ATE465434T1 - Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie - Google Patents

Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Info

Publication number
ATE465434T1
ATE465434T1 AT01902387T AT01902387T ATE465434T1 AT E465434 T1 ATE465434 T1 AT E465434T1 AT 01902387 T AT01902387 T AT 01902387T AT 01902387 T AT01902387 T AT 01902387T AT E465434 T1 ATE465434 T1 AT E465434T1
Authority
AT
Austria
Prior art keywords
radiation
liquid
stereolithography
cured composition
free
Prior art date
Application number
AT01902387T
Other languages
English (en)
Inventor
David Johnson
Richard Leyden
Ranjana Patel
Original Assignee
Huntsman Adv Mat Switzerland
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huntsman Adv Mat Switzerland filed Critical Huntsman Adv Mat Switzerland
Application granted granted Critical
Publication of ATE465434T1 publication Critical patent/ATE465434T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyethers (AREA)
AT01902387T 2000-02-08 2001-02-02 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie ATE465434T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18105200P 2000-02-08 2000-02-08
PCT/EP2001/001115 WO2001059524A1 (en) 2000-02-08 2001-02-02 Liquid, radiation-curable composition, especially for stereolithography

Publications (1)

Publication Number Publication Date
ATE465434T1 true ATE465434T1 (de) 2010-05-15

Family

ID=22662702

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01902387T ATE465434T1 (de) 2000-02-08 2001-02-02 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Country Status (12)

Country Link
US (2) US20010046642A1 (de)
EP (1) EP1256032B1 (de)
JP (1) JP2003522821A (de)
KR (1) KR100808954B1 (de)
CN (1) CN1422394B (de)
AT (1) ATE465434T1 (de)
AU (1) AU3023301A (de)
CA (1) CA2398160A1 (de)
DE (1) DE60141886D1 (de)
ES (1) ES2345031T3 (de)
TW (1) TWI298114B (de)
WO (1) WO2001059524A1 (de)

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US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
JP2005534063A (ja) * 2002-07-19 2005-11-10 ザ リージェンツ オブ ザ ユニバーシティ オブ コロラド， ア ボディー コーポレイト ３ｄ光重合デバイスの製造
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
EP1680712B1 (de) 2003-11-06 2016-01-20 3D Systems, Inc. Lichtaushärtbare zusammensetzung zur herstellung ausgehärteter artikel mit hoher klarheit und verbesserten mechanischen eigenschaften
PL1727663T3 (pl) * 2004-03-22 2012-04-30 Huntsman Adv Mat Switzerland Kompozycje fotoutwardzalne
GB2423521A (en) * 2005-02-25 2006-08-30 Sun Chemical Ltd Energy-curable coating composition
WO2007031505A1 (en) * 2005-09-13 2007-03-22 Huntsman Advanced Materials (Switzerland) Gmbh Photocurable compositions for preparing abs-like articles
AU2006326864A1 (en) * 2005-12-21 2007-06-28 Carl Zeiss Vision Australia Holdings Limited Coatings for optical elements
US9676899B2 (en) * 2006-05-01 2017-06-13 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
EP2790897A4 (de) * 2011-12-24 2015-08-12 Zydex Pty Ltd Verfahren und vorrichtung zur herstellung eines objekts
TWI561132B (en) * 2013-11-01 2016-12-01 Ind Tech Res Inst Method for forming metal circuit, liquid trigger material for forming metal circuit and metal circuit structure
KR101551255B1 (ko) 2013-12-30 2015-09-09 전자부품연구원 3d 프린팅용 저점도 세라믹 슬러리 조성물
CN104311461B (zh) * 2014-09-28 2017-04-12 上海维凯光电新材料有限公司 乙氧化(2)双酚s二丙烯酸酯及其制备方法
JP7069006B2 (ja) * 2015-09-04 2022-05-17 カーボン，インコーポレイテッド 積層造形用シアネートエステル二重硬化樹脂
JP7068270B2 (ja) * 2017-03-06 2022-05-16 マクセル株式会社 モデル材インクセット、サポート材組成物、インクセット、立体造形物および立体造形物の製造方法
ES2685280B2 (es) * 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
TWI835726B (zh) * 2017-04-12 2024-03-21 日商住友化學股份有限公司 硬化性樹脂組成物以及硬化膜
US11633908B2 (en) * 2018-03-02 2023-04-25 Formlabs, Inc. Latent cure resins and related methods
JP7776427B2 (ja) * 2020-02-18 2025-11-26 ローワン・ユニバーシティ 逐次硬化相互侵入ポリマーによる付加製造高ガラス転移温度材料の網目構造強靭化
US12325182B2 (en) 2020-10-13 2025-06-10 Cabot Corporation Conductive photo-curable compositions for additive manufacturing
KR102920961B1 (ko) 2023-06-30 2026-02-02 국립목포대학교산학협력단 디지털 라이트 프로세싱 3d 프린터용 슬러리 조성물 및 이를 이용한 지르코니아 소결체 제조방법

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US4156035A (en) * 1978-05-09 1979-05-22 W. R. Grace & Co. Photocurable epoxy-acrylate compositions
US4654379A (en) * 1985-12-05 1987-03-31 Allied Corporation Semi-interpenetrating polymer networks
US4657779A (en) * 1986-03-19 1987-04-14 Desoto, Inc. Shrinkage-resistant ultraviolet-curing coatings
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
JPH03166219A (ja) * 1989-11-24 1991-07-18 Yokohama Rubber Co Ltd:The 紫外線硬化型樹脂組成物
US5147727A (en) * 1990-02-06 1992-09-15 Isp Investments Inc. Aryloxy polyvinyl ethers
TW269017B (de) * 1992-12-21 1996-01-21 Ciba Geigy Ag
ES2147777T3 (es) * 1993-09-16 2000-10-01 Ciba Sc Holding Ag Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.
AU684891B2 (en) * 1994-03-17 1998-01-08 Toppan Printing Co. Ltd. Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium
US5942554A (en) * 1996-02-20 1999-08-24 Spectra Group Limited, Inc. Method for forming highly colored polymeric bodies
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
JP3743088B2 (ja) * 1996-12-02 2006-02-08 東洋インキ製造株式会社 光造形用組成物
JP2001527590A (ja) * 1997-02-18 2001-12-25 アライド シグナル インコーポレイテッド ステレオリソグラフィのための耐熱性ポリマー
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6350792B1 (en) * 2000-07-13 2002-02-26 Suncolor Corporation Radiation-curable compositions and cured articles

Also Published As

Publication number Publication date
US20050228064A1 (en) 2005-10-13
DE60141886D1 (de) 2010-06-02
JP2003522821A (ja) 2003-07-29
CN1422394A (zh) 2003-06-04
KR100808954B1 (ko) 2008-03-04
ES2345031T3 (es) 2010-09-14
KR20030031884A (ko) 2003-04-23
EP1256032B1 (de) 2010-04-21
EP1256032A1 (de) 2002-11-13
WO2001059524A1 (en) 2001-08-16
CA2398160A1 (en) 2001-08-16
AU3023301A (en) 2001-08-20
US20010046642A1 (en) 2001-11-29
CN1422394B (zh) 2012-08-22
TWI298114B (en) 2008-06-21

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