ATE434203T1 - Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte - Google Patents

Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte

Info

Publication number
ATE434203T1
ATE434203T1 AT08005816T AT08005816T ATE434203T1 AT E434203 T1 ATE434203 T1 AT E434203T1 AT 08005816 T AT08005816 T AT 08005816T AT 08005816 T AT08005816 T AT 08005816T AT E434203 T1 ATE434203 T1 AT E434203T1
Authority
AT
Austria
Prior art keywords
printing plate
lithographic printing
producing
plate precursor
layer containing
Prior art date
Application number
AT08005816T
Other languages
English (en)
Inventor
Hidekazu Oohashi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE434203T1 publication Critical patent/ATE434203T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/305—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the brushing or rubbing means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
AT08005816T 2007-03-30 2008-03-27 Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte ATE434203T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007095469A JP4866774B2 (ja) 2007-03-30 2007-03-30 平版印刷版原版及び平版印刷版の作製方法

Publications (1)

Publication Number Publication Date
ATE434203T1 true ATE434203T1 (de) 2009-07-15

Family

ID=39482707

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08005816T ATE434203T1 (de) 2007-03-30 2008-03-27 Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte

Country Status (4)

Country Link
EP (1) EP1975709B1 (de)
JP (1) JP4866774B2 (de)
AT (1) ATE434203T1 (de)
DE (1) DE602008000023D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200910005A (en) * 2007-07-26 2009-03-01 Fujifilm Corp Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device
JP2010197620A (ja) 2009-02-24 2010-09-09 Fujifilm Corp 平版印刷版原版の自動現像装置及び処理方法
JP2011154367A (ja) * 2009-12-28 2011-08-11 Fujifilm Corp 平版印刷版の作製方法
JP5624880B2 (ja) 2009-12-28 2014-11-12 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5322963B2 (ja) * 2010-01-29 2013-10-23 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP6010316B2 (ja) * 2012-03-30 2016-10-19 株式会社ニデック コーティング用材料
WO2016047309A1 (ja) 2014-09-26 2016-03-31 富士フイルム株式会社 平版印刷版原版、その製造方法、及びそれを用いる印刷方法
WO2016129374A1 (ja) 2015-02-13 2016-08-18 富士フイルム株式会社 平版印刷版原版、その製造方法、及びそれを用いる印刷方法
EP3900942B1 (de) * 2019-01-31 2024-09-04 FUJIFILM Corporation Flachdruckplattenvorläufer, verfahren zur herstellung einer flachdruckplatte und flachdruckverfahren

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08314127A (ja) * 1995-05-18 1996-11-29 Konica Corp 感光性平版印刷版
US6030750A (en) 1995-10-24 2000-02-29 Agfa-Gevaert. N.V. Method for making a lithographic printing plate involving on press development
EP0770494B1 (de) 1995-10-24 2000-05-24 Agfa-Gevaert N.V. Verfahren zur Herstellung einer lithographische Druckplatte mit auf der Druckpresse stattfindenden Entwicklung
JP3676602B2 (ja) 1999-01-28 2005-07-27 富士写真フイルム株式会社 感熱平版印刷原版
JP2001277740A (ja) 2000-01-27 2001-10-10 Fuji Photo Film Co Ltd 平版印刷版用原版
US6740464B2 (en) 2000-01-14 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP2001337460A (ja) 2000-03-21 2001-12-07 Fuji Photo Film Co Ltd 平版印刷版用原版
EP1410907B1 (de) 2000-06-02 2016-05-18 FUJIFILM Corporation Flachdruckplattenvorläufer
JP2002029162A (ja) 2000-07-13 2002-01-29 Fuji Photo Film Co Ltd 平版印刷用原板
JP2002046361A (ja) 2000-08-01 2002-02-12 Fuji Photo Film Co Ltd 平版印刷用原板
JP4253432B2 (ja) 2000-11-01 2009-04-15 富士フイルム株式会社 平版印刷版用原版
US6566029B2 (en) 2000-12-13 2003-05-20 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4343462B2 (ja) 2001-02-28 2009-10-14 富士フイルム株式会社 平版印刷版原版
JP2005004035A (ja) * 2003-06-13 2005-01-06 Konica Minolta Medical & Graphic Inc 平版印刷版の製版方法、及びその製法にて作製された平版印刷版
ATE389900T1 (de) 2004-08-24 2008-04-15 Fujifilm Corp Verfahren zur herstellung einer lithographischen druckplatte
EP1798031A3 (de) 2005-01-26 2007-07-04 FUJIFILM Corporation Flachdruckplattenvorläufer und Flachdruckverfahren
US7348131B2 (en) 2005-07-05 2008-03-25 Gary Ganghui Teng Laser sensitive lithographic printing plate having a darker aluminum substrate
JP4792326B2 (ja) * 2005-07-25 2011-10-12 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
EP1865382A1 (de) 2006-06-09 2007-12-12 FUJIFILM Corporation Verfahren zur Herstellung einer Lithographiedruckplatte und Lithographiedruckplatte

Also Published As

Publication number Publication date
JP2008256742A (ja) 2008-10-23
EP1975709A1 (de) 2008-10-01
DE602008000023D1 (de) 2009-07-30
EP1975709B1 (de) 2009-06-17
JP4866774B2 (ja) 2012-02-01

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