ATE459734T1 - Kathodenverdampfungsmaschine - Google Patents

Kathodenverdampfungsmaschine

Info

Publication number
ATE459734T1
ATE459734T1 AT05826678T AT05826678T ATE459734T1 AT E459734 T1 ATE459734 T1 AT E459734T1 AT 05826678 T AT05826678 T AT 05826678T AT 05826678 T AT05826678 T AT 05826678T AT E459734 T1 ATE459734 T1 AT E459734T1
Authority
AT
Austria
Prior art keywords
evaporation machine
cathode
cathode evaporation
cathode element
end surface
Prior art date
Application number
AT05826678T
Other languages
English (en)
Inventor
Larrinaga Josu Goikoetxea
Original Assignee
Fundacion Tekniker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fundacion Tekniker filed Critical Fundacion Tekniker
Application granted granted Critical
Publication of ATE459734T1 publication Critical patent/ATE459734T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Soil Working Implements (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
AT05826678T 2005-12-16 2005-12-16 Kathodenverdampfungsmaschine ATE459734T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/ES2005/000687 WO2007068768A1 (es) 2005-12-16 2005-12-16 Máquina de evaporación catódica

Publications (1)

Publication Number Publication Date
ATE459734T1 true ATE459734T1 (de) 2010-03-15

Family

ID=38162586

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05826678T ATE459734T1 (de) 2005-12-16 2005-12-16 Kathodenverdampfungsmaschine

Country Status (7)

Country Link
US (1) US20090050059A1 (de)
EP (1) EP1970464B1 (de)
CN (1) CN101370957B (de)
AT (1) ATE459734T1 (de)
DE (1) DE602005019800D1 (de)
ES (1) ES2342835T3 (de)
WO (1) WO2007068768A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009008161A1 (de) * 2009-02-09 2010-08-12 Oerlikon Trading Ag, Trübbach Modifizierbare Magnetkonfiguration für Arc-Verdampfungsquellen
JP5649308B2 (ja) * 2009-04-28 2015-01-07 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
PL2585622T3 (pl) * 2010-06-22 2018-07-31 Oerlikon Surface Solutions Ag, Pfäffikon Źródło odparowania łukowego o określonym polu elektrycznym
EP2607517A1 (de) * 2011-12-22 2013-06-26 Oerlikon Trading AG, Trübbach Niedertemperatur-Lichtbogenionen-Plattierbeschichtung
JP5946337B2 (ja) * 2012-06-20 2016-07-06 株式会社神戸製鋼所 アーク式蒸発源
CN103074580B (zh) * 2012-12-25 2015-08-26 王奉瑾 采用电磁加热的物理气相沉积设备
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
CN110268502B (zh) * 2017-02-14 2021-08-24 欧瑞康表面处理解决方案股份公司普费菲孔 具有预定阴极材料蚀除的阴极电弧蒸发
MX2020004821A (es) * 2017-10-03 2020-08-13 Oerlikon Surface Solutions Ag Pfaeffikon Fuente de arco con campo magnetico confinado.
CN114481046A (zh) * 2022-01-26 2022-05-13 纳狮新材料有限公司 电弧蒸发装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4673477A (en) 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3624150C2 (de) * 1986-07-17 1994-02-24 Leybold Ag Zerstäubungskatode nach dem Magnetronprinzip
DE4017111C2 (de) * 1990-05-28 1998-01-29 Hauzer Holding Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
DE3800449A1 (de) * 1988-01-09 1989-07-20 Leybold Ag Verfahren und einrichtung zur herstellung magnetooptischer, speicher- und loeschfaehiger datentraeger
DE4009151A1 (de) * 1990-03-22 1991-09-26 Leybold Ag Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
DE4329155A1 (de) 1993-08-30 1995-03-02 Bloesch W Ag Magnetfeldkathode
CA2256847A1 (en) * 1998-12-22 2000-06-22 Munther Kandah Particle-free cathodic arc carbon ion source
DE10010448C1 (de) * 2000-03-03 2002-04-25 Multi Media Machinery Gmbh Kathode
JP4679004B2 (ja) * 2000-09-26 2011-04-27 新明和工業株式会社 アーク蒸発源装置、その駆動方法、及びイオンプレーティング装置
CN100355933C (zh) * 2001-03-27 2007-12-19 特克尼克基业 具有用于较大表面积的靶的强力磁引导装置的电弧蒸发器
DE10127013A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Lichtbogen-Verdampfungsvorrichtung

Also Published As

Publication number Publication date
DE602005019800D1 (de) 2010-04-15
ES2342835T3 (es) 2010-07-15
US20090050059A1 (en) 2009-02-26
WO2007068768A1 (es) 2007-06-21
HK1129430A1 (en) 2009-11-27
CN101370957A (zh) 2009-02-18
EP1970464A1 (de) 2008-09-17
CN101370957B (zh) 2011-01-26
EP1970464B1 (de) 2010-03-03

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Legal Events

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