953139A4 (de) * 2005-11-25 2010-07-28 San Apro Ltd Verfahren zur herstellung von fluoriertem sulfoniumalkylfluorphosphat
US20080228056A1 (en) 2007-03-13 2008-09-18 Michael Blomquist Basal rate testing using frequent blood glucose input
JP5208573B2 (ja) * 2008-05-06 2013-06-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
US9363469B2 (en) * 2008-07-17 2016-06-07 Ppc Broadband, Inc. Passive-active terminal adapter and method having automatic return loss control
JP5828715B2 (ja) * 2011-08-25 2015-12-09 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
CN114402260A (zh) * 2020-08-05 2022-04-26 三亚普罗股份有限公司 光产酸剂

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100587A (ja) * 1984-10-22 1986-05-19 Chisso Corp 有機珪素化合物
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
US5274148A (en) * 1992-08-10 1993-12-28 Isp Investments, Inc. Dialky alkoxy phenyl sulfonium salt cationic initiators
JPH06345726A (ja) 1993-06-15 1994-12-20 Nippon Soda Co Ltd 新規スルホニウム塩化合物および重合開始剤
DE69413973T2 (de) * 1993-06-15 1999-04-15 Nippon Soda Co. Ltd., Tokio/Tokyo Neue sulfoniumsalzverbindung und polymerisationsinitiator
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JPH0782244A (ja) * 1993-09-13 1995-03-28 Nippon Kayaku Co Ltd スルホニウム塩の製造方法
JPH0782245A (ja) * 1993-09-13 1995-03-28 Nippon Kayaku Co Ltd スルホニウム塩の製造方法
US5798396A (en) * 1994-03-09 1998-08-25 Nippon Soda Co., Ltd. Sulfonium salt-containing compounds and initiators of polymerization
TW418215B (en) * 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
JP3741387B2 (ja) 1995-05-26 2006-02-01 日本曹達株式会社 新規スルホニウム塩化合物および重合開始剤およびそれらを含有する硬化性組成物
JPH0912615A (ja) 1995-06-29 1997-01-14 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及びその硬化物
DE69630959T2 (de) * 1995-08-22 2004-06-03 Nippon Soda Co. Ltd. Neue sulfoniumsalzverbindungen, polymerisierungsinitiator, härtbare zusammensetzung und stärkungsverfahren
JPH107649A (ja) * 1996-06-18 1998-01-13 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH1180118A (ja) * 1997-09-05 1999-03-26 Nippon Kayaku Co Ltd 新規スルホニウム塩、カチオン重合性組成物及びその硬化物
TWI250379B (en) * 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
JP2002241474A (ja) * 2000-12-12 2002-08-28 Nippon Kayaku Co Ltd 芳香族スルホニウム化合物を含有する光硬化性樹脂組成物
JP3837066B2 (ja) * 2000-12-15 2006-10-25 サンアプロ株式会社 スルホニウム塩の製造方法
DE60134574D1 (de) * 2000-12-15 2008-08-07 San Apro Ltd Verfahren zur herstellung von sulfoniumsalzen
CN1854133B (zh) * 2002-03-04 2010-11-10 和光纯药工业株式会社 含杂环碘鎓盐
JP2004091698A (ja) * 2002-09-02 2004-03-25 Konica Minolta Holdings Inc 活性光線硬化型組成物、活性光線硬化型インクとそれを用いた画像形成方法及びインクジェット記録装置

Also Published As

Publication number Publication date
US20060247401A1 (en) 2006-11-02
JPWO2005000801A1 (ja) 2006-08-03
EP1640363A4 (de) 2006-11-22
JP4602252B2 (ja) 2010-12-22
DE602004011341T2 (de) 2009-01-08
US7709548B2 (en) 2010-05-04
EP1640363A1 (de) 2006-03-29
US20080108720A1 (en) 2008-05-08
WO2005000801A1 (ja) 2005-01-06
DE602004011341D1 (de) 2008-03-06
EP1640363B1 (de) 2008-01-16
US20080249270A1 (en) 2008-10-09

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