ATE420877T1 - Heteroaromatische gruppen enthaltende oximester als photointiatoren - Google Patents
Heteroaromatische gruppen enthaltende oximester als photointiatorenInfo
- Publication number
- ATE420877T1 ATE420877T1 AT03789449T AT03789449T ATE420877T1 AT E420877 T1 ATE420877 T1 AT E420877T1 AT 03789449 T AT03789449 T AT 03789449T AT 03789449 T AT03789449 T AT 03789449T AT E420877 T1 ATE420877 T1 AT E420877T1
- Authority
- AT
- Austria
- Prior art keywords
- optionally substituted
- oximesters
- photointiators
- heteroaromatic groups
- containing heteroaromatic
- Prior art date
Links
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 abstract 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000002541 furyl group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 125000004076 pyridyl group Chemical group 0.000 abstract 1
- 125000000168 pyrrolyl group Chemical group 0.000 abstract 1
- 125000005493 quinolyl group Chemical group 0.000 abstract 1
- 125000001544 thienyl group Chemical group 0.000 abstract 1
- 125000005556 thienylene group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/333—Radicals substituted by oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/335—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/30—Indoles; Hydrogenated indoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to carbon atoms of the hetero ring
- C07D209/42—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/38—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/54—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
- C07D333/58—Radicals substituted by nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Indole Compounds (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Pyrrole Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Hydrogenated Pyridines (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02406054 | 2002-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE420877T1 true ATE420877T1 (de) | 2009-01-15 |
Family
ID=32405823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03789449T ATE420877T1 (de) | 2002-12-03 | 2003-11-24 | Heteroaromatische gruppen enthaltende oximester als photointiatoren |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7648738B2 (de) |
| EP (1) | EP1567518B1 (de) |
| JP (1) | JP4769461B2 (de) |
| KR (1) | KR101032582B1 (de) |
| CN (1) | CN1720245B (de) |
| AT (1) | ATE420877T1 (de) |
| AU (1) | AU2003294034A1 (de) |
| CA (1) | CA2505893A1 (de) |
| DE (1) | DE60325890D1 (de) |
| MX (1) | MXPA05005817A (de) |
| TW (1) | TWI326682B (de) |
| WO (1) | WO2004050653A2 (de) |
Families Citing this family (92)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4830310B2 (ja) * | 2004-02-23 | 2011-12-07 | 三菱化学株式会社 | オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター |
| JP2005300994A (ja) | 2004-04-13 | 2005-10-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
| WO2006005667A2 (en) * | 2004-07-08 | 2006-01-19 | Novo Nordisk A/S | Polypeptide protracting tags comprising a tetrazole moiety |
| JP4492238B2 (ja) | 2004-07-26 | 2010-06-30 | Jsr株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
| JP4864375B2 (ja) * | 2004-08-09 | 2012-02-01 | ドンジン セミケム カンパニー リミテッド | スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子 |
| ATE381540T1 (de) * | 2004-08-18 | 2008-01-15 | Ciba Sc Holding Ag | Oximesther-fotoinitiatoren |
| DE602005019888D1 (de) * | 2004-08-20 | 2010-04-22 | Adeka Corp | Oximesterverbindung und photopolymerisationsinitiator, der eine solche verbindung enthält |
| TWI385485B (zh) * | 2004-11-17 | 2013-02-11 | Jsr股份有限公司 | A photosensitive resin composition, a display panel spacer, and a display panel |
| JP4633582B2 (ja) * | 2005-09-06 | 2011-02-16 | 東京応化工業株式会社 | 感光性組成物 |
| JP4761923B2 (ja) * | 2005-10-20 | 2011-08-31 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
| KR100763744B1 (ko) * | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
| DE602006019788D1 (de) | 2005-12-01 | 2011-03-03 | Basf Se | Oximester-Fotoinitiatoren |
| US8586268B2 (en) | 2005-12-20 | 2013-11-19 | Basf Se | Oxime ester photoinitiators |
| US7909928B2 (en) * | 2006-03-24 | 2011-03-22 | The Regents Of The University Of Michigan | Reactive coatings for regioselective surface modification |
| KR101313538B1 (ko) * | 2006-04-06 | 2013-10-01 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
| TWI403840B (zh) | 2006-04-26 | 2013-08-01 | Fujifilm Corp | 含染料之負型硬化性組成物、彩色濾光片及其製法 |
| JP5256647B2 (ja) * | 2006-05-31 | 2013-08-07 | 三菱化学株式会社 | 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置 |
| JP4586783B2 (ja) * | 2006-09-22 | 2010-11-24 | 東洋インキ製造株式会社 | 感光性着色組成物およびカラーフィルタ |
| JP4913556B2 (ja) * | 2006-11-09 | 2012-04-11 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
| KR101337283B1 (ko) * | 2006-12-20 | 2013-12-06 | 미쓰비시 가가꾸 가부시키가이샤 | 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 |
| WO2008078686A1 (ja) | 2006-12-27 | 2008-07-03 | Adeka Corporation | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| KR101026612B1 (ko) * | 2007-01-19 | 2011-04-04 | 주식회사 엘지화학 | 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성화합물 및 이를 포함하는 감광성 조성물 |
| US8399047B2 (en) * | 2007-03-22 | 2013-03-19 | The Regents Of The Univeristy Of Michigan | Multifunctional CVD coatings |
| JP4855312B2 (ja) * | 2007-03-27 | 2012-01-18 | 東京応化工業株式会社 | 感光性組成物 |
| WO2008123110A1 (ja) * | 2007-04-04 | 2008-10-16 | Hitachi Chemical Company, Ltd. | 感光性接着剤組成物、フィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、半導体装置、及び、半導体装置の製造方法 |
| WO2008139924A1 (ja) | 2007-05-09 | 2008-11-20 | Adeka Corporation | 新規エポキシ化合物、アルカリ現像性樹脂組成物およびアルカリ現像性感光性樹脂組成物 |
| EP2144900B1 (de) * | 2007-05-11 | 2015-03-18 | Basf Se | Oximester-photoinitiatoren |
| US8349548B2 (en) | 2007-05-11 | 2013-01-08 | Basf Se | Oxime ester photoinitiators |
| CN102702073B (zh) | 2007-05-11 | 2015-06-10 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| US8338081B2 (en) | 2007-08-01 | 2012-12-25 | Adeka Corporation | Alkali-developable photosensitive resin composition and β-diketone compound |
| JP2009040762A (ja) * | 2007-08-09 | 2009-02-26 | Ciba Holding Inc | オキシムエステル光開始剤 |
| JP5056301B2 (ja) * | 2007-09-20 | 2012-10-24 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| KR100830561B1 (ko) * | 2007-10-09 | 2008-05-22 | 재단법인서울대학교산학협력재단 | 다기능성 액정화합물 및 이들의 제조방법 그리고 이로부터얻어진 미세패턴 |
| JP5329445B2 (ja) | 2008-02-22 | 2013-10-30 | 株式会社Adeka | 重合性化合物を含有する液晶組成物及び該液晶組成物を用いた液晶表示素子 |
| JP5437993B2 (ja) | 2008-04-01 | 2014-03-12 | 株式会社Adeka | 三官能(メタ)アクリレート化合物及び該化合物を含有する重合性組成物 |
| CN101918397B (zh) * | 2008-04-10 | 2013-11-06 | 株式会社Lg化学 | 光活性化合物以及含有该光活性化合物的感光性树脂组合物 |
| KR101102248B1 (ko) | 2008-04-10 | 2012-01-03 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
| CN102112438B (zh) | 2008-06-06 | 2014-07-23 | 巴斯夫欧洲公司 | 肟酯光敏引发剂 |
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| JP5284735B2 (ja) | 2008-09-18 | 2013-09-11 | 株式会社Adeka | 重合性光学活性イミド化合物及び該化合物を含有する重合性組成物 |
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| WO2010052882A1 (ja) * | 2008-11-05 | 2010-05-14 | 東京応化工業株式会社 | 感光性樹脂組成物及び基材 |
| JP5344892B2 (ja) | 2008-11-27 | 2013-11-20 | 富士フイルム株式会社 | インクジェット用インク組成物、及びインクジェット記録方法 |
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Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1180846A (en) | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| US6001517A (en) * | 1996-10-31 | 1999-12-14 | Kabushiki Kaisha Toshiba | Positive photosensitive polymer composition, method of forming a pattern and electronic parts |
| SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| MY121423A (en) * | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
| NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
-
2003
- 2003-11-24 KR KR1020057010115A patent/KR101032582B1/ko not_active Expired - Fee Related
- 2003-11-24 EP EP03789449A patent/EP1567518B1/de not_active Expired - Lifetime
- 2003-11-24 MX MXPA05005817A patent/MXPA05005817A/es unknown
- 2003-11-24 CA CA002505893A patent/CA2505893A1/en not_active Abandoned
- 2003-11-24 AT AT03789449T patent/ATE420877T1/de not_active IP Right Cessation
- 2003-11-24 WO PCT/EP2003/050880 patent/WO2004050653A2/en not_active Ceased
- 2003-11-24 US US10/535,962 patent/US7648738B2/en active Active
- 2003-11-24 CN CN2003801047043A patent/CN1720245B/zh not_active Expired - Lifetime
- 2003-11-24 JP JP2004556329A patent/JP4769461B2/ja not_active Expired - Fee Related
- 2003-11-24 AU AU2003294034A patent/AU2003294034A1/en not_active Abandoned
- 2003-11-24 DE DE60325890T patent/DE60325890D1/de not_active Expired - Lifetime
- 2003-12-02 TW TW092133880A patent/TWI326682B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003294034A1 (en) | 2004-06-23 |
| WO2004050653A3 (en) | 2004-09-16 |
| CA2505893A1 (en) | 2004-06-17 |
| KR101032582B1 (ko) | 2011-05-06 |
| EP1567518A2 (de) | 2005-08-31 |
| TW200422296A (en) | 2004-11-01 |
| CN1720245A (zh) | 2006-01-11 |
| US20060241259A1 (en) | 2006-10-26 |
| US7648738B2 (en) | 2010-01-19 |
| KR20050084149A (ko) | 2005-08-26 |
| AU2003294034A8 (en) | 2004-06-23 |
| JP4769461B2 (ja) | 2011-09-07 |
| CN1720245B (zh) | 2010-05-26 |
| JP2006516246A (ja) | 2006-06-29 |
| MXPA05005817A (es) | 2005-08-29 |
| EP1567518B1 (de) | 2009-01-14 |
| DE60325890D1 (de) | 2009-03-05 |
| TWI326682B (en) | 2010-07-01 |
| WO2004050653A2 (en) | 2004-06-17 |
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