ATE475993T1 - Anlage zur kontinuierlichen herstellung eines supraleiterbandes - Google Patents

Anlage zur kontinuierlichen herstellung eines supraleiterbandes

Info

Publication number
ATE475993T1
ATE475993T1 AT05113039T AT05113039T ATE475993T1 AT E475993 T1 ATE475993 T1 AT E475993T1 AT 05113039 T AT05113039 T AT 05113039T AT 05113039 T AT05113039 T AT 05113039T AT E475993 T1 ATE475993 T1 AT E475993T1
Authority
AT
Austria
Prior art keywords
treatment chamber
tape
continuous production
situated
post
Prior art date
Application number
AT05113039T
Other languages
English (en)
Inventor
Marco Canetti
Alessandro Battocchio
Original Assignee
Rial Vacuum S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rial Vacuum S R L filed Critical Rial Vacuum S R L
Application granted granted Critical
Publication of ATE475993T1 publication Critical patent/ATE475993T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/40—Sealings between relatively-moving surfaces by means of fluid
    • F16J15/406—Sealings between relatively-moving surfaces by means of fluid by at least one pump
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
AT05113039T 2005-12-28 2005-12-28 Anlage zur kontinuierlichen herstellung eines supraleiterbandes ATE475993T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05113039A EP1804306B1 (de) 2005-12-28 2005-12-28 Anlage zur kontinuierlichen Herstellung eines Supraleiterbandes

Publications (1)

Publication Number Publication Date
ATE475993T1 true ATE475993T1 (de) 2010-08-15

Family

ID=36581841

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05113039T ATE475993T1 (de) 2005-12-28 2005-12-28 Anlage zur kontinuierlichen herstellung eines supraleiterbandes

Country Status (3)

Country Link
EP (1) EP1804306B1 (de)
AT (1) ATE475993T1 (de)
DE (1) DE602005022604D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104236991A (zh) * 2014-08-19 2014-12-24 宁波英飞迈材料科技有限公司 一种可拆卸原位热处理装置及其使用方法
CN105970174B (zh) * 2016-06-14 2019-06-21 肇庆市大力真空设备有限公司 一种快速的真空磁控溅射镀膜设备及其加工方法
CN109402596A (zh) * 2018-10-29 2019-03-01 厦门建霖健康家居股份有限公司 一种连续型真空多彩镀膜系统
CN111519159B (zh) * 2020-04-30 2021-06-04 绍兴市宇德塑料制品有限公司 一种多适用规格的塑料制品真空镀膜设备
CN116641037B (zh) * 2023-07-27 2023-10-20 上海超导科技股份有限公司 双面镀制超导带材保护层的设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1009883B (de) * 1953-05-15 1957-06-06 Heraeus Gmbh W C Hochvakuumbedampfungsanlage
FR1545284A (fr) * 1967-11-24 1968-11-08 Hochvakuum Dresden Veb Dispositif de projection par vaporisation sur des bandes
US4763601A (en) * 1987-09-02 1988-08-16 Nippon Steel Corporation Continuous composite coating apparatus for coating strip
US20040016401A1 (en) * 2002-07-26 2004-01-29 Metal Oxide Technologies, Inc. Method and apparatus for forming superconductor material on a tape substrate

Also Published As

Publication number Publication date
DE602005022604D1 (de) 2010-09-09
EP1804306A1 (de) 2007-07-04
EP1804306B1 (de) 2010-07-28

Similar Documents

Publication Publication Date Title
TW200719945A (en) Method of treating gas
US8448497B2 (en) Apparatus and method for measurement of water vapor permeability
WO2009148913A3 (en) Method for treating substrates
EA201070610A1 (ru) Способы получения и применения вспомогательного газа
ATE475993T1 (de) Anlage zur kontinuierlichen herstellung eines supraleiterbandes
NO20082659L (no) Radiell kompressorrotor
NO20084260L (no) Anordning for torking av trykkgass og fremgangsmate anvendt for dette
FR2883934B1 (fr) Pompage rapide d'enceinte avec limitation d'energie
ATE445720T1 (de) Zugangsversperrsystem, netzverarbeitungsanlage und anwendungsverfahren dafür
MY178692A (en) Sanitizer system
CN203885880U (zh) 环保真空充氮绝氧杀虫灭菌装置
AR062870A1 (es) Planta de gas natural licuado con flexibilidad operativa mejorada
FI20065227L (fi) Menetelmä ja laitteisto ilman puhdistamiseksi
SE0701599L (sv) Förfarande för att framställa rent vatten och elektricitet jämte en anordning härför
ATE425548T1 (de) Zerstäubungsvorrichtung mit einer rohrkathode und verfahren zum betreiben dieser zerstäubungsvorrichtung
NO20075712L (no) Metode for behandling og konstruksjon av rorskjoter
ATE331822T1 (de) Abgedichtete schleuse für eine in-line vakuumbeschichtungsanlage
CA2489755A1 (en) Method and apparatus for carbon dioxide accelerated unit cooldown
CN101450498A (zh) 木材热处理设备
TW201923128A (zh) 用於清潔真空腔室的系統、用於清潔真空腔室的方法以及用於清潔真空腔室的壓縮機的用途
CN204193746U (zh) 一种吸附净化塔
JPH109774A (ja) 発電プラントの塩素発生設備
CN218344254U (zh) 一种果蔬真空保鲜柜
CN111705322B (zh) 一种甜菊苷与醋酸锌复配酸洗缓蚀剂
DE602008003535D1 (de) Anlage zur herstellung von peneiden garnelen

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties