ATE470236T1 - Poliermittel und polierverfahren - Google Patents

Poliermittel und polierverfahren

Info

Publication number
ATE470236T1
ATE470236T1 AT07020898T AT07020898T ATE470236T1 AT E470236 T1 ATE470236 T1 AT E470236T1 AT 07020898 T AT07020898 T AT 07020898T AT 07020898 T AT07020898 T AT 07020898T AT E470236 T1 ATE470236 T1 AT E470236T1
Authority
AT
Austria
Prior art keywords
compounds
skeleton
polishing
group
agents
Prior art date
Application number
AT07020898T
Other languages
English (en)
Inventor
Yasushi Kurata
Katsuyuki Masuda
Hiroshi Ono
Yasuo Kamigata
Kazuhiro Enomoto
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of ATE470236T1 publication Critical patent/ATE470236T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/0056—Control means for lapping machines or devices taking regard of the pH-value of lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/04—Heavy metals
    • C23F3/06—Heavy metals with acidic solutions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Disintegrating Or Milling (AREA)
  • ing And Chemical Polishing (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AT07020898T 2002-04-30 2003-04-28 Poliermittel und polierverfahren ATE470236T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002128644 2002-04-30
JP2002160159 2002-05-31

Publications (1)

Publication Number Publication Date
ATE470236T1 true ATE470236T1 (de) 2010-06-15

Family

ID=29405301

Family Applications (2)

Application Number Title Priority Date Filing Date
AT07020898T ATE470236T1 (de) 2002-04-30 2003-04-28 Poliermittel und polierverfahren
AT03719239T ATE403936T1 (de) 2002-04-30 2003-04-28 Polierfluid und polierverfahren

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT03719239T ATE403936T1 (de) 2002-04-30 2003-04-28 Polierfluid und polierverfahren

Country Status (10)

Country Link
US (3) US7367870B2 (de)
EP (2) EP1881524B1 (de)
JP (2) JP4449745B2 (de)
KR (1) KR100720985B1 (de)
CN (2) CN100336179C (de)
AT (2) ATE470236T1 (de)
AU (1) AU2003235964A1 (de)
DE (2) DE60332881D1 (de)
TW (1) TWI303660B (de)
WO (1) WO2003094216A1 (de)

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ATE403936T1 (de) 2008-08-15
US7367870B2 (en) 2008-05-06
EP1505639A1 (de) 2005-02-09
JPWO2003094216A1 (ja) 2005-09-08
CN100336179C (zh) 2007-09-05
EP1505639B1 (de) 2008-08-06
EP1881524A1 (de) 2008-01-23
US20070295934A1 (en) 2007-12-27
JP2008263215A (ja) 2008-10-30
AU2003235964A1 (en) 2003-11-17
KR20050006203A (ko) 2005-01-15
CN101037585A (zh) 2007-09-19
US20050181609A1 (en) 2005-08-18
JP4853494B2 (ja) 2012-01-11
WO2003094216A1 (en) 2003-11-13
KR100720985B1 (ko) 2007-05-22
EP1505639A4 (de) 2007-05-09
DE60322695D1 (de) 2008-09-18
DE60332881D1 (de) 2010-07-15
US8696929B2 (en) 2014-04-15
US20080003924A1 (en) 2008-01-03
TW200307032A (en) 2003-12-01
EP1881524B1 (de) 2010-06-02
CN101037585B (zh) 2010-05-26
JP4449745B2 (ja) 2010-04-14
CN1650403A (zh) 2005-08-03

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