ATE414732T1 - Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz - Google Patents

Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz

Info

Publication number
ATE414732T1
ATE414732T1 AT04792167T AT04792167T ATE414732T1 AT E414732 T1 ATE414732 T1 AT E414732T1 AT 04792167 T AT04792167 T AT 04792167T AT 04792167 T AT04792167 T AT 04792167T AT E414732 T1 ATE414732 T1 AT E414732T1
Authority
AT
Austria
Prior art keywords
photosensitive resin
photopolymerization initiator
producing
resin composition
resin product
Prior art date
Application number
AT04792167T
Other languages
English (en)
Inventor
Yoko Tomita
Kei Tomeba
Hiroshi Yamada
Original Assignee
Asahi Kasei Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Chemicals Corp filed Critical Asahi Kasei Chemicals Corp
Application granted granted Critical
Publication of ATE414732T1 publication Critical patent/ATE414732T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/44—Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C08L75/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT04792167T 2004-09-13 2004-10-07 Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz ATE414732T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004265446 2004-09-13

Publications (1)

Publication Number Publication Date
ATE414732T1 true ATE414732T1 (de) 2008-12-15

Family

ID=36059804

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04792167T ATE414732T1 (de) 2004-09-13 2004-10-07 Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz

Country Status (9)

Country Link
US (1) US20080063979A1 (de)
EP (1) EP1801145B1 (de)
JP (1) JP4627531B2 (de)
CN (1) CN101018819B (de)
AT (1) ATE414732T1 (de)
DE (1) DE602004017917D1 (de)
DK (1) DK1801145T3 (de)
ES (1) ES2314459T3 (de)
WO (1) WO2006030537A1 (de)

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EP1936438B1 (de) * 2006-12-20 2010-03-10 Agfa Graphics N.V. Flexodruckformvorläufer für Lasergravur
CN101616947B (zh) 2006-12-26 2012-06-06 旭化成电子材料株式会社 印刷版用树脂组合物
US8236479B2 (en) * 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
JP5241252B2 (ja) * 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
US20090191482A1 (en) * 2008-01-30 2009-07-30 E.I. Du Pont De Nemours And Company Device and method for preparing relief printing form
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
JP5322575B2 (ja) * 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP5398282B2 (ja) * 2008-09-17 2014-01-29 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版の製造方法、及びレリーフ印刷版
US8899148B2 (en) 2009-07-02 2014-12-02 E I Du Pont De Nemours And Company Method for printing a material onto a substrate
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JP4818458B2 (ja) * 2009-11-27 2011-11-16 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
EP2738010A4 (de) * 2011-07-28 2015-02-18 Fujifilm Corp Harzzusammensetzung für lasergravur, reliefdruckplattenvorläufer für lasergravur, verfahren zur herstellung eines reliefdruckplattenvorläufers für lasergravur, reliefdruckplattenvorläufer, verfahren zur herstellung einer reliefdruckplatte und reliefdruckplatte
US8678084B2 (en) 2011-08-05 2014-03-25 Baker Hughes Incorporated Reorienting annular debris barrier
US8794313B2 (en) 2011-08-05 2014-08-05 Baker Hughes Incorporated Annular gap debris barrier
US8631863B2 (en) 2011-08-05 2014-01-21 Baker Hughes Incorporated Snap mount annular debris barrier
US9069252B2 (en) 2011-08-26 2015-06-30 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
WO2014156813A1 (ja) * 2013-03-27 2014-10-02 Dic株式会社 活性エネルギー線硬化性組成物、その硬化塗膜、及び該硬化塗膜を有する物品
JP6259240B2 (ja) * 2013-09-30 2018-01-10 昭和電工株式会社 感光性樹脂の製造方法及びカラーフィルターの製造方法
MX2016012308A (es) * 2014-03-24 2016-11-30 Dws Srl Horno de fotocurado.
DE102016208923A1 (de) 2016-05-24 2017-11-30 Volkswagen Aktiengesellschaft Vergussmasse, Verfahren zum Herstellen der Vergussmasse, Elektronisches Bauteil und Kraftfahrzeug
CN106170179A (zh) * 2016-06-22 2016-11-30 深圳市博敏电子有限公司 一种防毛刺产生的ptfe高频印制线路板成型方法
CN106750338A (zh) * 2016-12-21 2017-05-31 田菱精细化工（大连）有限公司 一种光敏树脂及其制备方法
CN108329645B (zh) * 2018-02-01 2020-06-09 上海交通大学 一种紫外光诱导梯度结构的杂化材料、制备方法及其在响应性形状转变方面的应用
JP2020004932A (ja) * 2018-07-02 2020-01-09 日東シンコー株式会社 防湿シート
CN110667269A (zh) * 2019-06-28 2020-01-10 曾宪华 光敏印章材料结构及其生产方法
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Also Published As

Publication number Publication date
JPWO2006030537A1 (ja) 2008-05-08
CN101018819A (zh) 2007-08-15
WO2006030537A1 (ja) 2006-03-23
DK1801145T3 (da) 2009-02-16
JP4627531B2 (ja) 2011-02-09
US20080063979A1 (en) 2008-03-13
ES2314459T3 (es) 2009-03-16
EP1801145A4 (de) 2007-09-12
EP1801145A1 (de) 2007-06-27
EP1801145B1 (de) 2008-11-19
DE602004017917D1 (de) 2009-01-02
CN101018819B (zh) 2011-12-07

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