ATE445231T1 - Wafer mit verbesserten leitenden schleifen im ritzrahmen - Google Patents

Wafer mit verbesserten leitenden schleifen im ritzrahmen

Info

Publication number
ATE445231T1
ATE445231T1 AT05772266T AT05772266T ATE445231T1 AT E445231 T1 ATE445231 T1 AT E445231T1 AT 05772266 T AT05772266 T AT 05772266T AT 05772266 T AT05772266 T AT 05772266T AT E445231 T1 ATE445231 T1 AT E445231T1
Authority
AT
Austria
Prior art keywords
wafer
ritting
frame
protecting
conductive loop
Prior art date
Application number
AT05772266T
Other languages
English (en)
Inventor
Heimo Scheucher
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE445231T1 publication Critical patent/ATE445231T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00—Cutting or separating of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W42/00—Arrangements for protection of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Dicing (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AT05772266T 2004-07-26 2005-07-20 Wafer mit verbesserten leitenden schleifen im ritzrahmen ATE445231T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04103570 2004-07-26
PCT/IB2005/052428 WO2006013508A2 (en) 2004-07-26 2005-07-20 Wafer with improved conductive loops in the dicing lines

Publications (1)

Publication Number Publication Date
ATE445231T1 true ATE445231T1 (de) 2009-10-15

Family

ID=35583335

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05772266T ATE445231T1 (de) 2004-07-26 2005-07-20 Wafer mit verbesserten leitenden schleifen im ritzrahmen

Country Status (8)

Country Link
US (1) US7576412B2 (de)
EP (1) EP1774587B1 (de)
JP (1) JP2008507852A (de)
KR (1) KR20070038549A (de)
CN (1) CN101006578B (de)
AT (1) ATE445231T1 (de)
DE (1) DE602005017045D1 (de)
WO (1) WO2006013508A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE485597T1 (de) 2007-07-12 2010-11-15 Nxp Bv Integrierte schaltungen auf einem wafer und verfahren zur herstellung integrierter schaltungen
US10896878B2 (en) * 2019-06-18 2021-01-19 Nxp B.V. Integrated circuit saw bow break point

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5596226A (en) * 1994-09-06 1997-01-21 International Business Machines Corporation Semiconductor chip having a chip metal layer and a transfer metal and corresponding electronic module
EP0843476A1 (de) 1996-11-19 1998-05-20 Deutsche Thomson-Brandt Gmbh Verfahren und Dekoder zur Datenverarbeitung in Teletextseiten
JPH10163522A (ja) * 1996-11-29 1998-06-19 Kyocera Corp Ｌｅｄアレイの製造方法
JP3410371B2 (ja) * 1998-08-18 2003-05-26 リンテック株式会社 ウエハ裏面研削時の表面保護シートおよびその利用方法
CN1322574C (zh) * 1999-07-30 2007-06-20 日本板硝子株式会社 在切割区中设置的槽的结构及其应用
JP3339485B2 (ja) * 2000-01-24 2002-10-28 日本電気株式会社 半導体装置
EP1360724B1 (de) * 2000-07-21 2006-07-26 Koninklijke Philips Electronics N.V. Verfahren zur Herstellung integrierter Schaltungen mit verbesserten Leiterbahnen in sogenannter "Sägebügel"-Form
US6492247B1 (en) * 2000-11-21 2002-12-10 International Business Machines Corporation Method for eliminating crack damage induced by delaminating gate conductor interfaces in integrated circuits
JP4405719B2 (ja) * 2002-10-17 2010-01-27 株式会社ルネサステクノロジ 半導体ウエハ

Also Published As

Publication number Publication date
WO2006013508A3 (en) 2006-04-06
US7576412B2 (en) 2009-08-18
JP2008507852A (ja) 2008-03-13
EP1774587A2 (de) 2007-04-18
EP1774587B1 (de) 2009-10-07
US20080001259A1 (en) 2008-01-03
DE602005017045D1 (de) 2009-11-19
KR20070038549A (ko) 2007-04-10
CN101006578A (zh) 2007-07-25
CN101006578B (zh) 2010-06-23
WO2006013508A2 (en) 2006-02-09

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties