ATE425853T1 - Vorrichtung zum schneiden einer substratschicht und entsprechendes verfahren - Google Patents
Vorrichtung zum schneiden einer substratschicht und entsprechendes verfahrenInfo
- Publication number
- ATE425853T1 ATE425853T1 AT03712201T AT03712201T ATE425853T1 AT E425853 T1 ATE425853 T1 AT E425853T1 AT 03712201 T AT03712201 T AT 03712201T AT 03712201 T AT03712201 T AT 03712201T AT E425853 T1 ATE425853 T1 AT E425853T1
- Authority
- AT
- Austria
- Prior art keywords
- cutting
- layer
- assembly
- cutting device
- substrate layer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
- H10P90/1916—Preparing SOI wafers using bonding with separation or delamination along an ion implanted layer, e.g. Smart-cut
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
- B28D5/0023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rectilinearly
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0052—Means for supporting or holding work during breaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
- H10W10/181—Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1059—Splitting sheet lamina in plane intermediate of faces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
- Y10T156/1184—Piercing layer during delaminating [e.g., cutting, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1189—Gripping and pulling work apart during delaminating with shearing during delaminating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1961—Severing delaminating means [e.g., chisel, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1961—Severing delaminating means [e.g., chisel, etc.]
- Y10T156/1967—Cutting delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1961—Severing delaminating means [e.g., chisel, etc.]
- Y10T156/1967—Cutting delaminating means
- Y10T156/1972—Shearing delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/307—Combined with preliminary weakener or with nonbreaking cutter
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/35—Work-parting pullers [bursters]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/371—Movable breaking tool
- Y10T225/379—Breaking tool intermediate spaced work supports
- Y10T225/386—Clamping supports
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/53274—Means to disassemble electrical device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/02—Other than completely through work thickness
- Y10T83/0267—Splitting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/364—By fluid blast and/or suction
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Electronic Switches (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
- Nonmetal Cutting Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0200028A FR2834381B1 (fr) | 2002-01-03 | 2002-01-03 | Dispositif de coupe de couche d'un substrat, et procede associe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE425853T1 true ATE425853T1 (de) | 2009-04-15 |
Family
ID=8871143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03712201T ATE425853T1 (de) | 2002-01-03 | 2003-01-02 | Vorrichtung zum schneiden einer substratschicht und entsprechendes verfahren |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US7182234B2 (de) |
| EP (1) | EP1469981B1 (de) |
| JP (2) | JP4757444B2 (de) |
| AT (1) | ATE425853T1 (de) |
| AU (1) | AU2003216776A1 (de) |
| DE (1) | DE60326700D1 (de) |
| FR (1) | FR2834381B1 (de) |
| TW (1) | TWI270133B (de) |
| WO (1) | WO2003059591A1 (de) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2823373B1 (fr) * | 2001-04-10 | 2005-02-04 | Soitec Silicon On Insulator | Dispositif de coupe de couche d'un substrat, et procede associe |
| US7736361B2 (en) * | 2003-02-14 | 2010-06-15 | The Board Of Trustees Of The Leland Stamford Junior University | Electrosurgical system with uniformly enhanced electric field and minimal collateral damage |
| US20050150597A1 (en) * | 2004-01-09 | 2005-07-14 | Silicon Genesis Corporation | Apparatus and method for controlled cleaving |
| TWI401739B (zh) | 2004-10-21 | 2013-07-11 | 富士軟片迪瑪提斯股份有限公司 | 蝕刻犧牲材 |
| TW200832505A (en) * | 2007-01-18 | 2008-08-01 | Silicon Genesis Corp | Controlled substrate cleave process and apparatus |
| KR100891384B1 (ko) * | 2007-06-14 | 2009-04-02 | 삼성모바일디스플레이주식회사 | 플렉서블 기판 접합 및 탈착장치 |
| JP2009154407A (ja) * | 2007-12-27 | 2009-07-16 | Tdk Corp | 剥離装置、剥離方法および情報記録媒体製造方法 |
| FR2925978B1 (fr) * | 2007-12-28 | 2010-01-29 | Commissariat Energie Atomique | Procede et dispositif de separation d'une structure. |
| JP2010010207A (ja) * | 2008-06-24 | 2010-01-14 | Tokyo Ohka Kogyo Co Ltd | 剥離装置および剥離方法 |
| US7927975B2 (en) | 2009-02-04 | 2011-04-19 | Micron Technology, Inc. | Semiconductor material manufacture |
| US8950459B2 (en) * | 2009-04-16 | 2015-02-10 | Suss Microtec Lithography Gmbh | Debonding temporarily bonded semiconductor wafers |
| KR101580924B1 (ko) * | 2009-08-25 | 2015-12-30 | 삼성전자주식회사 | 웨이퍼 분할 장치 및 웨이퍼 분할 방법 |
| US8479035B1 (en) | 2010-09-02 | 2013-07-02 | Google Inc. | Smart limited functionality mode manager |
| FR2977069B1 (fr) | 2011-06-23 | 2014-02-07 | Soitec Silicon On Insulator | Procede de fabrication d'une structure semi-conductrice mettant en oeuvre un collage temporaire |
| JP6167108B2 (ja) * | 2011-10-31 | 2017-07-19 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッドMemc Electronic Materials,Incorporated | 結合ウェハ構造体を劈開させるための固定装置及び劈開方法 |
| JP2013173913A (ja) * | 2011-11-10 | 2013-09-05 | Nitto Denko Corp | 板の剥離方法 |
| JP2013219328A (ja) * | 2012-03-13 | 2013-10-24 | Tokyo Electron Ltd | 剥離装置、剥離システム、剥離方法、プログラム及びコンピュータ記憶媒体 |
| JP5165806B1 (ja) * | 2012-06-29 | 2013-03-21 | 株式会社関プレス | 金属部品の製造方法及び該製造法によって得られる金属部品 |
| JP5870000B2 (ja) * | 2012-09-19 | 2016-02-24 | 東京エレクトロン株式会社 | 剥離装置、剥離システムおよび剥離方法 |
| JP5875962B2 (ja) * | 2012-09-19 | 2016-03-02 | 東京エレクトロン株式会社 | 剥離装置、剥離システムおよび剥離方法 |
| KR102007042B1 (ko) | 2012-09-19 | 2019-08-02 | 도쿄엘렉트론가부시키가이샤 | 박리 장치 |
| JP6014477B2 (ja) * | 2012-12-04 | 2016-10-25 | 東京エレクトロン株式会社 | 剥離装置、剥離システムおよび剥離方法 |
| JP5993731B2 (ja) * | 2012-12-04 | 2016-09-14 | 東京エレクトロン株式会社 | 剥離装置、剥離システムおよび剥離方法 |
| JP6101084B2 (ja) * | 2013-01-17 | 2017-03-22 | 株式会社ディスコ | 分離装置 |
| KR101503325B1 (ko) * | 2013-06-27 | 2015-03-18 | 코스텍시스템(주) | 디바이스 웨이퍼와 캐리어 웨이퍼의 디본딩 방법 및 본딩/디본딩 장치 |
| KR102437483B1 (ko) * | 2013-08-30 | 2022-08-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 적층의 가공 장치 및 가공 방법 |
| JP6223795B2 (ja) * | 2013-11-28 | 2017-11-01 | 日東電工株式会社 | 板の剥離方法 |
| JP6145415B2 (ja) * | 2014-02-27 | 2017-06-14 | 東京エレクトロン株式会社 | 剥離方法、プログラム、コンピュータ記憶媒体、剥離装置及び剥離システム |
| JP6548871B2 (ja) * | 2014-05-03 | 2019-07-24 | 株式会社半導体エネルギー研究所 | 積層体の基板剥離装置 |
| US9925679B2 (en) * | 2014-05-19 | 2018-03-27 | I+D+M Creative, Llc | Devices and methods for assisting with slicing items |
| KR102305505B1 (ko) * | 2014-09-29 | 2021-09-24 | 삼성전자주식회사 | 웨이퍼 서포팅 시스템 디본딩 이니시에이터 및 웨이퍼 서포팅 시스템 디본딩 방법 |
| DE102014118017A1 (de) | 2014-12-05 | 2016-06-09 | Ev Group E. Thallner Gmbh | Substratstapelhalterung, Container und Verfahren zur Trennung eines Substratstapels |
| JP6345611B2 (ja) * | 2015-02-04 | 2018-06-20 | 東京エレクトロン株式会社 | 剥離装置、剥離システム、剥離方法、プログラム、および情報記憶媒体 |
| KR101950157B1 (ko) * | 2015-08-11 | 2019-02-19 | 도오꾜오까고오교 가부시끼가이샤 | 지지체 분리 장치 및 지지체 분리 방법 |
| US10804407B2 (en) | 2016-05-12 | 2020-10-13 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing apparatus and stack processing apparatus |
| US11367462B1 (en) | 2019-01-28 | 2022-06-21 | Seagate Technology Llc | Method of laser cutting a hard disk drive substrate for an edge profile alignable to a registration support |
| CN113206024B (zh) * | 2020-01-31 | 2024-09-20 | 台湾积体电路制造股份有限公司 | 剥离系统及剥离方法 |
| JP2023102809A (ja) * | 2022-01-13 | 2023-07-26 | 株式会社ディスコ | 基板の製造方法 |
| CN116021199B (zh) * | 2023-02-14 | 2023-05-30 | 成都迈特利尔科技有限公司 | 钛板组坯焊接生产线及其压焊方法 |
| TWI850049B (zh) * | 2023-08-02 | 2024-07-21 | 澤米科技股份有限公司 | 光學基板切割後自動取片機 |
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| JP2534210B2 (ja) * | 1989-04-03 | 1996-09-11 | 三菱電機株式会社 | ウエハ剥し装置 |
| FR2681472B1 (fr) | 1991-09-18 | 1993-10-29 | Commissariat Energie Atomique | Procede de fabrication de films minces de materiau semiconducteur. |
| US5368291A (en) * | 1993-04-30 | 1994-11-29 | Calcomp, Inc. | Media stripper mechanism |
| JP3656254B2 (ja) * | 1994-02-28 | 2005-06-08 | 三菱住友シリコン株式会社 | 接着ウエーハの剥離方法及び剥離装置 |
| FR2725074B1 (fr) * | 1994-09-22 | 1996-12-20 | Commissariat Energie Atomique | Procede de fabrication d'une structure comportant une couche mince semi-conductrice sur un substrat |
| KR0165467B1 (ko) * | 1995-10-31 | 1999-02-01 | 김광호 | 웨이퍼 디본더 및 이를 이용한 웨이퍼 디본딩법 |
| WO1998023164A1 (en) | 1996-11-29 | 1998-06-04 | Unilever Plc | Black leaf tea |
| SG68035A1 (en) * | 1997-03-27 | 1999-10-19 | Canon Kk | Method and apparatus for separating composite member using fluid |
| SG70141A1 (en) * | 1997-12-26 | 2000-01-25 | Canon Kk | Sample separating apparatus and method and substrate manufacturing method |
| JP3940806B2 (ja) * | 1998-05-15 | 2007-07-04 | 株式会社ニコン | 光波測距装置 |
| US6427748B1 (en) * | 1998-07-27 | 2002-08-06 | Canon Kabushiki Kaisha | Sample processing apparatus and method |
| JP2000091304A (ja) * | 1998-09-09 | 2000-03-31 | Canon Inc | 試料の分離装置及び分離方法及び分離の監視装置並びに基板の製造方法 |
| JP2000188269A (ja) * | 1998-10-16 | 2000-07-04 | Canon Inc | 部材の分離方法及び分離装置並びに基板の製造方法 |
| EP0989593A3 (de) | 1998-09-25 | 2002-01-02 | Canon Kabushiki Kaisha | Verfahren und Vorrichtung zur Zerteilung von Substrat und Substratherstellungverfahren |
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-
2002
- 2002-01-03 FR FR0200028A patent/FR2834381B1/fr not_active Expired - Fee Related
-
2003
- 2003-01-02 AT AT03712201T patent/ATE425853T1/de not_active IP Right Cessation
- 2003-01-02 WO PCT/FR2003/000002 patent/WO2003059591A1/fr not_active Ceased
- 2003-01-02 JP JP2003559738A patent/JP4757444B2/ja not_active Expired - Lifetime
- 2003-01-02 TW TW092100002A patent/TWI270133B/zh not_active IP Right Cessation
- 2003-01-02 DE DE60326700T patent/DE60326700D1/de not_active Expired - Lifetime
- 2003-01-02 EP EP03712201A patent/EP1469981B1/de not_active Expired - Lifetime
- 2003-01-02 AU AU2003216776A patent/AU2003216776A1/en not_active Abandoned
-
2004
- 2004-07-01 US US10/883,435 patent/US7182234B2/en not_active Expired - Lifetime
-
2007
- 2007-01-11 US US11/622,053 patent/US8083115B2/en not_active Expired - Lifetime
-
2010
- 2010-12-10 JP JP2010276059A patent/JP2011103471A/ja active Pending
-
2011
- 2011-11-10 US US13/293,772 patent/US8991673B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| TW200307320A (en) | 2003-12-01 |
| FR2834381A1 (fr) | 2003-07-04 |
| JP4757444B2 (ja) | 2011-08-24 |
| US20120048906A1 (en) | 2012-03-01 |
| DE60326700D1 (de) | 2009-04-30 |
| EP1469981A1 (de) | 2004-10-27 |
| JP2005514241A (ja) | 2005-05-19 |
| AU2003216776A1 (en) | 2003-07-30 |
| FR2834381B1 (fr) | 2004-02-27 |
| US8991673B2 (en) | 2015-03-31 |
| EP1469981B1 (de) | 2009-03-18 |
| US20050000649A1 (en) | 2005-01-06 |
| US20070119893A1 (en) | 2007-05-31 |
| WO2003059591A1 (fr) | 2003-07-24 |
| US8083115B2 (en) | 2011-12-27 |
| JP2011103471A (ja) | 2011-05-26 |
| US7182234B2 (en) | 2007-02-27 |
| TWI270133B (en) | 2007-01-01 |
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| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |