ATE474075T1 - Verfahren und vorrichtung zum erzielen der maximalen menge bei der elektrolytischen herstellung von hydriden der gruppen iv und v - Google Patents

Verfahren und vorrichtung zum erzielen der maximalen menge bei der elektrolytischen herstellung von hydriden der gruppen iv und v

Info

Publication number
ATE474075T1
ATE474075T1 AT07251583T AT07251583T ATE474075T1 AT E474075 T1 ATE474075 T1 AT E474075T1 AT 07251583 T AT07251583 T AT 07251583T AT 07251583 T AT07251583 T AT 07251583T AT E474075 T1 ATE474075 T1 AT E474075T1
Authority
AT
Austria
Prior art keywords
metal
electrolyte solution
concentration
achieveing
hydrides
Prior art date
Application number
AT07251583T
Other languages
English (en)
Inventor
Reinaldo Mario Machado
James E Hollen
George L Ryals
Christopher L Hartz
Rebecca J Mohr
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Application granted granted Critical
Publication of ATE474075T1 publication Critical patent/ATE474075T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
AT07251583T 2006-04-13 2007-04-13 Verfahren und vorrichtung zum erzielen der maximalen menge bei der elektrolytischen herstellung von hydriden der gruppen iv und v ATE474075T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79184006P 2006-04-13 2006-04-13
US11/687,947 US8021536B2 (en) 2006-04-13 2007-03-19 Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V hydrides

Publications (1)

Publication Number Publication Date
ATE474075T1 true ATE474075T1 (de) 2010-07-15

Family

ID=38330803

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07251583T ATE474075T1 (de) 2006-04-13 2007-04-13 Verfahren und vorrichtung zum erzielen der maximalen menge bei der elektrolytischen herstellung von hydriden der gruppen iv und v

Country Status (8)

Country Link
US (2) US8021536B2 (de)
EP (1) EP1845172B1 (de)
JP (2) JP4842878B2 (de)
KR (1) KR100870161B1 (de)
CN (1) CN101104938B (de)
AT (1) ATE474075T1 (de)
DE (1) DE602007007684D1 (de)
TW (1) TWI363106B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090159454A1 (en) * 2007-12-20 2009-06-25 Air Products And Chemicals, Inc. Divided electrochemical cell and low cost high purity hydride gas production process
CN106207203B (zh) * 2016-07-28 2018-09-14 华南理工大学 一种纳米片状Ni(OH)2催化剂及其制备方法和应用
JP7030115B2 (ja) * 2017-05-19 2022-03-04 昭和電工株式会社 電気化学的にゲルマンを製造する方法
JP7030114B2 (ja) * 2017-05-19 2022-03-04 昭和電工株式会社 電気化学的にゲルマンを製造する方法
WO2018212007A1 (ja) * 2017-05-19 2018-11-22 昭和電工株式会社 電気化学的にゲルマンを製造する方法
CN108760435A (zh) * 2018-07-18 2018-11-06 天津师范大学 一种用来制备元素氢化物的电化学装置及用途
WO2020113089A1 (en) * 2018-11-28 2020-06-04 Ayers Group, LLC Method and apparatus for energy efficient electrochemical production of hydride gases
CN111378979B (zh) * 2018-12-29 2022-03-15 紫石能源有限公司 砷纳米颗粒及其制备方法、电解制砷烷的系统和方法
CN111979558B (zh) * 2019-05-21 2023-08-01 紫石能源有限公司 电解法制备硒化氢的方法和设备
WO2022118934A1 (ja) * 2020-12-04 2022-06-09 Ｅｎｅｏｓ株式会社 有機ハイドライド製造システム、有機ハイドライド製造システムの制御装置および有機ハイドライド製造システムの制御方法
WO2022189676A1 (en) * 2021-03-12 2022-09-15 Friedrich-Schiller-Universität Jena In-situ electrochemical cell with simultaneous thermal analysis

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
US4178224A (en) 1978-01-19 1979-12-11 Texas Instruments Incorporated Apparatus for generation and control of dopant and reactive gases
JPH01139781A (ja) 1987-11-26 1989-06-01 Seitetsu Kagaku Co Ltd ホスフィンの製造方法
US5474659A (en) 1989-04-18 1995-12-12 At&T Corp. Process and apparatus for generating precursor gases used in the manufacture of semiconductor devices
CA2010482C (en) 1989-04-18 1998-08-25 Gardy Cadet Process for the fabrication of devices; utilizing electrochemically generated gases
US5158656A (en) 1991-03-22 1992-10-27 Electron Transfer Technologies, Inc. Method and apparatus for the electrolytic preparation of group IV and V hydrides
FR2710043B1 (fr) 1993-09-17 1995-10-13 Air Liquide Procédé et dispositif de génération d'arsine par voie électrolytique.
US5630933A (en) 1995-07-14 1997-05-20 Lucent Technologies Inc. Processes involving metal hydrides
US5925232A (en) 1995-12-06 1999-07-20 Electron Tranfer Technologies Method and apparatus for constant composition delivery of hydride gases for semiconductor processing
JPH108280A (ja) 1996-06-21 1998-01-13 Furukawa Battery Co Ltd:The 化合物の製造方法
US6080297A (en) 1996-12-06 2000-06-27 Electron Transfer Technologies, Inc. Method and apparatus for constant composition delivery of hydride gases for semiconductor processing
CN1239748C (zh) * 2002-08-10 2006-02-01 太原理工大学 电解法制备硼氢化物的工艺
RU2230830C1 (ru) 2003-07-08 2004-06-20 Общество с ограниченной ответственностью "Фирма "ХОРСТ" Способ получения высокочистого гидрида германия (варианты)
CA2503297C (en) * 2004-04-13 2009-10-20 Rohm And Haas Company Electrolytic method for producing borohydride

Also Published As

Publication number Publication date
EP1845172B1 (de) 2010-07-14
US20120205252A1 (en) 2012-08-16
KR20070101815A (ko) 2007-10-17
US8021536B2 (en) 2011-09-20
JP2007284790A (ja) 2007-11-01
TWI363106B (en) 2012-05-01
US8591720B2 (en) 2013-11-26
EP1845172A2 (de) 2007-10-17
JP2011137241A (ja) 2011-07-14
CN101104938A (zh) 2008-01-16
US20070240997A1 (en) 2007-10-18
CN101104938B (zh) 2011-08-03
DE602007007684D1 (de) 2010-08-26
TW200738910A (en) 2007-10-16
JP4842878B2 (ja) 2011-12-21
KR100870161B1 (ko) 2008-11-24
EP1845172A3 (de) 2009-04-15

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