ATE392710T1 - Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung - Google Patents

Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung

Info

Publication number: ATE392710T1
Authority: AT; Austria
Prior art keywords: lamps; substrate; infrared radiation; heating; quickly
Prior art date: 2000-10-13

Application number

AT01976424T

Other languages

English (en)

Inventor

Rene Ducret

Franck Laporte

Benoit Pierret

Bachir Semmache

Original Assignee

Qualiflow Therm

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-10-13

Filing date

2001-10-12

Publication date

2008-05-15

2001-10-12 Application filed by Qualiflow Therm filed Critical Qualiflow Therm

2008-05-15 Application granted granted Critical

2008-05-15 Publication of ATE392710T1 publication Critical patent/ATE392710T1/de

Links

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10P95/90—Thermal treatments, e.g. annealing or sintering
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0436—Apparatus for thermal treatment mainly by radiation

AT01976424T 2000-10-13 2001-10-12 Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung ATE392710T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR0013182A FR2815395B1 (fr)	2000-10-13	2000-10-13	Dispositif de chauffage rapide et uniforme d'un substrat par rayonnement infrarouge

Publications (1)

Publication Number	Publication Date
ATE392710T1 true ATE392710T1 (de)	2008-05-15

Family

ID=8855352

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT01976424T ATE392710T1 (de)	2000-10-13	2001-10-12	Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung

Country Status (11)

Country	Link
US (1)	US6759632B2 (de)
EP (1)	EP1250711B1 (de)
JP (1)	JP2004511907A (de)
KR (1)	KR100832273B1 (de)
CN (1)	CN1404623A (de)
AT (1)	ATE392710T1 (de)
AU (1)	AU2001295702A1 (de)
CA (1)	CA2394426C (de)
DE (1)	DE60133628T2 (de)
FR (1)	FR2815395B1 (de)
WO (1)	WO2002031862A2 (de)

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US6734457B2 (en) *	2001-11-27	2004-05-11	Semiconductor Energy Laboratory Co., Ltd.	Light emitting device
US20060164614A1 (en) *	2005-01-21	2006-07-27	Hua-Kuo Chen	Exposing machine for a printed circuit board
US20070017395A1 (en) *	2005-07-22	2007-01-25	Neri Joel D	Method and apparatus for uniformly heating a substrate
JP2008071787A (ja) *	2006-09-12	2008-03-27	Ushio Inc	光照射式加熱装置および光照射式加熱方法
US7598150B2 (en) *	2006-11-20	2009-10-06	Applied Materials, Inc.	Compensation techniques for substrate heating processes
ITMO20060389A1 (it) *	2006-11-22	2008-05-23	Viv Int Spa	Apparati e metodo per decorare oggetti
TW200846399A (en) *	2006-12-01	2008-12-01	Teijin Fibers Ltd	Method of imparting function to molded polymer and apparatus therefor
US20080197493A1 (en) *	2007-02-16	2008-08-21	Stefan Geyer	Integrated circuit including conductive bumps
US7896053B2 (en) *	2007-09-27	2011-03-01	Babcock & Wilcox Services Y-12, LLC	Non-destructive component separation using infrared radiant energy
US20110159214A1 (en) *	2008-03-26	2011-06-30	Gt Solar, Incorporated	Gold-coated polysilicon reactor system and method
KR101535547B1 (ko) *	2008-09-05	2015-07-10	주성엔지니어링(주)	기판 처리 장치
US8232114B2 (en) *	2009-01-27	2012-07-31	Taiwan Semiconductor Manufacturing Co., Ltd.	RTP spike annealing for semiconductor substrate dopant activation
US8404572B2 (en)	2009-02-13	2013-03-26	Taiwan Semiconductor Manufacturing Co., Ltd	Multi-zone temperature control for semiconductor wafer
US20110217848A1 (en) *	2010-03-03	2011-09-08	Bergman Eric J	Photoresist removing processor and methods
TWI399863B (zh) *	2010-05-26	2013-06-21	Inventec Solar Energy Corp	快速升溫退火裝置及形成太陽能電池選擇性射極結構的方法
NL2009189A (en) *	2011-08-17	2013-02-19	Asml Netherlands Bv	Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method.
CN105683839B (zh)	2013-09-27	2017-08-08	Asml荷兰有限公司	用于光刻设备的支撑台、光刻设备以及器件制造方法
US11015244B2 (en)	2013-12-30	2021-05-25	Advanced Material Solutions, Llc	Radiation shielding for a CVD reactor
KR101809141B1 (ko) *	2014-05-29	2018-01-19	에이피시스템 주식회사	히터 블록 및 기판 열처리 장치
RU2580353C1 (ru) *	2014-12-24	2016-04-10	Общество с ограниченной ответственностью "Теркон-КТТ"	Способ выполнения прецизионных термических процессов в печи инфракрасного нагрева и печь инфракрасного нагрева для выполнения прецизионных термических процессов
KR101860631B1 (ko) *	2015-04-30	2018-05-23	시바우라 메카트로닉스 가부시끼가이샤	기판 처리 장치 및 기판 처리 방법
JP6687436B2 (ja) *	2015-04-30	2020-04-22	芝浦メカトロニクス株式会社	基板処理装置及び基板処理方法
US10727094B2 (en) *	2016-01-29	2020-07-28	Taiwan Semiconductor Manufacturing Co., Ltd	Thermal reflector device for semiconductor fabrication tool
JP6622617B2 (ja) *	2016-02-18	2019-12-18	株式会社Ｓｃｒｅｅｎホールディングス	熱処理装置
CN116635992A (zh) *	2020-12-22	2023-08-22	玛特森技术公司	具有真空退火反射器控制的工件处理装置
CN116313923A (zh) *	2022-12-27	2023-06-23	无锡诚承电子科技有限公司	一种快速合金退火炉的控温方法
CN116705669B (zh) *	2023-08-04	2023-10-20	盛吉盛半导体科技(北京)有限公司	一种冷却效果均匀的半导体设备用加热灯盘及冷却方法

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US5740314A (en) *	1995-08-25	1998-04-14	Edison Welding Institute	IR heating lamp array with reflectors modified by removal of segments thereof
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2000
- 2000-10-13 FR FR0013182A patent/FR2815395B1/fr not_active Expired - Fee Related
2001
- 2001-10-12 CN CN01803119A patent/CN1404623A/zh active Pending
- 2001-10-12 KR KR1020027007453A patent/KR100832273B1/ko not_active Expired - Fee Related
- 2001-10-12 AT AT01976424T patent/ATE392710T1/de not_active IP Right Cessation
- 2001-10-12 WO PCT/FR2001/003171 patent/WO2002031862A2/fr not_active Ceased
- 2001-10-12 JP JP2002535156A patent/JP2004511907A/ja not_active Withdrawn
- 2001-10-12 EP EP01976424A patent/EP1250711B1/de not_active Expired - Lifetime
- 2001-10-12 CA CA2394426A patent/CA2394426C/en not_active Expired - Fee Related
- 2001-10-12 DE DE60133628T patent/DE60133628T2/de not_active Expired - Lifetime
- 2001-10-12 US US10/148,339 patent/US6759632B2/en not_active Expired - Fee Related
- 2001-10-12 AU AU2001295702A patent/AU2001295702A1/en not_active Abandoned

Also Published As

Publication number	Publication date
AU2001295702A1 (en)	2002-04-22
EP1250711B1 (de)	2008-04-16
WO2002031862A3 (fr)	2002-07-25
FR2815395A1 (fr)	2002-04-19
DE60133628T2 (de)	2009-05-28
WO2002031862A2 (fr)	2002-04-18
CA2394426A1 (en)	2002-04-18
CN1404623A (zh)	2003-03-19
US20040052511A1 (en)	2004-03-18
JP2004511907A (ja)	2004-04-15
FR2815395B1 (fr)	2004-06-18
KR20020059853A (ko)	2002-07-13
CA2394426C (en)	2011-09-27
DE60133628D1 (de)	2008-05-29
US6759632B2 (en)	2004-07-06
EP1250711A2 (de)	2002-10-23
KR100832273B1 (ko)	2008-05-26

Legal Events

Date	Code	Title	Description
2008-10-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties

Publication	Publication Date	Title
ATE392710T1 (de)	2008-05-15	Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung
US5073698A (en)	1991-12-17	Method for selectively heating a film on a substrate
WO2002050875A3 (en)	2002-09-19	Heating configuration for use in thermal processing chambers
WO2007130909B1 (en)	2008-08-07	Uv assisted thermal processing
TW340138B (en)	1998-09-11	Apparatus for low pressure chemical vapor deposition the invention relates to an apparatus for low pressure chemical vapor deposition
WO2002009171A1 (en)	2002-01-31	Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
WO2004036630A3 (en)	2004-10-14	Rapid thermal processing system for integrated circuits
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TW200633166A (en)	2006-09-16	Heater and heating device with heaters
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ITRM20020452A1 (it)	2004-03-11	Procedimento e dispositivo per il trattamento di rivestimenti
EP1259100A3 (de)	2005-05-04	Steuerungssystem für mikrowellenbetriebene UV-Lichtquellen
WO2008010949A3 (en)	2008-04-10	Method and apparatus for forming an oxide layer on semiconductors
WO2013157444A1 (ja)	2013-10-24	太陽電池試験用光照射装置
TW200721275A (en)	2007-06-01	Heating device of the light irradiation type
JPS6474717A (en)	1989-03-20	Formation of thin film
JPS5745923A (en)	1982-03-16	Light diffusing method
CN203688421U (zh)	2014-07-02	加速待测物老化的设备
CN105489680A (zh)	2016-04-13	一种光伏薄膜电池的光浴装置
PT1954639E (pt)	2011-09-07	Dispositivo para o aquecimento de instalações de forno
ATE392008T1 (de)	2008-04-15	Vorrichtung zur erwärmung von substraten mit seitenblenden und sekundären reflektoren
JPS5755311A (en)	1982-04-02	Manufacture of ceramic burner
Wang et al.	2002	Numerical simulation of the conversion of thermal X-ray radiation from laser-induced plasmas and radiation heating