NO20070835L - Vannfrie, mikroelektroniske rensesammensetninger inneholdende fruktose - Google Patents

Vannfrie, mikroelektroniske rensesammensetninger inneholdende fruktose

Info

Publication number: NO20070835L
Authority: NO; Norway
Prior art keywords: microelectronic; anhydrous; compositions containing; cleansing compositions; containing fructose
Prior art date: 2004-07-15

Application number

NO20070835A

Other languages

English (en)

Norwegian (no)

Inventor

Seiji Inaoka

Original Assignee

Mallinckrodt Baker Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2004-07-15

Filing date

2007-02-13

Publication date

2007-04-10

2007-02-13 Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc

2007-04-10 Publication of NO20070835L publication Critical patent/NO20070835L/no

Links

239000000203 mixture Substances 0.000 title abstract 4
RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 title abstract 2
229930091371 Fructose Natural products 0.000 title abstract 2
239000005715 Fructose Substances 0.000 title abstract 2
238000004377 microelectronic Methods 0.000 title 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
229910052782 aluminium Inorganic materials 0.000 abstract 1
150000001412 amines Chemical class 0.000 abstract 1
229910052802 copper Inorganic materials 0.000 abstract 1
239000010949 copper Substances 0.000 abstract 1
230000007797 corrosion Effects 0.000 abstract 1
238000005260 corrosion Methods 0.000 abstract 1
239000003112 inhibitor Substances 0.000 abstract 1
230000009972 noncorrosive effect Effects 0.000 abstract 1
239000003960 organic solvent Substances 0.000 abstract 1
229920002120 photoresistant polymer Polymers 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2065—Polyhydric alcohols
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2096—Heterocyclic compounds
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

Chemical & Material Sciences (AREA)
General Physics & Mathematics (AREA)
Physics & Mathematics (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Wood Science & Technology (AREA)
Life Sciences & Earth Sciences (AREA)
Health & Medical Sciences (AREA)
Emergency Medicine (AREA)
Detergent Compositions (AREA)
Cleaning Or Drying Semiconductors (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

NO20070835A 2004-07-15 2007-02-13 Vannfrie, mikroelektroniske rensesammensetninger inneholdende fruktose NO20070835L (no)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US58824804P	2004-07-15	2004-07-15
PCT/US2005/003422 WO2006019402A1 (en)	2004-07-15	2005-02-01	Non-aqueous microelectronic cleaning compositions containing fructose

Publications (1)

Publication Number	Publication Date
NO20070835L true NO20070835L (no)	2007-04-10

Family

ID=34960702

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO20070835A NO20070835L (no)	2004-07-15	2007-02-13	Vannfrie, mikroelektroniske rensesammensetninger inneholdende fruktose

Country Status (19)

Country	Link
US (1)	US7825078B2 (de)
EP (1)	EP1787168B1 (de)
JP (1)	JP4272676B2 (de)
KR (1)	KR100642185B1 (de)
CN (1)	CN1985217B (de)
AT (1)	ATE471537T1 (de)
BR (1)	BRPI0513315A (de)
CA (1)	CA2573788A1 (de)
DE (1)	DE602005021890D1 (de)
DK (1)	DK1787168T3 (de)
ES (1)	ES2345616T3 (de)
IL (1)	IL180532A (de)
MY (1)	MY140032A (de)
NO (1)	NO20070835L (de)
PL (1)	PL1787168T3 (de)
PT (1)	PT1787168E (de)
TW (1)	TW200613544A (de)
WO (1)	WO2006019402A1 (de)
ZA (1)	ZA200610563B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR20060064441A (ko) *	2004-12-08	2006-06-13	말린크로트 베이커, 인코포레이티드	비수성 비부식성 마이크로전자 세정 조성물
KR101088568B1 (ko) *	2005-04-19	2011-12-05	아반토르 퍼포먼스 머티리얼스, 인크.	갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼
KR100829376B1 (ko) *	2006-12-20	2008-05-13	동부일렉트로닉스 주식회사	반도체 소자의 세정방법
JP2009008768A (ja) *	2007-06-26	2009-01-15	Kobe Steel Ltd	表示装置の製造方法
TW200925800A (en) *	2007-12-06	2009-06-16	Mallinckrodt Baker Inc	Fluoride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
KR101579846B1 (ko) *	2008-12-24	2015-12-24	주식회사 이엔에프테크놀로지	포토레지스트 패턴 제거용 조성물 및 이를 이용한 금속 패턴의 형성 방법
KR101831452B1 (ko) *	2009-02-25	2018-02-22	아반토 퍼포먼스 머티리얼즈, 엘엘씨	다목적 산성, 유기 용매 기반의 마이크로전자 세정 조성물
KR101089211B1 (ko) *	2010-12-02	2011-12-02	엘티씨 (주)	1차 알칸올 아민을 포함하는 ｌｃｄ 제조용 포토레지스트 박리액 조성물
US9327966B2 (en) *	2011-06-01	2016-05-03	Avantor Performance Materials, Inc.	Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics
SG11201400840UA (en)	2011-10-05	2014-04-28	Avantor Performance Mat Inc	Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
JP6144468B2 (ja) *	2012-08-22	2017-06-07	富士フイルム株式会社	レジスト剥離方法および半導体基板製品の製造方法
CN103937627B (zh) *	2014-03-28	2017-10-10	张海鹏	一种用于贴片电容的清洗剂
US20230091893A1 (en) *	2020-09-22	2023-03-23	Lg Chem, Ltd.	Stripper composition for removing photoresist and stripping method of photoresist using the same
US20240288774A1 (en) *	2021-07-08	2024-08-29	Samsung Sdi Co., Ltd.	Composition for removing edge bead of metal-containing resist and method for forming pattern comprising step of removing edge bead by using same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6326130B1 (en) *	1993-10-07	2001-12-04	Mallinckrodt Baker, Inc.	Photoresist strippers containing reducing agents to reduce metal corrosion
US5567574A (en) *	1995-01-10	1996-10-22	Mitsubishi Gas Chemical Company, Inc.	Removing agent composition for photoresist and method of removing
US6440326B1 (en) *	1998-08-13	2002-08-27	Mitsubishi Gas Chemical Company, Inc.	Photoresist removing composition
KR100286860B1 (ko) *	1998-12-31	2001-07-12	주식회사 동진쎄미켐	포토레지스트 리무버 조성물
JP4224651B2 (ja) *	1999-02-25	2009-02-18	三菱瓦斯化学株式会社	レジスト剥離剤およびそれを用いた半導体素子の製造方法
CN100403169C (zh) *	2001-07-13	2008-07-16	Ekc技术公司	亚砜吡咯烷酮链烷醇胺剥离和清洗组合物
JP4252758B2 (ja)	2002-03-22	2009-04-08	関東化学株式会社	フォトレジスト残渣除去液組成物

2005
- 2005-02-01 AT AT05712754T patent/ATE471537T1/de active
- 2005-02-01 CA CA002573788A patent/CA2573788A1/en not_active Abandoned
- 2005-02-01 PT PT05712754T patent/PT1787168E/pt unknown
- 2005-02-01 WO PCT/US2005/003422 patent/WO2006019402A1/en not_active Ceased
- 2005-02-01 US US11/630,602 patent/US7825078B2/en not_active Expired - Fee Related
- 2005-02-01 JP JP2006534481A patent/JP4272676B2/ja not_active Expired - Fee Related
- 2005-02-01 ES ES05712754T patent/ES2345616T3/es not_active Expired - Lifetime
- 2005-02-01 EP EP05712754A patent/EP1787168B1/de not_active Expired - Lifetime
- 2005-02-01 CN CN2005800237425A patent/CN1985217B/zh not_active Expired - Fee Related
- 2005-02-01 DK DK05712754.0T patent/DK1787168T3/da active
- 2005-02-01 BR BRPI0513315-7A patent/BRPI0513315A/pt not_active IP Right Cessation
- 2005-02-01 DE DE602005021890T patent/DE602005021890D1/de not_active Expired - Lifetime
- 2005-02-01 PL PL05712754T patent/PL1787168T3/pl unknown
- 2005-02-21 KR KR1020050014181A patent/KR100642185B1/ko not_active Expired - Fee Related
- 2005-02-25 MY MYPI20050742A patent/MY140032A/en unknown
- 2005-03-23 TW TW094108991A patent/TW200613544A/zh unknown
2006
- 2006-12-15 ZA ZA200610563A patent/ZA200610563B/en unknown
2007
- 2007-01-03 IL IL180532A patent/IL180532A/en not_active IP Right Cessation
- 2007-02-13 NO NO20070835A patent/NO20070835L/no not_active Application Discontinuation

Also Published As

Publication number	Publication date
ZA200610563B (en)	2008-07-30
ATE471537T1 (de)	2010-07-15
CA2573788A1 (en)	2006-02-23
PT1787168E (pt)	2010-07-16
JP4272676B2 (ja)	2009-06-03
WO2006019402A1 (en)	2006-02-23
TW200613544A (en)	2006-05-01
DE602005021890D1 (de)	2010-07-29
CN1985217A (zh)	2007-06-20
IL180532A (en)	2012-03-29
KR20060043033A (ko)	2006-05-15
MY140032A (en)	2009-11-30
EP1787168A1 (de)	2007-05-23
CN1985217B (zh)	2011-10-12
KR100642185B1 (ko)	2006-11-10
PL1787168T3 (pl)	2010-11-30
DK1787168T3 (da)	2010-08-09
BRPI0513315A (pt)	2008-05-06
EP1787168B1 (de)	2010-06-16
IL180532A0 (en)	2007-06-03
JP2007511784A (ja)	2007-05-10
US7825078B2 (en)	2010-11-02
ES2345616T3 (es)	2010-09-28
US20080287333A1 (en)	2008-11-20

Legal Events

Date	Code	Title	Description
2013-09-30	FC2A	Withdrawal, rejection or dismissal of laid open patent application

Publication	Publication Date	Title
NO20070835L (no)	2007-04-10	Vannfrie, mikroelektroniske rensesammensetninger inneholdende fruktose
TW200602817A (en)	2006-01-16	Composition for stripping and cleaning and use thereof
MY130394A (en)	2007-06-29	Aqueous stripping and cleaning composition
NO20073497L (no)	2007-07-06	Vannfrie, rustfrie mikroelektroniske rengjoringssammensetninger med polymere korrosjonsinhibitorer
SG168509A1 (en)	2011-02-28	Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
JP2012500421A (ja)	2012-01-05	Ｌｃｄを製造するためのフォトレジスト剥離組成物
WO2011019189A3 (ko)	2011-06-23	레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법
WO2010017160A3 (en)	2010-05-06	Environmentally friendly polymer stripping compositions
NO20073122L (no)	2007-08-28	Ikke-vandige, ikke-korrosive mikroelektronikk-renseformuleringer
BRPI0815750A2 (pt)	2017-05-30	processo para recuperar um solvente orgânico e um etanol orgânico de uma mistura de etanol/água.
TW200940706A (en)	2009-10-01	Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
ATE550319T1 (de)	2012-04-15	Verfahren zur herstellung eines aminoacetylpyrrolidincarbonitrilderivats
TW200736856A (en)	2007-10-01	Dynamic multi-purpose composition for the removal of photoresists and method for its use
TW200613543A (en)	2006-05-01	Aqueous resist stripper composition
EP2336826A3 (de)	2011-11-02	Sulfonyl-Fotosäuregeneratoren und diese Fotosäuregeneratoren enthaltende Fotoresiste
NO20083560L (no)	2008-09-10	Stabiliserte, ikke-vandige rensesammensetninger for mikroelektronikksubstrater
WO2011008051A3 (ko)	2011-04-21	구리 또는 구리합금용 레지스트 제거용 조성물
IS8166A (is)	2005-12-02	Búnaður fyrir griptengi sem eru notuð í rafgreiningarker til álframleiðslu
SG131867A1 (en)	2007-05-28	Aqueous cleaning composition and method for using same
SG146575A1 (en)	2008-10-30	Semiconductor etch residue remover and cleansing compositions
TW200602818A (en)	2006-01-16	Composition for removing a (photo) resist
TW200715073A (en)	2007-04-16	Photoresist stripper composition and method for manufacturing a semiconductor device using the same
SG152960A1 (en)	2009-06-29	Flouride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
WO2006052692A3 (en)	2007-08-30	Post etch cleaning composition for use with substrates having aluminum
AR063190A1 (es)	2009-01-14	Metodo mejorado para la remocion en linea de componentes corrosivos del aceite para transformadores