ATE467909T1 - Solarzelle und herstellungsverfahren - Google Patents
Solarzelle und herstellungsverfahrenInfo
- Publication number
- ATE467909T1 ATE467909T1 AT05703486T AT05703486T ATE467909T1 AT E467909 T1 ATE467909 T1 AT E467909T1 AT 05703486 T AT05703486 T AT 05703486T AT 05703486 T AT05703486 T AT 05703486T AT E467909 T1 ATE467909 T1 AT E467909T1
- Authority
- AT
- Austria
- Prior art keywords
- type
- compound semiconductor
- semiconductor layer
- conductive film
- apertures
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/167—Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/251—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising zinc oxide [ZnO]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004005768 | 2004-01-13 | ||
| PCT/JP2005/000247 WO2005069386A1 (ja) | 2004-01-13 | 2005-01-12 | 太陽電池とその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE467909T1 true ATE467909T1 (de) | 2010-05-15 |
Family
ID=34792113
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05703486T ATE467909T1 (de) | 2004-01-13 | 2005-01-12 | Solarzelle und herstellungsverfahren |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7557294B2 (de) |
| EP (1) | EP1705717B1 (de) |
| JP (1) | JP4098330B2 (de) |
| CN (1) | CN100459174C (de) |
| AT (1) | ATE467909T1 (de) |
| DE (1) | DE602005021200D1 (de) |
| WO (1) | WO2005069386A1 (de) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080290875A1 (en) * | 1996-11-04 | 2008-11-27 | Park Larry A | Seismic activity detector |
| CN100380596C (zh) | 2003-04-25 | 2008-04-09 | 株式会社半导体能源研究所 | 液滴排出装置、图案的形成方法及半导体装置的制造方法 |
| US7462514B2 (en) * | 2004-03-03 | 2008-12-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television |
| US20050196710A1 (en) * | 2004-03-04 | 2005-09-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television apparatus |
| US8158517B2 (en) | 2004-06-28 | 2012-04-17 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing wiring substrate, thin film transistor, display device and television device |
| TWI399861B (zh) * | 2007-12-06 | 2013-06-21 | Chung Shan Inst Of Science | Structure of solar cell absorbent layer and manufacturing method thereof |
| TWI374859B (en) | 2008-05-28 | 2012-10-21 | Ind Tech Res Inst | Photo energy transformation catalysts and methods for fabricating the same |
| JP5287380B2 (ja) * | 2009-03-13 | 2013-09-11 | Tdk株式会社 | 太陽電池、及び太陽電池の製造方法 |
| WO2011008254A1 (en) * | 2009-07-13 | 2011-01-20 | First Solar, Inc. | Solar cell front contact doping |
| JP2011176283A (ja) * | 2010-01-29 | 2011-09-08 | Fujifilm Corp | 光電変換素子の製造方法 |
| WO2011136249A1 (ja) * | 2010-04-27 | 2011-11-03 | 京セラ株式会社 | 光電変換素子および光電変換装置ならびに光電変換素子の製造方法 |
| JP5421890B2 (ja) * | 2010-11-09 | 2014-02-19 | 富士フイルム株式会社 | 光電変換素子の製造方法 |
| KR101349484B1 (ko) * | 2011-11-29 | 2014-01-10 | 엘지이노텍 주식회사 | 태양전지 모듈 및 이의 제조방법 |
| JP6076615B2 (ja) * | 2012-04-27 | 2017-02-08 | 東京エレクトロン株式会社 | 不純物拡散方法、基板処理装置及び半導体装置の製造方法 |
| US20140042407A1 (en) * | 2012-08-08 | 2014-02-13 | Vanderbilt University | Biohybrid photoelectrochemical energy conversion device |
| CN104781211B (zh) * | 2012-11-19 | 2017-04-19 | 东曹株式会社 | 氧化物烧结体、使用其的溅射靶及氧化物膜 |
| JP6004460B2 (ja) * | 2013-03-26 | 2016-10-05 | キヤノンアネルバ株式会社 | 太陽電池の製造方法、および太陽電池 |
| KR102042657B1 (ko) * | 2013-08-22 | 2019-11-28 | 재단법인대구경북과학기술원 | 박막 태양전지 및 이의 제조방법 |
| KR20150142094A (ko) * | 2014-06-10 | 2015-12-22 | 에스케이이노베이션 주식회사 | 원자층 증착법으로 형성된 버퍼층을 포함하는 태양전지 및 이의 제조방법 |
| EP3704745B1 (de) * | 2017-11-16 | 2021-02-24 | First Solar, Inc | Schichtstrukturen für photovoltaische vorrichtungen und photovoltaische vorrichtungen damit |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0697481A (ja) | 1992-09-14 | 1994-04-08 | Matsushita Electric Ind Co Ltd | ホモ接合半導体装置とそれを用いた光電変換半導体装置の製造方法 |
| JPH07302926A (ja) * | 1994-04-30 | 1995-11-14 | Canon Inc | 太陽電池モジュール |
| JP2922466B2 (ja) | 1996-08-29 | 1999-07-26 | 時夫 中田 | 薄膜太陽電池 |
| DE69734183T8 (de) * | 1996-10-15 | 2007-03-29 | Matsushita Electric Industrial Co., Ltd., Kadoma | Sonnenzelle und Herstellungsverfahren |
| JP3646953B2 (ja) | 1996-10-15 | 2005-05-11 | 松下電器産業株式会社 | 太陽電池 |
| JP3249407B2 (ja) * | 1996-10-25 | 2002-01-21 | 昭和シェル石油株式会社 | カルコパイライト系多元化合物半導体薄膜光吸収層からなる薄膜太陽電池 |
| JP3527815B2 (ja) * | 1996-11-08 | 2004-05-17 | 昭和シェル石油株式会社 | 薄膜太陽電池の透明導電膜の製造方法 |
| US5948176A (en) | 1997-09-29 | 1999-09-07 | Midwest Research Institute | Cadmium-free junction fabrication process for CuInSe2 thin film solar cells |
| US6259016B1 (en) | 1999-03-05 | 2001-07-10 | Matsushita Electric Industrial Co., Ltd. | Solar cell |
| JP3434259B2 (ja) | 1999-03-05 | 2003-08-04 | 松下電器産業株式会社 | 太陽電池 |
| JP4549570B2 (ja) * | 2001-05-15 | 2010-09-22 | 昭和シェル石油株式会社 | ヘテロ接合薄膜太陽電池の製造方法 |
-
2005
- 2005-01-12 AT AT05703486T patent/ATE467909T1/de not_active IP Right Cessation
- 2005-01-12 CN CNB2005800008040A patent/CN100459174C/zh not_active Expired - Fee Related
- 2005-01-12 EP EP05703486A patent/EP1705717B1/de not_active Expired - Lifetime
- 2005-01-12 DE DE602005021200T patent/DE602005021200D1/de not_active Expired - Lifetime
- 2005-01-12 US US10/564,116 patent/US7557294B2/en active Active
- 2005-01-12 JP JP2005517041A patent/JP4098330B2/ja not_active Expired - Fee Related
- 2005-01-12 WO PCT/JP2005/000247 patent/WO2005069386A1/ja not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2005069386A1 (ja) | 2007-12-27 |
| CN100459174C (zh) | 2009-02-04 |
| US7557294B2 (en) | 2009-07-07 |
| CN1842920A (zh) | 2006-10-04 |
| EP1705717B1 (de) | 2010-05-12 |
| US20070295396A1 (en) | 2007-12-27 |
| EP1705717A1 (de) | 2006-09-27 |
| WO2005069386A1 (ja) | 2005-07-28 |
| JP4098330B2 (ja) | 2008-06-11 |
| EP1705717A4 (de) | 2009-04-08 |
| DE602005021200D1 (de) | 2010-06-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |