ATE454601T1 - Umfangsdichtung zur rückseitenkühlung von substraten - Google Patents

Umfangsdichtung zur rückseitenkühlung von substraten

Info

Publication number
ATE454601T1
ATE454601T1 AT02752330T AT02752330T ATE454601T1 AT E454601 T1 ATE454601 T1 AT E454601T1 AT 02752330 T AT02752330 T AT 02752330T AT 02752330 T AT02752330 T AT 02752330T AT E454601 T1 ATE454601 T1 AT E454601T1
Authority
AT
Austria
Prior art keywords
seal
substrates
typically
back cooling
substrate
Prior art date
Application number
AT02752330T
Other languages
English (en)
Inventor
Mark Kenney
Original Assignee
Unaxis Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis Usa Inc filed Critical Unaxis Usa Inc
Application granted granted Critical
Publication of ATE454601T1 publication Critical patent/ATE454601T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0441—Apparatus for sealing, encapsulating, glassing, decapsulating or the like

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
AT02752330T 2001-07-30 2002-07-15 Umfangsdichtung zur rückseitenkühlung von substraten ATE454601T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30873401P 2001-07-30 2001-07-30
US10/163,567 US6771482B2 (en) 2001-07-30 2002-06-06 Perimeter seal for backside cooling of substrates
PCT/US2002/022359 WO2003012359A1 (en) 2001-07-30 2002-07-15 Perimeter seal for backside cooling of substrates

Publications (1)

Publication Number Publication Date
ATE454601T1 true ATE454601T1 (de) 2010-01-15

Family

ID=26859756

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02752330T ATE454601T1 (de) 2001-07-30 2002-07-15 Umfangsdichtung zur rückseitenkühlung von substraten

Country Status (6)

Country Link
US (1) US6771482B2 (de)
EP (1) EP1419357B1 (de)
AT (1) ATE454601T1 (de)
DE (1) DE60235018D1 (de)
TW (1) TW548761B (de)
WO (1) WO2003012359A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5408848B2 (ja) * 2007-07-11 2014-02-05 株式会社ジャパンディスプレイ 半導体装置の製造方法
JP5312923B2 (ja) * 2008-01-31 2013-10-09 大日本スクリーン製造株式会社 基板処理装置
US9859142B2 (en) 2011-10-20 2018-01-02 Lam Research Corporation Edge seal for lower electrode assembly
US9869392B2 (en) 2011-10-20 2018-01-16 Lam Research Corporation Edge seal for lower electrode assembly
US8844106B2 (en) * 2011-11-10 2014-09-30 Lam Research Corporation Installation fixture for elastomer bands and methods of using the same
US8677586B2 (en) 2012-04-04 2014-03-25 Lam Research Corporation Installation fixture for elastomer bands and methods of using the same
US9502279B2 (en) 2013-06-28 2016-11-22 Lam Research Corporation Installation fixture having a micro-grooved non-stick surface
US9583377B2 (en) 2013-12-17 2017-02-28 Lam Research Corporation Installation fixture for elastomer bands
US10090211B2 (en) 2013-12-26 2018-10-02 Lam Research Corporation Edge seal for lower electrode assembly
KR101926726B1 (ko) * 2018-06-28 2018-12-07 주식회사 기가레인 부산물 증착 문제가 개선된 립실 및 이를 포함하는 반도체 공정 장치
CN111347410B (zh) * 2018-12-20 2022-07-26 沈阳新松机器人自动化股份有限公司 一种多视觉融合目标引导机器人及方法
JP7308767B2 (ja) * 2020-01-08 2023-07-14 東京エレクトロン株式会社 載置台およびプラズマ処理装置
CN111804511B (zh) * 2020-06-30 2021-12-14 苏州良矢电子科技有限公司 一种点胶装置

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE24478E (en) * 1954-02-01 1958-05-27 Flexible gaskets
US3491789A (en) 1966-07-28 1970-01-27 Nupro Co Bellows valve
US3547401A (en) 1968-06-07 1970-12-15 Abbott Lab Foldable bellows valve
US3787023A (en) * 1971-08-05 1974-01-22 Nupro Co Bellows valve
US3739801A (en) 1971-12-06 1973-06-19 Rudolph H Low actuating pressure type valve structure
US3898163A (en) * 1974-02-11 1975-08-05 Lambert H Mott Tube seal joint and method therefor
US4166607A (en) 1976-10-14 1979-09-04 Hoke, Inc. Bellows seal valve
DE2749252C3 (de) 1977-11-03 1980-09-11 Danfoss A/S, Nordborg (Daenemark) Betätigungsvorrichtung für die Verstellung des Verschlußstücks eines Ventils
US4201366A (en) 1978-03-13 1980-05-06 Danko Oliver L Bellows valve
US4454893A (en) 1981-11-30 1984-06-19 Puritan-Bennett Corp. Low-noise diaphragm for use in exhalation valve
JPS602888A (ja) * 1983-06-18 1985-01-09 Seibu Giken:Kk 熱交換素子
US4699137A (en) 1983-11-25 1987-10-13 The Boc Group Exhalation valve
US4811575A (en) 1983-12-19 1989-03-14 Carrier Corporation Sound insulated bellows-type air terminal valve
US4603867A (en) 1984-04-02 1986-08-05 Motorola, Inc. Spinner chuck
US4634099A (en) 1985-05-17 1987-01-06 Nupro Company High pressure inverted bellows valve
US4615755A (en) 1985-08-07 1986-10-07 The Perkin-Elmer Corporation Wafer cooling and temperature control for a plasma etching system
US4687017A (en) 1986-04-28 1987-08-18 Nupro Company Inverted bellows valve
NL8701603A (nl) * 1987-07-08 1989-02-01 Philips & Du Pont Optical Vacuuminrichting voor het vastzuigen van werkstukken.
US4943686A (en) * 1988-04-18 1990-07-24 Andrzej Kucharek Seal frame and method of use
DE3935960C2 (de) * 1989-10-27 1994-06-23 Mtu Muenchen Gmbh Einrichtung zur abdichtenden Überbrückung eines Spaltes zwischen zwei in drei Raumrichtungen verschiebbaren Bauteilen
US4995589A (en) 1990-01-29 1991-02-26 Sequioa Controls Company, Ltd. Bellows valve
US5013400A (en) 1990-01-30 1991-05-07 General Signal Corporation Dry etch process for forming champagne profiles, and dry etch apparatus
JPH0756434B2 (ja) * 1990-03-06 1995-06-14 トランター インコーポレイテッド 板形熱交換器
US5292399A (en) 1990-04-19 1994-03-08 Applied Materials, Inc. Plasma etching apparatus with conductive means for inhibiting arcing
GB2246395A (en) 1990-07-26 1992-01-29 Garrett Automotive Limited Noise attenuation in a turbocharger
JPH04101441A (ja) 1990-08-21 1992-04-02 Fujitsu Ltd 分析装置
US5407433A (en) * 1993-02-10 1995-04-18 Origin Medsystems, Inc. Gas-tight seal accommodating surgical instruments with a wide range of diameters
US5326725A (en) 1993-03-11 1994-07-05 Applied Materials, Inc. Clamping ring and susceptor therefor
US5636098A (en) * 1994-01-06 1997-06-03 Applied Materials, Inc. Barrier seal for electrostatic chuck
US5421401A (en) * 1994-01-25 1995-06-06 Applied Materials, Inc. Compound clamp ring for semiconductor wafers
GB2287475A (en) * 1994-03-15 1995-09-20 Hoover Ltd Washing machine tub gasket
US6024630A (en) * 1995-06-09 2000-02-15 Applied Materials, Inc. Fluid-pressure regulated wafer polishing head
US5805408A (en) * 1995-12-22 1998-09-08 Lam Research Corporation Electrostatic clamp with lip seal for clamping substrates
JP2890249B2 (ja) * 1996-04-16 1999-05-10 オリオン機械株式会社 耐薬品性熱交換器
KR100237825B1 (ko) 1996-11-05 2000-01-15 윤종용 반도체장치 제조설비의 페디스탈
US5740009A (en) 1996-11-29 1998-04-14 Applied Materials, Inc. Apparatus for improving wafer and chuck edge protection
US5870271A (en) * 1997-02-19 1999-02-09 Applied Materials, Inc. Pressure actuated sealing diaphragm for chucks
US6073576A (en) 1997-11-25 2000-06-13 Cvc Products, Inc. Substrate edge seal and clamp for low-pressure processing equipment
US6279976B1 (en) * 1999-05-13 2001-08-28 Micron Technology, Inc. Wafer handling device having conforming perimeter seal
US6277198B1 (en) * 1999-06-04 2001-08-21 Applied Materials, Inc. Use of tapered shadow clamp ring to provide improved physical vapor deposition system
DE19949867C1 (de) * 1999-10-15 2001-09-27 Mol Gummiverarbeitung Dichtungsring für ein Wellrohr

Also Published As

Publication number Publication date
US20030021077A1 (en) 2003-01-30
US6771482B2 (en) 2004-08-03
EP1419357B1 (de) 2010-01-06
TW548761B (en) 2003-08-21
WO2003012359A1 (en) 2003-02-13
DE60235018D1 (de) 2010-02-25
EP1419357A4 (de) 2006-03-15
EP1419357A1 (de) 2004-05-19

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties