ATE418090T1 - Verfahren zur herstellung von kopien optischer elemente mittels eines photoresist- stempelverfahrens sowie entsprechend erzeugte kopien - Google Patents

Verfahren zur herstellung von kopien optischer elemente mittels eines photoresist- stempelverfahrens sowie entsprechend erzeugte kopien

Info

Publication number
ATE418090T1
ATE418090T1 AT99933617T AT99933617T ATE418090T1 AT E418090 T1 ATE418090 T1 AT E418090T1 AT 99933617 T AT99933617 T AT 99933617T AT 99933617 T AT99933617 T AT 99933617T AT E418090 T1 ATE418090 T1 AT E418090T1
Authority
AT
Austria
Prior art keywords
copies
photoresist
optical elements
stamping process
stamp
Prior art date
Application number
AT99933617T
Other languages
English (en)
Inventor
Thomas J Suleski
Michael R Feldman
Brian Harden
Original Assignee
Tessera North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tessera North America Inc filed Critical Tessera North America Inc
Application granted granted Critical
Publication of ATE418090T1 publication Critical patent/ATE418090T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Holo Graphy (AREA)
  • Micromachines (AREA)
AT99933617T 1998-07-02 1999-06-30 Verfahren zur herstellung von kopien optischer elemente mittels eines photoresist- stempelverfahrens sowie entsprechend erzeugte kopien ATE418090T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/109,914 US6027595A (en) 1998-07-02 1998-07-02 Method of making optical replicas by stamping in photoresist and replicas formed thereby

Publications (1)

Publication Number Publication Date
ATE418090T1 true ATE418090T1 (de) 2009-01-15

Family

ID=22330240

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99933617T ATE418090T1 (de) 1998-07-02 1999-06-30 Verfahren zur herstellung von kopien optischer elemente mittels eines photoresist- stempelverfahrens sowie entsprechend erzeugte kopien

Country Status (7)

Country Link
US (1) US6027595A (de)
EP (1) EP1110124B1 (de)
AT (1) ATE418090T1 (de)
AU (1) AU4963799A (de)
CA (1) CA2336467C (de)
DE (1) DE69940118D1 (de)
WO (1) WO2000002089A1 (de)

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997007429A1 (en) * 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US6518189B1 (en) * 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US8128856B2 (en) * 1995-11-15 2012-03-06 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20080136955A1 (en) * 1996-09-27 2008-06-12 Tessera North America. Integrated camera and associated methods
US8153957B2 (en) * 1996-09-27 2012-04-10 Digitaloptics Corporation East Integrated optical imaging systems including an interior space between opposing substrates and associated methods
US6096155A (en) * 1996-09-27 2000-08-01 Digital Optics Corporation Method of dicing wafer level integrated multiple optical elements
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6366907B1 (en) * 1999-12-15 2002-04-02 Napster, Inc. Real-time search engine
TW562755B (en) * 1999-12-31 2003-11-21 Ibm Stamp device for printing a pattern on a surface of a substrate
SE515962C2 (sv) * 2000-03-15 2001-11-05 Obducat Ab Anordning för överföring av mönster till objekt
KR100413334B1 (ko) * 2000-03-28 2003-12-31 주식회사 미뉴타텍 모세관 효과를 이용한 미세 패턴 형성 방법
US20040195202A1 (en) * 2000-04-28 2004-10-07 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
US6365059B1 (en) 2000-04-28 2002-04-02 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
AU2001277907A1 (en) * 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
WO2002014078A2 (en) 2000-08-14 2002-02-21 Surface Logix, Inc. Deformable stamp for patterning three-dimensional surfaces
AU2002211892A1 (en) * 2000-10-10 2002-04-22 Mems Optical, Inc. Deep grayscale etching of silicon
US20060005657A1 (en) * 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
KR101031528B1 (ko) * 2000-10-12 2011-04-27 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿
US7294294B1 (en) 2000-10-17 2007-11-13 Seagate Technology Llc Surface modified stamper for imprint lithography
US6673287B2 (en) * 2001-05-16 2004-01-06 International Business Machines Corporation Vapor phase surface modification of composite substrates to form a molecularly thin release layer
US6723198B1 (en) * 2001-05-24 2004-04-20 Seagate Technology Llc Servo pattern formation via transfer of sol-gel layer and magnetic media obtained thereby
DE10126859A1 (de) * 2001-06-01 2002-12-12 Siemens Ag Verfahren zur Erzeugung von leitfähigen Strukturen mittels Drucktechnik sowie daraus hergestellte aktive Bauelemente für integrierte Schaltungen
SE519573C2 (sv) * 2001-07-05 2003-03-11 Obducat Ab Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
US20030070569A1 (en) * 2001-10-11 2003-04-17 Colin Bulthaup Micro-stencil
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US6775839B1 (en) 2002-03-15 2004-08-10 O'brien Patrick J. Optical storage device with print layer surface feature
US6875695B2 (en) * 2002-04-05 2005-04-05 Mems Optical Inc. System and method for analog replication of microdevices having a desired surface contour
US6818532B2 (en) * 2002-04-09 2004-11-16 Oriol, Inc. Method of etching substrates
WO2003096123A1 (en) * 2002-05-08 2003-11-20 Agency For Science, Technology And Research Reversal imprint technique
US6849558B2 (en) * 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
JP3821069B2 (ja) * 2002-08-01 2006-09-13 株式会社日立製作所 転写パターンによる構造体の形成方法
US6957608B1 (en) 2002-08-02 2005-10-25 Kovio, Inc. Contact print methods
US7157031B2 (en) * 2002-08-26 2007-01-02 Seagate Technology Llc Method of replicating a textured surface
US20040250683A1 (en) * 2002-10-18 2004-12-16 Innovative Construction And Building Materials, Llc Advanced filtration devices and methods
AU2003287705A1 (en) * 2002-11-05 2004-06-07 Jingjiao Guan Self-folding polymer microparticles
US20040183220A1 (en) * 2003-03-18 2004-09-23 Avinash Dalmia Ultra thin layer coating using self-assembled molecules as a separating layer for diffraction grating application
DE502004004729D1 (de) * 2003-03-21 2007-10-04 Ovd Kinegram Ag Verfahren zur Herstellung von zwei überlagernden Mikrostrukturen
DE10318105B4 (de) * 2003-03-21 2007-09-20 Ovd Kinegram Ag Verfahren zur Herstellung von Mikrostrukturen
WO2004107403A2 (en) * 2003-05-23 2004-12-09 The Regents Of The University Of Michigan Imprinting polymer film on patterned substrate
US6860956B2 (en) * 2003-05-23 2005-03-01 Agency For Science, Technology & Research Methods of creating patterns on substrates and articles of manufacture resulting therefrom
TWI228638B (en) * 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US20070110361A1 (en) * 2003-08-26 2007-05-17 Digital Optics Corporation Wafer level integration of multiple optical elements
CN1997691B (zh) * 2003-09-23 2011-07-20 北卡罗来纳大学查珀尔希尔分校 光固化的全氟聚醚用作微流体器件中的新材料
US7114448B2 (en) * 2003-11-06 2006-10-03 Palo Alto Research Center, Incorporated Method for large-area patterning dissolved polymers by making use of an active stamp
CN1882991A (zh) * 2003-11-14 2006-12-20 皇家飞利浦电子股份有限公司 用于制造荧光光学信息载体的方法及其装置和载体
DK1704585T3 (en) 2003-12-19 2017-05-22 Univ North Carolina Chapel Hill Methods for preparing isolated micro- and nanostructures using soft lithography or printing lithography
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US7632087B2 (en) * 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
CN101189271A (zh) * 2004-02-13 2008-05-28 北卡罗来纳大学查珀尔希尔分校 制造微流体设备的功能材料和新型方法
US20050276919A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
EP1768846B1 (de) * 2004-06-03 2010-08-11 Molecular Imprints, Inc. Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
US20070228593A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
US7281919B2 (en) * 2004-12-07 2007-10-16 Molecular Imprints, Inc. System for controlling a volume of material on a mold
KR20070119624A (ko) * 2005-02-03 2007-12-20 유니버시티 오브 노스캐롤라이나 앳 채플 힐 액정 디스플레이에서 사용되는 낮은 표면 에너지 고분자물질
US7855046B2 (en) * 2005-04-07 2010-12-21 The University Of North Carolina At Charlotte Method and apparatus for fabricating shaped structures and shaped structures including one- , two- or three-dimensional patterns incorporated therein
US20060249246A1 (en) * 2005-05-06 2006-11-09 Ealey Mark A Method of fabricating replicated optics
JP4789039B2 (ja) * 2005-06-10 2011-10-05 独立行政法人産業技術総合研究所 ナノインプリント装置
US20090304992A1 (en) * 2005-08-08 2009-12-10 Desimone Joseph M Micro and Nano-Structure Metrology
EP1922364A4 (de) 2005-08-09 2010-04-21 Univ North Carolina Verfahren und materialien zur herstellung mikrofluidischer vorrichtungen
US8142850B2 (en) * 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US7625515B2 (en) * 2006-06-19 2009-12-01 Iowa State University Research Foundation, Inc. Fabrication of layer-by-layer photonic crystals using two polymer microtransfer molding
WO2008011051A1 (en) * 2006-07-17 2008-01-24 Liquidia Technologies, Inc. Nanoparticle fabrication methods, systems, and materials
KR100772441B1 (ko) * 2006-10-12 2007-11-01 삼성전기주식회사 임프린팅용 스탬퍼 제조방법
GB0701909D0 (en) * 2007-01-31 2007-03-14 Imp Innovations Ltd Deposition Of Organic Layers
US20100151031A1 (en) * 2007-03-23 2010-06-17 Desimone Joseph M Discrete size and shape specific organic nanoparticles designed to elicit an immune response
GB2453766A (en) * 2007-10-18 2009-04-22 Novalia Ltd Method of fabricating an electronic device
US20100123260A1 (en) * 2008-11-19 2010-05-20 Jacques Duparre Stamp with mask pattern for discrete lens replication
DE102009018849B4 (de) * 2009-04-24 2013-06-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Masterstruktur zum Prägen und/oder Bedrucken eines Grundmaterials, Vorrichtung zum kontinuierlichen Prägen und/oder Bedrucken eines Grundmaterials und Verfahren zum Herstellen einer Masterstruktur zum Prägen und/oder Bedrucken eines Grundmaterials
US9400219B2 (en) * 2009-05-19 2016-07-26 Iowa State University Research Foundation, Inc. Metallic layer-by-layer photonic crystals for linearly-polarized thermal emission and thermophotovoltaic device including same
JP2011025220A (ja) * 2009-06-24 2011-02-10 Tokyo Electron Ltd テンプレート処理装置、インプリントシステム、テンプレート処理方法、プログラム及びコンピュータ記憶媒体
US8227166B2 (en) * 2009-07-20 2012-07-24 Xerox Corporation Methods of making an improved photoreceptor outer layer
WO2011040466A1 (ja) * 2009-10-01 2011-04-07 東京エレクトロン株式会社 テンプレート処理装置、インプリントシステム、テンプレート処理方法、及びコンピュータ記憶媒体
KR101726625B1 (ko) * 2010-08-13 2017-04-14 엘지디스플레이 주식회사 롤 몰드, 그 제조 방법 및 장치와 그를 이용한 박막 패턴의 제조 방법
US8742406B1 (en) 2011-02-16 2014-06-03 Iowa State University Research Foundation, Inc. Soft lithography microlens fabrication and array for enhanced light extraction from organic light emitting diodes (OLEDs)
US20130122247A1 (en) 2011-11-10 2013-05-16 Omnivision Technologies, Inc. Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same
US20150109456A1 (en) * 2012-01-23 2015-04-23 Flir Systems, Inc. Tir imaging lens, image capturing system having the same, and associated methods
US9348120B2 (en) 2012-01-23 2016-05-24 Flir Systems Trading Belgium Bvba LWIR imaging lens, image capturing system having the same, and associated method
US20130208353A1 (en) 2012-01-23 2013-08-15 Jeremy Huddleston Lwir imaging lens, image capturing system having the same, and associated methods
US9780335B2 (en) 2012-07-20 2017-10-03 3M Innovative Properties Company Structured lamination transfer films and methods
US9246134B2 (en) 2014-01-20 2016-01-26 3M Innovative Properties Company Lamination transfer films for forming articles with engineered voids
EP3454120B1 (de) * 2017-09-09 2024-05-01 IMEC vzw Verfahren zur herstelling von euv retikeln und retikel für euv-lithographie
US10677964B2 (en) 2017-10-23 2020-06-09 Omnivision Technologies, Inc. Lens wafer assembly and associated method for manufacturing a stepped spacer wafer
WO2020036173A1 (ja) * 2018-08-14 2020-02-20 Ｓｃｉｖａｘ株式会社 微細構造体製造方法
CN117223032A (zh) * 2021-05-04 2023-12-12 指纹卡安娜卡敦知识产权有限公司 包括衍射元件的光学指纹传感器
US12353128B2 (en) * 2021-06-03 2025-07-08 Viavi Solutions Inc. Method of replicating a microstructure pattern

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2800476A1 (de) * 1977-01-07 1978-07-13 Instruments Sa Verfahren zur duplizierung einer optischen flaeche sowie so hergestelltes beugungsgitter
JPS5835742A (ja) * 1981-08-21 1983-03-02 Victor Co Of Japan Ltd 情報記録媒体円盤の製作に用いられるスタンパの製作法
JPS60103308A (ja) * 1983-11-11 1985-06-07 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
GB8420182D0 (en) * 1984-08-08 1984-09-12 Pa Consulting Services Diffraction gratings
US4840757A (en) * 1987-05-19 1989-06-20 S. D. Warren Company Replicating process for interference patterns
EP0426441B1 (de) * 1989-10-30 1996-12-11 Sharp Kabushiki Kaisha Optische Vorrichtung mit Mikrolinse und Verfahren zur Herstellung von Mikrolinsen
US4983459A (en) * 1990-04-03 1991-01-08 Ppg Industries, Inc. Chemically reacted glass surface
JP3067114B2 (ja) * 1991-06-04 2000-07-17 ソニー株式会社 マイクロレンズ形成方法
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5575878A (en) * 1994-11-30 1996-11-19 Honeywell Inc. Method for making surface relief profilers
US5597613A (en) * 1994-12-30 1997-01-28 Honeywell Inc. Scale-up process for replicating large area diffractive optical elements
WO1996029629A2 (en) * 1995-03-01 1996-09-26 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles

Also Published As

Publication number Publication date
EP1110124A1 (de) 2001-06-27
CA2336467C (en) 2007-09-25
EP1110124B1 (de) 2008-12-17
CA2336467A1 (en) 2000-01-13
WO2000002089A9 (en) 2001-09-27
DE69940118D1 (de) 2009-01-29
US6027595A (en) 2000-02-22
AU4963799A (en) 2000-01-24
WO2000002089A1 (en) 2000-01-13

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