ATE409890T1 - Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung - Google Patents
Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzungInfo
- Publication number
- ATE409890T1 ATE409890T1 AT05004024T AT05004024T ATE409890T1 AT E409890 T1 ATE409890 T1 AT E409890T1 AT 05004024 T AT05004024 T AT 05004024T AT 05004024 T AT05004024 T AT 05004024T AT E409890 T1 ATE409890 T1 AT E409890T1
- Authority
- AT
- Austria
- Prior art keywords
- polymerizable composition
- lithographic printing
- printing plates
- producing lithographic
- light
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- -1 benzotriazole compound Chemical class 0.000 abstract 2
- 239000012964 benzotriazole Substances 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/14—Production of collotype printing forms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004051134 | 2004-02-26 | ||
| JP2004084973 | 2004-03-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE409890T1 true ATE409890T1 (de) | 2008-10-15 |
Family
ID=34921646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05004024T ATE409890T1 (de) | 2004-02-26 | 2005-02-24 | Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7306894B2 (de) |
| EP (1) | EP1589374B1 (de) |
| AT (1) | ATE409890T1 (de) |
| DE (1) | DE602005009990D1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1991418A1 (de) * | 2006-02-28 | 2008-11-19 | Agfa Graphics N.V. | Verfahren zur herstellung einer lithographischen druckplatte |
| JP2007272143A (ja) * | 2006-03-31 | 2007-10-18 | Fujifilm Corp | 平版印刷版原版およびその積層体 |
| CN101928254B (zh) * | 2010-07-09 | 2012-05-02 | 南京大学 | 苯并三唑衍生物及其制法与用途 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4268610A (en) * | 1979-11-05 | 1981-05-19 | Hercules Incorporated | Photoresist formulations |
| US4680249A (en) * | 1986-05-28 | 1987-07-14 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing carboxy benzotriazole |
| DE3717038A1 (de) * | 1987-05-21 | 1988-12-08 | Basf Ag | Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien |
| US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
| JPH03179356A (ja) * | 1989-05-18 | 1991-08-05 | Hitachi Chem Co Ltd | 感光性樹脂組成物及び感光性樹脂組成物積層体 |
| US5403698A (en) * | 1990-10-16 | 1995-04-04 | Hitachi Chemical Company, Ltd. | Negative type photosensitive electrodepositing resin composition |
| EP0501433B1 (de) * | 1991-02-28 | 1997-05-07 | E.I. Du Pont De Nemours And Company | yösungsmitteldispergierbare interpenetrierende Polymernetzwerke enthaltende lichtempfindliche Zusammensetzung |
| US5663212A (en) * | 1993-02-05 | 1997-09-02 | Fuji Photo Film Co., Ltd. | Light-sensitive resin composition |
| JPH11160880A (ja) * | 1997-11-28 | 1999-06-18 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性フィルム |
| US6335144B1 (en) * | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
| JP2001033961A (ja) * | 1999-07-23 | 2001-02-09 | Fuji Photo Film Co Ltd | 感光性組成物および平版印刷版の製版方法 |
| JP2002139843A (ja) | 2000-11-06 | 2002-05-17 | Mitsubishi Chemicals Corp | 光重合性画像形成材料及び画像形成方法 |
| US6878505B2 (en) * | 2001-05-28 | 2005-04-12 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JP2002351065A (ja) | 2001-05-28 | 2002-12-04 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JP2003035953A (ja) * | 2001-07-23 | 2003-02-07 | Hitachi Chem Co Ltd | 高密度・高解像度用の感光性樹脂組成物及びその用途 |
| JP2003043692A (ja) | 2001-08-02 | 2003-02-13 | Fuji Photo Film Co Ltd | 光重合性平版印刷版 |
| ATE544095T1 (de) * | 2001-08-29 | 2012-02-15 | Fujifilm Corp | Verfahren zur herstellung einer druckplatte |
| JP2003064130A (ja) | 2001-08-29 | 2003-03-05 | Fuji Photo Film Co Ltd | 光重合性組成物 |
-
2005
- 2005-02-24 EP EP05004024A patent/EP1589374B1/de not_active Expired - Lifetime
- 2005-02-24 AT AT05004024T patent/ATE409890T1/de not_active IP Right Cessation
- 2005-02-24 DE DE602005009990T patent/DE602005009990D1/de not_active Expired - Lifetime
- 2005-02-28 US US11/067,250 patent/US7306894B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20050202341A1 (en) | 2005-09-15 |
| EP1589374A2 (de) | 2005-10-26 |
| DE602005009990D1 (de) | 2008-11-13 |
| US7306894B2 (en) | 2007-12-11 |
| EP1589374B1 (de) | 2008-10-01 |
| EP1589374A3 (de) | 2006-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |