ATE443280T1 - Verfahren zur herstellung einer lithografiedruckplatte und lithografiedruckplattenvorläufer - Google Patents
Verfahren zur herstellung einer lithografiedruckplatte und lithografiedruckplattenvorläuferInfo
- Publication number
- ATE443280T1 ATE443280T1 AT06015456T AT06015456T ATE443280T1 AT E443280 T1 ATE443280 T1 AT E443280T1 AT 06015456 T AT06015456 T AT 06015456T AT 06015456 T AT06015456 T AT 06015456T AT E443280 T1 ATE443280 T1 AT E443280T1
- Authority
- AT
- Austria
- Prior art keywords
- printing plate
- lithographic printing
- plate precursor
- binder polymer
- producing
- Prior art date
Links
- 239000002243 precursor Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000011230 binding agent Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 230000002209 hydrophobic effect Effects 0.000 abstract 2
- 239000010410 layer Substances 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000011241 protective layer Substances 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000012986 chain transfer agent Substances 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/305—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the brushing or rubbing means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005214539 | 2005-07-25 | ||
| JP2006123823A JP4792326B2 (ja) | 2005-07-25 | 2006-04-27 | 平版印刷版の作製方法および平版印刷版原版 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE443280T1 true ATE443280T1 (de) | 2009-10-15 |
Family
ID=37198851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06015456T ATE443280T1 (de) | 2005-07-25 | 2006-07-25 | Verfahren zur herstellung einer lithografiedruckplatte und lithografiedruckplattenvorläufer |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20070020563A1 (de) |
| EP (2) | EP2108999B1 (de) |
| JP (1) | JP4792326B2 (de) |
| AT (1) | ATE443280T1 (de) |
| DE (1) | DE602006009190D1 (de) |
Families Citing this family (86)
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|---|---|---|---|---|
| PL1788443T3 (pl) * | 2005-11-18 | 2014-12-31 | Agfa Nv | Sposób wytwarzania litograficznej płyty drukowej |
| DE602005013536D1 (de) * | 2005-11-18 | 2009-05-07 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| JP4900913B2 (ja) * | 2006-02-01 | 2012-03-21 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| JP4945432B2 (ja) * | 2006-12-28 | 2012-06-06 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP4905790B2 (ja) * | 2007-03-27 | 2012-03-28 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| JP4866774B2 (ja) * | 2007-03-30 | 2012-02-01 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
| EP1975710B1 (de) * | 2007-03-30 | 2013-10-23 | FUJIFILM Corporation | Plattenherstellungsverfahren eines Lithografiedruckplattenvorläufers |
| EP1975706A3 (de) * | 2007-03-30 | 2010-03-03 | FUJIFILM Corporation | Lithografiedruckplattenvorläufer |
| CN101681106B (zh) | 2007-05-25 | 2013-11-20 | 爱克发印艺公司 | 平版印刷印版前体、制备前体中敏化剂混合物的方法 |
| BRPI0811195A2 (pt) * | 2007-05-25 | 2014-10-29 | Agfa Graphics Nv | Precursor de placa de impressão, litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão |
| US7763413B2 (en) * | 2007-10-16 | 2010-07-27 | Eastman Kodak Company | Methods for imaging and processing negative-working imageable elements |
| US20090142702A1 (en) * | 2007-12-04 | 2009-06-04 | Ray Kevin B | Methods of using violet-sensitive imageable elements |
| JP2009139852A (ja) * | 2007-12-10 | 2009-06-25 | Fujifilm Corp | 平版印刷版の作製方法及び平版印刷版原版 |
| WO2009084399A1 (ja) * | 2007-12-28 | 2009-07-09 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版の作製方法 |
| WO2009087862A1 (ja) * | 2008-01-10 | 2009-07-16 | Konica Minolta Medical & Graphic, Inc. | 平版印刷版の作製方法 |
| WO2009093513A1 (ja) * | 2008-01-25 | 2009-07-30 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版及び印刷方法 |
| US7977031B2 (en) * | 2008-03-26 | 2011-07-12 | Gary Ganghui Teng | Method of processing overcoated lithographic printing plate |
| PL2105799T3 (pl) | 2008-03-26 | 2012-07-31 | Agfa Nv | Sposób wytwarzania litograficznych płyt drukarskich |
| EP2259137B1 (de) | 2008-03-27 | 2016-08-31 | FUJIFILM Corporation | Verfahren zur herstellung einer lithografieplatte |
| JP5183268B2 (ja) | 2008-03-27 | 2013-04-17 | 富士フイルム株式会社 | 平版印刷版原版 |
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| EP2204698B1 (de) | 2009-01-06 | 2018-08-08 | FUJIFILM Corporation | Plattenoberflächenbehandlungsmittel für eine lithografische Druckplatte und Verfahren zur Behandlung der lithografischen Druckplatte |
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| EP2290447A1 (de) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | Satz zur Entwicklung einer Lithografiedruckplatte |
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| EP3587112B1 (de) | 2018-06-21 | 2024-04-03 | Eco3 Bv | Lithographiedruckplattenvorläufer |
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-
2006
- 2006-04-27 JP JP2006123823A patent/JP4792326B2/ja not_active Expired - Fee Related
- 2006-07-25 EP EP09163998A patent/EP2108999B1/de active Active
- 2006-07-25 EP EP06015456A patent/EP1748317B1/de active Active
- 2006-07-25 AT AT06015456T patent/ATE443280T1/de not_active IP Right Cessation
- 2006-07-25 US US11/492,119 patent/US20070020563A1/en not_active Abandoned
- 2006-07-25 DE DE602006009190T patent/DE602006009190D1/de active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007058170A (ja) | 2007-03-08 |
| EP1748317B1 (de) | 2009-09-16 |
| EP2108999A1 (de) | 2009-10-14 |
| EP2108999B1 (de) | 2013-01-09 |
| EP1748317A1 (de) | 2007-01-31 |
| US20070020563A1 (en) | 2007-01-25 |
| JP4792326B2 (ja) | 2011-10-12 |
| DE602006009190D1 (de) | 2009-10-29 |
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