ATE391195T1 - Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets - Google Patents

Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets

Info

Publication number
ATE391195T1
ATE391195T1 AT02729684T AT02729684T ATE391195T1 AT E391195 T1 ATE391195 T1 AT E391195T1 AT 02729684 T AT02729684 T AT 02729684T AT 02729684 T AT02729684 T AT 02729684T AT E391195 T1 ATE391195 T1 AT E391195T1
Authority
AT
Austria
Prior art keywords
phosphor
composition
elements
thioaluminate
sputting
Prior art date
Application number
AT02729684T
Other languages
English (en)
Inventor
Alexander Kosyachkov
Original Assignee
Ifire Ip Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ifire Ip Corp filed Critical Ifire Ip Corp
Application granted granted Critical
Publication of ATE391195T1 publication Critical patent/ATE391195T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/77—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729—Chalcogenides
    • C09K11/7731—Chalcogenides with alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Luminescent Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
AT02729684T 2001-05-29 2002-05-07 Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets ATE391195T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/867,080 US6447654B1 (en) 2001-05-29 2001-05-29 Single source sputtering of thioaluminate phosphor films

Publications (1)

Publication Number Publication Date
ATE391195T1 true ATE391195T1 (de) 2008-04-15

Family

ID=25349045

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02729684T ATE391195T1 (de) 2001-05-29 2002-05-07 Kathodenzerstäubung von thioaluminat leuchtstofffilmen unter verwendung eines einzeltargets

Country Status (8)

Country Link
US (2) US6447654B1 (de)
EP (1) EP1392881B1 (de)
JP (1) JP4308648B2 (de)
KR (1) KR100914357B1 (de)
AT (1) ATE391195T1 (de)
CA (1) CA2447626C (de)
DE (1) DE60225909T2 (de)
WO (1) WO2002097155A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3479273B2 (ja) * 2000-09-21 2003-12-15 Ｔｄｋ株式会社 蛍光体薄膜その製造方法およびｅｌパネル
US6686062B2 (en) * 2001-06-13 2004-02-03 Ifire Technology Inc. Magnesium calcium thioaluminate phosphor
CA2478439A1 (en) * 2002-03-27 2003-10-02 Ifire Technology Inc. Yttrium substituted barium thioaluminate phosphor materials
AU2003291866A1 (en) * 2002-12-16 2004-07-09 Ifire Technology Corp. Composite sputter target and phosphor deposition method
TW200420740A (en) * 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process
JP4263001B2 (ja) * 2003-03-06 2009-05-13 アイファイヤー アイピー コーポレイション スパッタリングターゲット
CN100529155C (zh) * 2003-07-03 2009-08-19 伊菲雷知识产权公司 用于无机发光材料沉积的硫化氢注射方法
WO2005033360A1 (en) * 2003-10-07 2005-04-14 Ifire Technology Corp. Polysulfide thermal vapour source for thin sulfide film deposition
JP2007526602A (ja) * 2004-03-04 2007-09-13 アイファイアー・テクノロジー・コープ チオアルミネート発光体に対する反応性金属供給源及び堆積方法
US8057856B2 (en) 2004-03-15 2011-11-15 Ifire Ip Corporation Method for gettering oxygen and water during vacuum deposition of sulfide films
US7812522B2 (en) * 2004-07-22 2010-10-12 Ifire Ip Corporation Aluminum oxide and aluminum oxynitride layers for use with phosphors for electroluminescent displays
US7427367B2 (en) * 2004-08-06 2008-09-23 Ifire Technology Corp. Barium thioaluminate phosphor materials with novel crystal structures
WO2006045195A1 (en) * 2004-10-29 2006-05-04 Ifire Technology Corp. Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films
JP4747751B2 (ja) 2005-05-09 2011-08-17 三菱マテリアル株式会社 エレクトロルミネッセンス素子における蛍光体膜形成用高強度スパッタリングターゲット
JP2007217755A (ja) * 2006-02-17 2007-08-30 Mitsubishi Materials Corp エレクトロルミネッセンス素子における蛍光体膜形成用高強度スパッタリングターゲット
JP5028962B2 (ja) * 2006-11-09 2012-09-19 住友金属鉱山株式会社 Ｅｌ発光層形成用スパッタリングターゲットとその製造方法
KR100839222B1 (ko) 2006-12-19 2008-06-19 고려대학교 산학협력단 펄스파 레이저 박막 증착장치 및 이를 이용한혼성금속나노점배열 형성방법
CN104140814A (zh) * 2013-05-06 2014-11-12 海洋王照明科技股份有限公司 铕掺杂硫代铝酸盐发光材料、制备方法及其应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
US4675092A (en) * 1986-03-27 1987-06-23 Gte Laboratories Incorporated Method of producing thin film electroluminescent structures
US4725344A (en) * 1986-06-20 1988-02-16 Rca Corporation Method of making electroluminescent phosphor films
DE69027337T2 (de) * 1990-11-02 1997-01-02 Komatsu Mfg Co Ltd Elektroluminszentes dünnfilmelement
US5309070A (en) * 1991-03-12 1994-05-03 Sun Sey Shing AC TFEL device having blue light emitting thiogallate phosphor
US5432015A (en) 1992-05-08 1995-07-11 Westaim Technologies, Inc. Electroluminescent laminate with thick film dielectric
JP2858397B2 (ja) * 1994-09-07 1999-02-17 株式会社デンソー エレクトロルミネッセンス素子及びその製造方法
US5780966A (en) * 1995-04-20 1998-07-14 Nippondenso Co., Ltd. Electroluminescent device with improved blue color purity
US6771019B1 (en) 1999-05-14 2004-08-03 Ifire Technology, Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties

Also Published As

Publication number Publication date
KR20040030632A (ko) 2004-04-09
CA2447626A1 (en) 2002-12-05
JP2004533095A (ja) 2004-10-28
EP1392881B1 (de) 2008-04-02
WO2002097155A1 (en) 2002-12-05
KR100914357B1 (ko) 2009-08-28
EP1392881A1 (de) 2004-03-03
JP4308648B2 (ja) 2009-08-05
US6841045B2 (en) 2005-01-11
CA2447626C (en) 2014-04-29
US6447654B1 (en) 2002-09-10
DE60225909T2 (de) 2009-04-09
US20030000829A1 (en) 2003-01-02
DE60225909D1 (de) 2008-05-15

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