ATE449318T1 - Spektroskopische polarimetrie - Google Patents

Spektroskopische polarimetrie

Info

Publication number
ATE449318T1
ATE449318T1 AT06005739T AT06005739T ATE449318T1 AT E449318 T1 ATE449318 T1 AT E449318T1 AT 06005739 T AT06005739 T AT 06005739T AT 06005739 T AT06005739 T AT 06005739T AT E449318 T1 ATE449318 T1 AT E449318T1
Authority
AT
Austria
Prior art keywords
sample
retarder
retardation
light
measurement error
Prior art date
Application number
AT06005739T
Other languages
English (en)
Inventor
Hiroshi Okabe
Kenichi Matoba
Kazuhiko Oka
Original Assignee
Omron Tateisi Electronics Co
Univ Hokkaido Nat Univ Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Tateisi Electronics Co, Univ Hokkaido Nat Univ Corp filed Critical Omron Tateisi Electronics Co
Application granted granted Critical
Publication of ATE449318T1 publication Critical patent/ATE449318T1/de

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04G—SCAFFOLDING; FORMS; SHUTTERING; BUILDING IMPLEMENTS OR AIDS, OR THEIR USE; HANDLING BUILDING MATERIALS ON THE SITE; REPAIRING, BREAKING-UP OR OTHER WORK ON EXISTING BUILDINGS
    • E04G21/00—Preparing, conveying, or working-up building materials or building elements in situ; Other devices or measures for constructional work
    • E04G21/14—Conveying or assembling building elements
    • E04G21/16—Tools or apparatus
    • E04G21/20—Tools or apparatus for applying mortar
    • E04G21/201—Trowels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04G—SCAFFOLDING; FORMS; SHUTTERING; BUILDING IMPLEMENTS OR AIDS, OR THEIR USE; HANDLING BUILDING MATERIALS ON THE SITE; REPAIRING, BREAKING-UP OR OTHER WORK ON EXISTING BUILDINGS
    • E04G21/00—Preparing, conveying, or working-up building materials or building elements in situ; Other devices or measures for constructional work
    • E04G21/14—Conveying or assembling building elements
    • E04G21/16—Tools or apparatus
    • E04G21/18—Adjusting tools; Templates
    • E04G21/1808—Holders for bricklayers' lines, bricklayers' bars; Sloping braces
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04G—SCAFFOLDING; FORMS; SHUTTERING; BUILDING IMPLEMENTS OR AIDS, OR THEIR USE; HANDLING BUILDING MATERIALS ON THE SITE; REPAIRING, BREAKING-UP OR OTHER WORK ON EXISTING BUILDINGS
    • E04G21/00—Preparing, conveying, or working-up building materials or building elements in situ; Other devices or measures for constructional work
    • E04G21/14—Conveying or assembling building elements
    • E04G21/16—Tools or apparatus
    • E04G21/22—Tools or apparatus for setting building elements with mortar, e.g. bricklaying machines
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/447—Polarisation spectrometry

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
AT06005739T 2005-03-28 2006-03-21 Spektroskopische polarimetrie ATE449318T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005091763 2005-03-28
JP2005362047A JP3909363B2 (ja) 2005-03-28 2005-12-15 分光偏光計測方法

Publications (1)

Publication Number Publication Date
ATE449318T1 true ATE449318T1 (de) 2009-12-15

Family

ID=36617143

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06005739T ATE449318T1 (de) 2005-03-28 2006-03-21 Spektroskopische polarimetrie

Country Status (8)

Country Link
US (2) US20060238759A1 (de)
EP (1) EP1707929B1 (de)
JP (1) JP3909363B2 (de)
KR (1) KR100765709B1 (de)
CN (1) CN1841030B (de)
AT (1) ATE449318T1 (de)
DE (1) DE602006010465D1 (de)
TW (1) TWI279529B (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007080790A1 (ja) * 2006-01-13 2007-07-19 National University Corporation Tokyo University Of Agriculture And Technology 計測装置及び計測方法、並びに、特性計測ユニット
US8368889B2 (en) * 2007-04-12 2013-02-05 The Arizona Board Of Regents On Behalf Of The University Of Arizona Compact snapshot polarimetry camera
JP5140789B2 (ja) * 2007-06-26 2013-02-13 オムロン株式会社 分光偏光計測装置
TWI413765B (zh) * 2009-11-20 2013-11-01 Ind Tech Res Inst 物質特性量測方法與系統
JP5048795B2 (ja) 2010-01-21 2012-10-17 浜松ホトニクス株式会社 分光装置
CN102749332B (zh) * 2011-04-18 2015-08-26 通用电气公司 光学系统和光学检测装置以及检测方法
US9097585B2 (en) 2011-09-08 2015-08-04 William B. Sparks Spectrographic polarimeter and method of recording state of polarity
CN102435418B (zh) * 2011-09-15 2013-08-21 中国科学院长春光学精密机械与物理研究所 ArF激光光学薄膜元件综合偏振测量装置及测量方法
TWI457550B (zh) * 2012-03-16 2014-10-21 Nat Univ Tsing Hua 量化材料未知應力與殘餘應力之裝置及其方法
JP6180311B2 (ja) * 2013-12-13 2017-08-16 大塚電子株式会社 偏光解析装置
KR102497215B1 (ko) 2016-05-16 2023-02-07 삼성전자 주식회사 계측 설비의 스펙트럼 보정방법, 및 그 스펙트럼 보정방법을 기반으로 하는 소자의 계측방법과 제조방법
CN107505063B (zh) * 2017-07-13 2019-07-12 北京航空航天大学 一种基于高频正弦校准光的激光光线偏折校正装置及方法
WO2020097485A2 (en) * 2018-11-08 2020-05-14 Seti Institute Method and system for polarimetry using static geometric polarization manipulation
GB201820796D0 (en) 2018-12-20 2019-02-06 Dublin Institute Of Tech Imaging of biological tissue
JP7296239B2 (ja) * 2019-04-10 2023-06-22 オムロン株式会社 光学計測装置、光学計測方法、及び光学計測プログラム
CN110261317B (zh) * 2019-06-17 2021-11-16 西安理工大学 一种Mueller矩阵光谱的测量系统及方法
CN110907403B (zh) * 2019-11-18 2021-07-09 中国科学技术大学 单次直接定量相位成像的实现装置
CN111209661B (zh) * 2019-12-31 2023-05-09 武汉颐光科技有限公司 一种光谱椭偏测量带宽和数值孔径退偏效应修正建模方法及装置
US11736199B1 (en) * 2020-01-29 2023-08-22 Cable Television Laboratories, Inc. Systems and methods for phase compensation
CN111965114B (zh) * 2020-08-15 2023-08-29 天津大学 一种导管偏振敏感光学相干层析成像本地双折射解调方法
JP7569256B2 (ja) * 2021-04-09 2024-10-17 アンリツ株式会社 物品検査装置
CN113218877B (zh) * 2021-05-20 2022-04-15 华南师范大学 一种穆勒矩阵检测装置的校准方法
CN114812821B (zh) * 2022-04-26 2024-08-23 北京环境特性研究所 可见近红外偏振光谱仪偏振辐射定标方法和装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06288835A (ja) 1993-03-30 1994-10-18 Shimadzu Corp エリプソメータ
JP3329898B2 (ja) * 1993-07-15 2002-09-30 株式会社日清製粉グループ本社 マルチチャンネル型フーリエ変換分光装置
JPH10143060A (ja) 1996-11-11 1998-05-29 Gakken Co Ltd コンピュータを用いたブラインドタッチ練習システム
AU2001292780A1 (en) * 2000-09-20 2002-04-02 Sivakumar Manickavasagam A non-intrusive method and apparatus for characterizing particles based on scattering of elliptically polarized radiation
EP1213578A1 (de) 2000-12-07 2002-06-12 Semiconductor300 GmbH & Co KG Verfahren und Vorrichtung zur Ermittlung des Depolarisierungsgrads eines linear polarisierten Lichtstrahls
JP2003121641A (ja) * 2001-10-10 2003-04-23 Nitto Denko Corp 積層位相差板、偏光部材及び液晶表示装置
US6824838B2 (en) * 2002-03-11 2004-11-30 Fuji Photo Film Co., Ltd. Retarders and circular polarizers
JP4045140B2 (ja) 2002-06-21 2008-02-13 国立大学法人 筑波大学 偏光感受型光スペクトル干渉コヒーレンストモグラフィー装置及び該装置による試料内部の偏光情報の測定方法
DE60209672T2 (de) * 2002-10-15 2006-11-16 Centre National De La Recherche Scientifique (C.N.R.S.) Auf Flüssigkristallen basierendes polarimetrisches System, Verfahren zu seiner Kalibrierung, und polarimetrisches Messverfahren
US7202950B2 (en) * 2003-07-08 2007-04-10 Marine Biological Laboratory Retardance measurement system and method
JP4224644B2 (ja) * 2005-01-21 2009-02-18 北海道ティー・エル・オー株式会社 分光偏光計測方法
JP4205704B2 (ja) * 2005-08-02 2009-01-07 国立大学法人 北海道大学 撮像偏光計測方法

Also Published As

Publication number Publication date
US20060238759A1 (en) 2006-10-26
EP1707929A1 (de) 2006-10-04
JP2006308550A (ja) 2006-11-09
TWI279529B (en) 2007-04-21
CN1841030A (zh) 2006-10-04
JP3909363B2 (ja) 2007-04-25
KR100765709B1 (ko) 2007-10-11
DE602006010465D1 (de) 2009-12-31
CN1841030B (zh) 2011-01-12
TW200643388A (en) 2006-12-16
US9645011B2 (en) 2017-05-09
EP1707929B1 (de) 2009-11-18
US20110080586A1 (en) 2011-04-07
KR20060103848A (ko) 2006-10-04

Similar Documents

Publication Publication Date Title
ATE449318T1 (de) Spektroskopische polarimetrie
ATE460641T1 (de) Optisches bildmessgerät
EP1760424A4 (de) Verteilter faseroptischer sensor
WO2008145371A3 (de) Wellenlängen- oder polarisationssensitiver optischer aufbau und dessen verwendung
WO2007109344A3 (en) Vibrational circular dichroism spectrometer using reflective optics
WO2012165837A3 (ko) 라만 분석 기반 고속 다중 약물 고속 스크리닝 장치
WO2010017952A3 (en) Low-contamination optical arrangement
ATE542107T1 (de) Selbstmischende lasermessvorrichtung
WO2009011079A1 (ja) 透明基板の端部検出方法及び端部検出装置並びに処理装置
JP2007171206A5 (de)
WO2009054516A1 (ja) 試料検知装置およびこれを備えた測定装置
WO2009049834A3 (en) Optical sensor device
DE502007001398D1 (de) Vorrichtung zur optischen messung von stoffkonzentrationen
JP2008122838A5 (de)
ATE527559T1 (de) Lichtschrankenanordnung
JP2010071871A5 (de)
ATE464546T1 (de) Temperaturmessanordnung
EP2709218A3 (de) Stabilisiertes Pumplaserausgangssystem und Verfahren
WO2007130990A3 (en) Measurement of linear and circular diattenuation in optical elements
WO2008081374A3 (en) Reflection or single scattering spectroscopy and imaging
EP1845365A4 (de) Optisches element und optische messvorrichtung damit
ITVI20050301A1 (it) Struttura guidacavo, particolarmente per cicli
WO2009048003A1 (ja) 表面検査装置
WO2006001834A3 (en) Passive optical sensor using carbon nanotubes
TW200639371A (en) Optical metrology of a structure formed on a semiconductor wafer using optical pulses

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties