ATE471537T1 - Nichtwässrige mikroelektronische reinigungszusammensetzungen mit fructose - Google Patents

Nichtwässrige mikroelektronische reinigungszusammensetzungen mit fructose

Info

Publication number
ATE471537T1
ATE471537T1 AT05712754T AT05712754T ATE471537T1 AT E471537 T1 ATE471537 T1 AT E471537T1 AT 05712754 T AT05712754 T AT 05712754T AT 05712754 T AT05712754 T AT 05712754T AT E471537 T1 ATE471537 T1 AT E471537T1
Authority
AT
Austria
Prior art keywords
aqueous
compositions containing
cleaning compositions
containing fructose
microelectronic cleaning
Prior art date
Application number
AT05712754T
Other languages
English (en)
Inventor
Seiji Inaoka
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Application granted granted Critical
Publication of ATE471537T1 publication Critical patent/ATE471537T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/0005—Other compounding ingredients characterised by their effect
    • C11D3/0073—Anticorrosion compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C11D3/2065—Polyhydric alcohols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2096—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
AT05712754T 2004-07-15 2005-02-01 Nichtwässrige mikroelektronische reinigungszusammensetzungen mit fructose ATE471537T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58824804P 2004-07-15 2004-07-15
PCT/US2005/003422 WO2006019402A1 (en) 2004-07-15 2005-02-01 Non-aqueous microelectronic cleaning compositions containing fructose

Publications (1)

Publication Number Publication Date
ATE471537T1 true ATE471537T1 (de) 2010-07-15

Family

ID=34960702

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05712754T ATE471537T1 (de) 2004-07-15 2005-02-01 Nichtwässrige mikroelektronische reinigungszusammensetzungen mit fructose

Country Status (19)

Country Link
US (1) US7825078B2 (de)
EP (1) EP1787168B1 (de)
JP (1) JP4272676B2 (de)
KR (1) KR100642185B1 (de)
CN (1) CN1985217B (de)
AT (1) ATE471537T1 (de)
BR (1) BRPI0513315A (de)
CA (1) CA2573788A1 (de)
DE (1) DE602005021890D1 (de)
DK (1) DK1787168T3 (de)
ES (1) ES2345616T3 (de)
IL (1) IL180532A (de)
MY (1) MY140032A (de)
NO (1) NO20070835L (de)
PL (1) PL1787168T3 (de)
PT (1) PT1787168E (de)
TW (1) TW200613544A (de)
WO (1) WO2006019402A1 (de)
ZA (1) ZA200610563B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060064441A (ko) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 비수성 비부식성 마이크로전자 세정 조성물
KR101088568B1 (ko) * 2005-04-19 2011-12-05 아반토르 퍼포먼스 머티리얼스, 인크. 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼
KR100829376B1 (ko) * 2006-12-20 2008-05-13 동부일렉트로닉스 주식회사 반도체 소자의 세정방법
JP2009008768A (ja) * 2007-06-26 2009-01-15 Kobe Steel Ltd 表示装置の製造方法
TW200925800A (en) * 2007-12-06 2009-06-16 Mallinckrodt Baker Inc Fluoride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
KR101579846B1 (ko) * 2008-12-24 2015-12-24 주식회사 이엔에프테크놀로지 포토레지스트 패턴 제거용 조성물 및 이를 이용한 금속 패턴의 형성 방법
KR101831452B1 (ko) * 2009-02-25 2018-02-22 아반토 퍼포먼스 머티리얼즈, 엘엘씨 다목적 산성, 유기 용매 기반의 마이크로전자 세정 조성물
KR101089211B1 (ko) * 2010-12-02 2011-12-02 엘티씨 (주) 1차 알칸올 아민을 포함하는 ｌｃｄ 제조용 포토레지스트 박리액 조성물
US9327966B2 (en) * 2011-06-01 2016-05-03 Avantor Performance Materials, Inc. Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics
SG11201400840UA (en) 2011-10-05 2014-04-28 Avantor Performance Mat Inc Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
JP6144468B2 (ja) * 2012-08-22 2017-06-07 富士フイルム株式会社 レジスト剥離方法および半導体基板製品の製造方法
CN103937627B (zh) * 2014-03-28 2017-10-10 张海鹏 一种用于贴片电容的清洗剂
US20230091893A1 (en) * 2020-09-22 2023-03-23 Lg Chem, Ltd. Stripper composition for removing photoresist and stripping method of photoresist using the same
US20240288774A1 (en) * 2021-07-08 2024-08-29 Samsung Sdi Co., Ltd. Composition for removing edge bead of metal-containing resist and method for forming pattern comprising step of removing edge bead by using same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6326130B1 (en) * 1993-10-07 2001-12-04 Mallinckrodt Baker, Inc. Photoresist strippers containing reducing agents to reduce metal corrosion
US5567574A (en) * 1995-01-10 1996-10-22 Mitsubishi Gas Chemical Company, Inc. Removing agent composition for photoresist and method of removing
US6440326B1 (en) * 1998-08-13 2002-08-27 Mitsubishi Gas Chemical Company, Inc. Photoresist removing composition
KR100286860B1 (ko) * 1998-12-31 2001-07-12 주식회사 동진쎄미켐 포토레지스트 리무버 조성물
JP4224651B2 (ja) * 1999-02-25 2009-02-18 三菱瓦斯化学株式会社 レジスト剥離剤およびそれを用いた半導体素子の製造方法
CN100403169C (zh) * 2001-07-13 2008-07-16 Ekc技术公司 亚砜吡咯烷酮链烷醇胺剥离和清洗组合物
JP4252758B2 (ja) 2002-03-22 2009-04-08 関東化学株式会社 フォトレジスト残渣除去液組成物

Also Published As

Publication number Publication date
ZA200610563B (en) 2008-07-30
CA2573788A1 (en) 2006-02-23
PT1787168E (pt) 2010-07-16
JP4272676B2 (ja) 2009-06-03
WO2006019402A1 (en) 2006-02-23
TW200613544A (en) 2006-05-01
DE602005021890D1 (de) 2010-07-29
CN1985217A (zh) 2007-06-20
IL180532A (en) 2012-03-29
KR20060043033A (ko) 2006-05-15
MY140032A (en) 2009-11-30
EP1787168A1 (de) 2007-05-23
CN1985217B (zh) 2011-10-12
KR100642185B1 (ko) 2006-11-10
PL1787168T3 (pl) 2010-11-30
DK1787168T3 (da) 2010-08-09
BRPI0513315A (pt) 2008-05-06
NO20070835L (no) 2007-04-10
EP1787168B1 (de) 2010-06-16
IL180532A0 (en) 2007-06-03
JP2007511784A (ja) 2007-05-10
US7825078B2 (en) 2010-11-02
ES2345616T3 (es) 2010-09-28
US20080287333A1 (en) 2008-11-20

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