ATE449978T1 - Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente - Google Patents

Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente

Info

Publication number
ATE449978T1
ATE449978T1 AT04745657T AT04745657T ATE449978T1 AT E449978 T1 ATE449978 T1 AT E449978T1 AT 04745657 T AT04745657 T AT 04745657T AT 04745657 T AT04745657 T AT 04745657T AT E449978 T1 ATE449978 T1 AT E449978T1
Authority
AT
Austria
Prior art keywords
components
production method
optical elements
holding device
lens tube
Prior art date
Application number
AT04745657T
Other languages
English (en)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33508740&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE449978(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE449978T1 publication Critical patent/ATE449978T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Lens Barrels (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eyeglasses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
AT04745657T 2003-06-06 2004-06-07 Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente ATE449978T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003163023 2003-06-06
PCT/JP2004/007947 WO2004109357A1 (ja) 2003-06-06 2004-06-07 光学素子保持装置、鏡筒、露光装置、及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
ATE449978T1 true ATE449978T1 (de) 2009-12-15

Family

ID=33508740

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04745657T ATE449978T1 (de) 2003-06-06 2004-06-07 Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente

Country Status (8)

Country Link
US (2) US20060139775A1 (de)
EP (1) EP1632799B2 (de)
JP (1) JP4665759B2 (de)
KR (1) KR101281357B1 (de)
CN (1) CN100576003C (de)
AT (1) ATE449978T1 (de)
DE (1) DE602004024302D1 (de)
WO (1) WO2004109357A1 (de)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004025832A1 (de) * 2004-05-24 2005-12-22 Carl Zeiss Smt Ag Optikmodul für ein Objektiv
WO2005064382A1 (ja) * 2003-12-25 2005-07-14 Nikon Corporation 光学素子の保持装置、鏡筒、露光装置、及びデバイスの製造方法
JP4655520B2 (ja) * 2004-06-29 2011-03-23 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2007147760A (ja) * 2005-11-24 2007-06-14 Fujitsu Ten Ltd レンズ構造および調整治具構造
US7886449B2 (en) * 2007-02-20 2011-02-15 Electro Scientific Industries, Inc. Flexure guide bearing for short stroke stage
JP2008242448A (ja) * 2007-02-28 2008-10-09 Canon Inc 光学要素保持装置
JP5165699B2 (ja) * 2007-02-28 2013-03-21 コーニング インコーポレイテッド 一点の周囲に回動可能な光学マウント
DE102007027200A1 (de) * 2007-06-13 2008-12-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
CN104111589A (zh) * 2007-07-18 2014-10-22 株式会社尼康 测量方法、载台装置、及曝光装置
DE102007047109A1 (de) * 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
JP5588358B2 (ja) * 2008-02-29 2014-09-10 コーニング インコーポレイテッド キネマティック光学マウント
NL1036701A1 (nl) * 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
US8227768B2 (en) * 2008-06-25 2012-07-24 Axcelis Technologies, Inc. Low-inertia multi-axis multi-directional mechanically scanned ion implantation system
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
CN101770063B (zh) * 2009-01-07 2011-07-27 鸿富锦精密工业（深圳）有限公司 调焦模组制造方法
TWI425291B (zh) * 2009-01-16 2014-02-01 Hon Hai Prec Ind Co Ltd 調焦模組及調焦模組的製造方法
DE102009005954B4 (de) * 2009-01-20 2010-10-21 Carl Zeiss Smt Ag Dämpfungsvorrichtung
JP2010271457A (ja) * 2009-05-20 2010-12-02 Canon Inc 光学素子位置調整機構、光学素子位置調整機構を備えた露光装置及び光学素子位置調整方法
DE102009037133B4 (de) * 2009-07-31 2013-01-31 Carl Zeiss Laser Optics Gmbh Haltevorrichtung für ein optisches Element
KR101631958B1 (ko) * 2010-01-14 2016-06-20 엘지전자 주식회사 입력 장치 및 이를 구비하는 이동 단말기
JP5917526B2 (ja) 2010-09-29 2016-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を位置合わせするシステム及びその方法
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
KR101924309B1 (ko) * 2011-12-20 2018-11-30 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
EP2757571B1 (de) * 2013-01-17 2017-09-20 IMS Nanofabrication AG Hochspannungsisolationsvorrichtung für eine optische Vorrichtung mit geladenen Partikeln
JP2015023286A (ja) 2013-07-17 2015-02-02 アイエムエス ナノファブリケーション アーゲー 複数のブランキングアレイを有するパターン画定装置
DE102014102220B3 (de) * 2014-02-20 2015-04-30 Jenoptik Optical Systems Gmbh Verfahren zum Herstellen einer Linsenfassung und eine in einem Tubus radial fixierbare Linsenfassung
EP2913838B1 (de) 2014-02-28 2018-09-19 IMS Nanofabrication GmbH Kompensation defekter Beamlets in einem Ladungsträger-Mehrstrahlbelichtungswerkzeug
US9443699B2 (en) 2014-04-25 2016-09-13 Ims Nanofabrication Ag Multi-beam tool for cutting patterns
EP2950325B1 (de) 2014-05-30 2018-11-28 IMS Nanofabrication GmbH Kompensation von dosisinhomogenität mittels überlappender belichtungsorte
JP6892214B2 (ja) 2014-07-10 2021-06-23 アイエムエス ナノファブリケーション ゲーエムベーハー 畳み込みカーネルを使用する粒子ビーム描画機のカスタマイズ化
KR20160019809A (ko) * 2014-08-12 2016-02-22 현대모비스 주식회사 레이져 광학계와 이를 구비한 차량용 램프
US9568907B2 (en) 2014-09-05 2017-02-14 Ims Nanofabrication Ag Correction of short-range dislocations in a multi-beam writer
US9214314B1 (en) * 2015-03-10 2015-12-15 Varian Semiconductor Equipment Associates, Inc. Ion beam manipulator
US9653263B2 (en) 2015-03-17 2017-05-16 Ims Nanofabrication Ag Multi-beam writing of pattern areas of relaxed critical dimension
EP3096342B1 (de) 2015-03-18 2017-09-20 IMS Nanofabrication AG Bidirektionales mehrstrahliges schreiben mit doppeldurchgang
US10410831B2 (en) 2015-05-12 2019-09-10 Ims Nanofabrication Gmbh Multi-beam writing using inclined exposure stripes
NL2015170B1 (en) * 2015-07-15 2017-02-01 Suss Microtec Lithography Gmbh Spacer displacement device for a wafer illumination unit and wafer illumination unit.
CN106933060B (zh) * 2015-12-30 2018-10-16 上海微电子装备（集团）股份有限公司 一种棱镜旋转调节机构和光刻机曝光系统及光刻机
US10325756B2 (en) 2016-06-13 2019-06-18 Ims Nanofabrication Gmbh Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer
CN106291866A (zh) * 2016-09-30 2017-01-04 中国科学院长春光学精密机械与物理研究所 一种适合月基力学及温差的反射镜支撑机构
CN106291907B (zh) * 2016-09-30 2018-10-19 中国科学院长春光学精密机械与物理研究所 一种三自由度次镜调整装置
KR20180068228A (ko) 2016-12-13 2018-06-21 삼성전자주식회사 위치 조정 유닛 및 이를 포함하는 마스크리스 노광 장치
US10325757B2 (en) 2017-01-27 2019-06-18 Ims Nanofabrication Gmbh Advanced dose-level quantization of multibeam-writers
US10522329B2 (en) 2017-08-25 2019-12-31 Ims Nanofabrication Gmbh Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus
US11569064B2 (en) 2017-09-18 2023-01-31 Ims Nanofabrication Gmbh Method for irradiating a target using restricted placement grids
US10678018B2 (en) * 2017-10-23 2020-06-09 Magna Electronics Inc. Camera for vehicle vision system with replaceable lens
CN108214952B (zh) * 2017-12-27 2024-05-31 青岛高测科技股份有限公司 一种全自动分布式多晶硅开方方法
US10651010B2 (en) 2018-01-09 2020-05-12 Ims Nanofabrication Gmbh Non-linear dose- and blur-dependent edge placement correction
US10840054B2 (en) 2018-01-30 2020-11-17 Ims Nanofabrication Gmbh Charged-particle source and method for cleaning a charged-particle source using back-sputtering
RU2681668C1 (ru) * 2018-03-07 2019-03-12 Федеральное государственное бюджетное образовательное учреждение высшего образования "Оренбургский государственный университет" Устройство ввода излучения шаровых ламп в световод
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
US11099482B2 (en) 2019-05-03 2021-08-24 Ims Nanofabrication Gmbh Adapting the duration of exposure slots in multi-beam writers
DE102019207826A1 (de) * 2019-05-28 2020-12-03 Zf Friedrichshafen Ag Segmentierter Schwingungstilger
KR102919104B1 (ko) 2020-02-03 2026-01-29 아이엠에스 나노패브릭케이션 게엠베하 멀티―빔 라이터의 블러 변화 보정
KR102922552B1 (ko) 2020-04-24 2026-02-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
EP4095882A1 (de) 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Musterdatenverarbeitung für programmierbare direktschreibgeräte
US12154756B2 (en) 2021-08-12 2024-11-26 Ims Nanofabrication Gmbh Beam pattern device having beam absorber structure
DE102022214186A1 (de) * 2022-12-21 2024-06-27 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage
CN117816657A (zh) * 2024-02-06 2024-04-05 深圳市汇顶科技股份有限公司 镜头清洁装置及镜头装置

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4559717A (en) † 1984-02-21 1985-12-24 The United States Of America As Represented By The Secretary Of Commerce Flexure hinge
US4733945A (en) † 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US5428482A (en) † 1991-11-04 1995-06-27 General Signal Corporation Decoupled mount for optical element and stacked annuli assembly
US5383168A (en) * 1993-04-01 1995-01-17 Eastman Kodak Company Actively athermalized optical head assembly
US6341006B1 (en) † 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
US6312859B1 (en) † 1996-06-20 2001-11-06 Nikon Corporation Projection exposure method with corrections for image displacement
JPH1054932A (ja) † 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
JPH10270333A (ja) † 1997-03-27 1998-10-09 Nikon Corp 露光装置
JPH1114876A (ja) † 1997-06-19 1999-01-22 Nikon Corp 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置
JPH11274031A (ja) † 1998-03-20 1999-10-08 Canon Inc 露光装置およびデバイス製造方法ならびに位置決め装置
EP0964307A3 (de) * 1998-06-08 2001-09-05 Nikon Corporation Vorrichtung und Verfahren zur Projektionsbelichtung
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
US5986827A (en) † 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
DE19859634A1 (de) † 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
JP2000206389A (ja) * 1999-01-18 2000-07-28 Olympus Optical Co Ltd 光学系位置調整可能な鏡枠
DE19901295A1 (de) * 1999-01-15 2000-07-20 Zeiss Carl Fa Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element
DE19905779A1 (de) * 1999-02-12 2000-08-17 Zeiss Carl Fa Vorrichtung zum Kippen eines Gegenstandes um wenigstens eine Achse, insbesondere eines optischen Elementes
DE19908554A1 (de) † 1999-02-27 2000-08-31 Zeiss Carl Fa Verstellbare Baugruppe
DE19910947A1 (de) * 1999-03-12 2000-09-14 Zeiss Carl Fa Vorrichtung zum Verschieben eines optischen Elementes entlang der optischen Achse
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
JP2001035773A (ja) † 1999-07-19 2001-02-09 Nikon Corp 照明光学装置及び露光装置
US6239924B1 (en) * 1999-08-31 2001-05-29 Nikon Corporation Kinematic lens mounting with distributed support and radial flexure
KR100699241B1 (ko) † 1999-09-20 2007-03-27 가부시키가이샤 니콘 패럴렐 링크기구, 노광장치 및 그의 제조방법, 그리고디바이스 제조방법
US6257957B1 (en) * 1999-12-01 2001-07-10 Gerber Coburn Optical Inc. Tactile feedback system
JP4945845B2 (ja) † 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
CN1440512A (zh) † 2000-03-31 2003-09-03 株式会社尼康 固定光学元件的方法和装置、光学装置、曝光设备以及装置的制造方法
US6400516B1 (en) * 2000-08-10 2002-06-04 Nikon Corporation Kinematic optical mounting
JP4770090B2 (ja) * 2000-08-18 2011-09-07 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
EP1312965B1 (de) * 2000-08-18 2007-01-17 Nikon Corporation Haltevorrichtung für optisches Element
JP4945864B2 (ja) * 2000-08-18 2012-06-06 株式会社ニコン 保持装置、光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
JP4081813B2 (ja) † 2000-11-10 2008-04-30 株式会社ニコン 光学装置、露光装置、及びデバイス製造方法
JP2002305140A (ja) * 2001-04-06 2002-10-18 Nikon Corp 露光装置及び基板処理システム
US6674584B2 (en) * 2001-07-03 2004-01-06 Pts Corporation Optical surface-mount lens cell
JP2003029116A (ja) * 2001-07-13 2003-01-29 Canon Inc レンズ保持装置、およびレンズ保持装置を組み込んだ投影露光装置
US7035056B2 (en) * 2001-11-07 2006-04-25 Asml Netherlands B.V. Piezoelectric actuator and a lithographic apparatus and a device manufacturing method
TWI244119B (en) * 2001-11-07 2005-11-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US20030234916A1 (en) * 2002-06-21 2003-12-25 Nikon Corporation Soft supports to reduce deformation of vertically mounted lens or mirror
AU2003219097A1 (en) * 2003-03-26 2004-10-18 Carl Zeiss Smt Ag Device for the low-deformation replaceable mounting of an optical element
US7477842B2 (en) * 2004-03-12 2009-01-13 Siimpel, Inc. Miniature camera
US7604359B2 (en) * 2004-05-04 2009-10-20 Carl Zeiss Smt Ag High positioning reproducible low torque mirror-actuator interface

Also Published As

Publication number Publication date
US7764447B2 (en) 2010-07-27
US20060139775A1 (en) 2006-06-29
KR101281357B1 (ko) 2013-07-02
JP4665759B2 (ja) 2011-04-06
WO2004109357A1 (ja) 2004-12-16
KR20060021339A (ko) 2006-03-07
DE602004024302D1 (de) 2010-01-07
CN100576003C (zh) 2009-12-30
EP1632799A1 (de) 2006-03-08
JPWO2004109357A1 (ja) 2006-07-20
EP1632799A4 (de) 2006-07-05
US20070279768A1 (en) 2007-12-06
HK1084186A1 (en) 2006-07-21
CN1826547A (zh) 2006-08-30
EP1632799B1 (de) 2009-11-25
EP1632799B2 (de) 2013-11-20

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