ATE391309T1 - Laserprojektionssystem - Google Patents

Laserprojektionssystem

Info

Publication number
ATE391309T1
ATE391309T1 AT05781102T AT05781102T ATE391309T1 AT E391309 T1 ATE391309 T1 AT E391309T1 AT 05781102 T AT05781102 T AT 05781102T AT 05781102 T AT05781102 T AT 05781102T AT E391309 T1 ATE391309 T1 AT E391309T1
Authority
AT
Austria
Prior art keywords
cell
projection system
laser projection
coherence
laser beam
Prior art date
Application number
AT05781102T
Other languages
English (en)
Inventor
Renatus Sanders
Johannus Weekamp
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE391309T1 publication Critical patent/ATE391309T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G02B3/14—Fluid-filled or evacuated lenses of variable focal length
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00—Details of television systems
    • H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48—Laser speckle optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3129—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] scanning a light beam on the display screen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Laser Surgery Devices (AREA)
AT05781102T 2004-08-30 2005-08-25 Laserprojektionssystem ATE391309T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04104148 2004-08-30

Publications (1)

Publication Number Publication Date
ATE391309T1 true ATE391309T1 (de) 2008-04-15

Family

ID=35207687

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05781102T ATE391309T1 (de) 2004-08-30 2005-08-25 Laserprojektionssystem

Country Status (8)

Country Link
US (1) US7775670B2 (de)
EP (1) EP1787167B1 (de)
JP (1) JP4658127B2 (de)
KR (1) KR20070048205A (de)
CN (1) CN100483259C (de)
AT (1) ATE391309T1 (de)
DE (1) DE602005005836T2 (de)
WO (1) WO2006024998A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008088001A1 (ja) * 2007-01-18 2010-05-13 シャープ株式会社 光学素子およびそれを用いた画像表示装置
US7862183B2 (en) 2007-10-16 2011-01-04 Alcatel-Lucent Usa Inc. Speckle reduction using a tunable liquid lens
WO2010125562A1 (en) 2009-04-26 2010-11-04 X.D.M. Ltd. Laser projector with reduced speckle effect
US8130433B2 (en) 2009-04-29 2012-03-06 Corning Incorporated Spinning optics for speckle mitigation in laser projection systems
US8077367B2 (en) 2009-04-29 2011-12-13 Corning Incorporated Speckle mitigation in laser projection systems
US20120154889A1 (en) * 2009-09-16 2012-06-21 Sharp Kabushiki Kaisha Display element and electric apparatus using the same
DE102011101323A1 (de) * 2011-05-12 2012-11-15 Osram Opto Semiconductors Gmbh Optoelektronisches Bauteil
CN105093559B (zh) * 2014-05-15 2017-07-28 中国科学院理化技术研究所 一种消相干装置
DE102014118378A1 (de) * 2014-12-11 2016-06-16 Hella Kgaa Hueck & Co. Beleuchtungsvorrichtung für Fahrzeuge
JP2018031990A (ja) * 2016-08-26 2018-03-01 大日本印刷株式会社 スクリーンおよび表示装置
CN120657542A (zh) * 2025-05-06 2025-09-16 山东华光光电子股份有限公司 一种半导体激光器动态光束整形系统及方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755349B2 (ja) 1987-09-17 1998-05-20 オリンパス光学工業株式会社 半導体露光装置の照明光学系
US5272473A (en) * 1989-02-27 1993-12-21 Texas Instruments Incorporated Reduced-speckle display system
JPH05173094A (ja) 1991-12-20 1993-07-13 Sony Corp レーザ表示装置
US6629641B2 (en) * 2000-06-07 2003-10-07 Metrologic Instruments, Inc. Method of and system for producing images of objects using planar laser illumination beams and image detection arrays
US6426836B2 (en) * 1996-06-11 2002-07-30 Hewlett-Packard Co. Method and apparatus for reducing the formation of spots in laser projection
TR199900573T2 (xx) * 1996-09-13 1999-06-21 Joshua Silver David �ok odakl� lenslerdeki veya bu t�r lenslere ili�kin geli�meler
JP3986137B2 (ja) 1997-09-26 2007-10-03 オリンパス株式会社 レーザ照明装置及びそれを用いた光学装置
FR2769375B1 (fr) * 1997-10-08 2001-01-19 Univ Joseph Fourier Lentille a focale variable
US6816302B2 (en) * 1998-03-02 2004-11-09 Micronic Laser Systems Ab Pattern generator
US6069739A (en) * 1998-06-30 2000-05-30 Intel Corporation Method and lens arrangement to improve imaging performance of microlithography exposure tool
JP4345127B2 (ja) 1999-03-18 2009-10-14 ソニー株式会社 照明装置及び照明方法
US6839469B2 (en) * 2000-01-21 2005-01-04 Lam K. Nguyen Multiparallel three dimensional optical microscopy system
JP4553336B2 (ja) * 2000-11-30 2010-09-29 キヤノン株式会社 光学素子、光学装置および撮影装置
US6625381B2 (en) * 2001-02-20 2003-09-23 Eastman Kodak Company Speckle suppressed laser projection system with partial beam reflection
JP2002267825A (ja) 2001-03-09 2002-09-18 Sony Corp 回折型レンズ素子及びこれを用いた照明装置
US6594090B2 (en) * 2001-08-27 2003-07-15 Eastman Kodak Company Laser projection display system
US6577429B1 (en) * 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system
JP4662713B2 (ja) 2002-02-14 2011-03-30 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 可変フォーカスレンズ
KR20060052809A (ko) 2003-07-14 2006-05-19 코닌클리케 필립스 일렉트로닉스 엔.브이. 프로젝션 디바이스
JP4290095B2 (ja) * 2004-08-16 2009-07-01 キヤノン株式会社 表示光学系および画像表示システム

Also Published As

Publication number Publication date
US20080278692A1 (en) 2008-11-13
JP4658127B2 (ja) 2011-03-23
WO2006024998A2 (en) 2006-03-09
CN101010638A (zh) 2007-08-01
CN100483259C (zh) 2009-04-29
EP1787167A2 (de) 2007-05-23
US7775670B2 (en) 2010-08-17
DE602005005836T2 (de) 2009-05-14
EP1787167B1 (de) 2008-04-02
WO2006024998A3 (en) 2006-10-26
DE602005005836D1 (de) 2008-05-15
JP2008511853A (ja) 2008-04-17
KR20070048205A (ko) 2007-05-08

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Legal Events

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