ATE478132T1 - Siliziumoxidteilchen - Google Patents

Siliziumoxidteilchen

Info

Publication number
ATE478132T1
ATE478132T1 AT99924420T AT99924420T ATE478132T1 AT E478132 T1 ATE478132 T1 AT E478132T1 AT 99924420 T AT99924420 T AT 99924420T AT 99924420 T AT99924420 T AT 99924420T AT E478132 T1 ATE478132 T1 AT E478132T1
Authority
AT
Austria
Prior art keywords
silicon oxide
oxide nanoparticles
oxide particles
collection
average diameter
Prior art date
Application number
AT99924420T
Other languages
English (en)
Inventor
Sujeet Kumar
Xiangxin Bi
Nobuyuki Kambe
Original Assignee
Nanogram Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanogram Corp filed Critical Nanogram Corp
Application granted granted Critical
Publication of ATE478132T1 publication Critical patent/ATE478132T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B19/00—Layered products comprising a layer of natural mineral fibres or particles, e.g. asbestos, mica
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/12—Water-insoluble compounds
    • C11D3/124—Silicon containing, e.g. silica, silex, quartz or glass beads
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C11D7/14—Silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Silicon Compounds (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Conductive Materials (AREA)
  • Glass Compositions (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
AT99924420T 1998-05-27 1999-05-20 Siliziumoxidteilchen ATE478132T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/085,514 US6726990B1 (en) 1998-05-27 1998-05-27 Silicon oxide particles
PCT/US1999/011257 WO1999061244A1 (en) 1998-05-27 1999-05-20 Silicon oxide particles

Publications (1)

Publication Number Publication Date
ATE478132T1 true ATE478132T1 (de) 2010-09-15

Family

ID=22192117

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99924420T ATE478132T1 (de) 1998-05-27 1999-05-20 Siliziumoxidteilchen

Country Status (9)

Country Link
US (1) US6726990B1 (de)
EP (1) EP1082405B1 (de)
JP (1) JP2002516351A (de)
KR (1) KR100597057B1 (de)
CN (1) CN1155469C (de)
AT (1) ATE478132T1 (de)
CA (1) CA2333259A1 (de)
DE (1) DE69942687D1 (de)
WO (1) WO1999061244A1 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849334B2 (en) * 2001-08-17 2005-02-01 Neophotonics Corporation Optical materials and optical devices
US6952504B2 (en) 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US7575784B1 (en) 2000-10-17 2009-08-18 Nanogram Corporation Coating formation by reactive deposition
US6599631B2 (en) * 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US7384680B2 (en) * 1997-07-21 2008-06-10 Nanogram Corporation Nanoparticle-based power coatings and corresponding structures
US6482374B1 (en) * 1999-06-16 2002-11-19 Nanogram Corporation Methods for producing lithium metal oxide particles
US6788866B2 (en) 2001-08-17 2004-09-07 Nanogram Corporation Layer materials and planar optical devices
US20090255189A1 (en) * 1998-08-19 2009-10-15 Nanogram Corporation Aluminum oxide particles
US20060147369A1 (en) * 1997-07-21 2006-07-06 Neophotonics Corporation Nanoparticle production and corresponding structures
US20090075083A1 (en) * 1997-07-21 2009-03-19 Nanogram Corporation Nanoparticle production and corresponding structures
AU1219600A (en) 1998-10-21 2000-05-08 W.R. Grace & Co.-Conn. Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles
US6447693B1 (en) 1998-10-21 2002-09-10 W. R. Grace & Co.-Conn. Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces
US6974367B1 (en) * 1999-09-02 2005-12-13 Micron Technology, Inc. Chemical mechanical polishing process
DE19952383A1 (de) * 1999-10-30 2001-05-17 Henkel Kgaa Wasch- und Reinigungsmittel
JP2001226665A (ja) * 2000-02-16 2001-08-21 Maruo Calcium Co Ltd 艶出し剤用研磨剤及びそれを含有してなる艶出し剤組成物
DE10042806A1 (de) * 2000-08-30 2002-03-28 Wap Reinigungssysteme Reinigungsmittel für die Hoch- und Niederdruckreinigung
CN1251809C (zh) 2000-10-17 2006-04-19 尼奥弗托尼克斯公司 通过反应沉积形成涂覆的装置及方法
CN100484752C (zh) 2000-10-26 2009-05-06 尼奥弗托尼克斯公司 多层光学结构
EP1886802A3 (de) 2001-08-03 2008-07-30 NanoGram Corporation Strukturen mit anorganischen Polymerpartikelmischungen
US6917511B1 (en) 2001-08-14 2005-07-12 Neophotonics Corporation Reactive deposition for the formation of chip capacitors
US6723435B1 (en) 2001-08-28 2004-04-20 Nanogram Corporation Optical fiber preforms
JP3804009B2 (ja) * 2001-10-01 2006-08-02 触媒化成工業株式会社 研磨用シリカ粒子分散液、その製造方法および研磨材
JP4044762B2 (ja) * 2002-01-10 2008-02-06 電気化学工業株式会社 高純度・超微粉ＳｉＯｘ粉及びその製造方法
KR100401335B1 (en) * 2003-03-08 2003-10-10 Mijitech Co Ltd Metal nanoparticle surface-coated with silicon oxides and preparation thereof
US8865271B2 (en) 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US7521097B2 (en) 2003-06-06 2009-04-21 Nanogram Corporation Reactive deposition for electrochemical cell production
US7186653B2 (en) * 2003-07-30 2007-03-06 Climax Engineered Materials, Llc Polishing slurries and methods for chemical mechanical polishing
US20050022456A1 (en) * 2003-07-30 2005-02-03 Babu S. V. Polishing slurry and method for chemical-mechanical polishing of copper
US7491431B2 (en) 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
US20070003694A1 (en) * 2005-05-23 2007-01-04 Shivkumar Chiruvolu In-flight modification of inorganic particles within a reaction product flow
US7972691B2 (en) * 2006-12-22 2011-07-05 Nanogram Corporation Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites
CN101622319B (zh) 2007-01-03 2013-05-08 内诺格雷姆公司 基于硅/锗的纳米颗粒油墨、掺杂型颗粒、用于半导体应用的印刷和方法
WO2008100568A1 (en) * 2007-02-17 2008-08-21 Nanogram Corporation Functional composites, functional inks and applications thereof
FR2916193B1 (fr) * 2007-05-18 2009-08-07 Commissariat Energie Atomique Synthese par pyrolyse laser de nanocristaux de silicium.
US20090020411A1 (en) * 2007-07-20 2009-01-22 Holunga Dean M Laser pyrolysis with in-flight particle manipulation for powder engineering
WO2009046296A1 (en) * 2007-10-05 2009-04-09 Saint-Gobain Ceramics & Plastics, Inc. Polishing of sapphire with composite slurries
JP5346940B2 (ja) * 2007-10-05 2013-11-20 サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド 改善された炭化ケイ素粒子、ならびにその製造方法および使用方法
WO2009117148A2 (en) * 2008-03-21 2009-09-24 Nanogram Corporation Metal silicon nitride or metal silicon oxynitride submicron phosphor particles and methods for synthesizing these phosphors
CN104072993A (zh) 2009-01-08 2014-10-01 纳克公司 聚硅氧烷聚合物与无机纳米颗粒的复合物及其形成方法
JP5370055B2 (ja) * 2009-10-06 2013-12-18 住友大阪セメント株式会社 ケイ素低級酸化物粒子の製造方法及び該粒子の分散液
JP5613422B2 (ja) * 2010-02-12 2014-10-22 花王株式会社 磁気ディスク基板用研磨液組成物
US8944789B2 (en) 2010-12-10 2015-02-03 National Oilwell Varco, L.P. Enhanced elastomeric stator insert via reinforcing agent distribution and orientation
JP5942897B2 (ja) * 2012-03-22 2016-06-29 信越化学工業株式会社 酸化珪素析出体の連続製造方法及び製造装置
CN103311511B (zh) * 2013-05-23 2015-05-27 刘国钧 一种壳核结构纳米硅复合材料的制备方法
CA2938763C (en) 2014-02-18 2020-12-15 Reme Technologies, Llc Graphene enhanced elastomeric stator

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE790704A (fr) 1971-10-28 1973-02-15 Degussa Procede pour la fabrication d'oxydes finement
US4011099A (en) 1975-11-07 1977-03-08 Monsanto Company Preparation of damage-free surface on alpha-alumina
US4048290A (en) 1976-01-28 1977-09-13 Cabot Corporation Process for the production of finely-divided metal and metalloid oxides
US4356107A (en) * 1979-11-26 1982-10-26 Nalco Chemical Company Process for preparing silica sols
JPS58110414A (ja) * 1981-12-23 1983-07-01 Tokuyama Soda Co Ltd 無機酸化物及びその製造方法
JPS59206042A (ja) 1983-05-07 1984-11-21 Sumitomo Electric Ind Ltd 微粉末の製造方法及び製造装置
DE3581293D1 (de) 1984-02-09 1991-02-21 Toyota Motor Co Ltd Verfahren zur herstellung von ultrafeinen keramikpartikeln.
US4548798A (en) * 1984-04-16 1985-10-22 Exxon Research And Engineering Co. Laser synthesis of refractory oxide powders
US4558017A (en) 1984-05-14 1985-12-10 Allied Corporation Light induced production of ultrafine powders comprising metal silicide powder and silicon
US4536252A (en) 1985-02-07 1985-08-20 The United States Of America As Represented By The Secretary Of The Army Laser-induced production of nitrosyl fluoride for etching of semiconductor surfaces
DE3616133A1 (de) * 1985-09-25 1987-11-19 Merck Patent Gmbh Kugelfoermige sio(pfeil abwaerts)2(pfeil abwaerts)-partikel
JPS6374911A (ja) 1986-09-19 1988-04-05 Shin Etsu Chem Co Ltd 微細球状シリカの製造法
US4956313A (en) 1987-08-17 1990-09-11 International Business Machines Corporation Via-filling and planarization technique
DE3884778T2 (de) * 1987-12-29 1994-05-11 Du Pont Feine Polierzusammensetzung für Plaketten.
US4910155A (en) 1988-10-28 1990-03-20 International Business Machines Corporation Wafer flood polishing
US5352277A (en) * 1988-12-12 1994-10-04 E. I. Du Pont De Nemours & Company Final polishing composition
US5062936A (en) 1989-07-12 1991-11-05 Thermo Electron Technologies Corporation Method and apparatus for manufacturing ultrafine particles
US4959113C1 (en) * 1989-07-31 2001-03-13 Rodel Inc Method and composition for polishing metal surfaces
DE3939953A1 (de) 1989-12-02 1991-06-06 Bayer Ag Verfahren zur herstellung feinteiliger keramischer oxid-pulver aus vorlaeuferverbindungen
US5128081A (en) * 1989-12-05 1992-07-07 Arch Development Corporation Method of making nanocrystalline alpha alumina
JP3047110B2 (ja) * 1990-06-15 2000-05-29 株式会社東北テクノアーチ 金属酸化物微粒子の製造方法
JPH075306B2 (ja) * 1990-10-08 1995-01-25 信越化学工業株式会社 希土オキシ硫化物の精製方法
US5228886A (en) 1990-10-09 1993-07-20 Buehler, Ltd. Mechanochemical polishing abrasive
US5447708A (en) * 1993-01-21 1995-09-05 Physical Sciences, Inc. Apparatus for producing nanoscale ceramic powders
US5626715A (en) * 1993-02-05 1997-05-06 Lsi Logic Corporation Methods of polishing semiconductor substrates
US5376449A (en) * 1993-07-09 1994-12-27 Martin Marietta Energy Systems, Inc. Silica powders for powder evacuated thermal insulating panel and method
WO1995024054A1 (en) * 1994-03-01 1995-09-08 Rodel, Inc. Improved compositions and methods for polishing
AU2925495A (en) * 1994-07-04 1996-01-25 Unilever Plc Washing process and composition
US5527423A (en) 1994-10-06 1996-06-18 Cabot Corporation Chemical mechanical polishing slurry for metal layers
US5580655A (en) * 1995-03-03 1996-12-03 Dow Corning Corporation Silica nanoparticles
US5876683A (en) * 1995-11-02 1999-03-02 Glumac; Nicholas Combustion flame synthesis of nanophase materials
US5605569A (en) * 1995-11-08 1997-02-25 Ppg Industries, Inc. Precipitated silica having high sodium sulfate content
US5645736A (en) * 1995-12-29 1997-07-08 Symbios Logic Inc. Method for polishing a wafer
ES2202511T3 (es) * 1996-04-22 2004-04-01 Merck Patent Gmbh Particulas de sio2 recubiertas.
US5876490A (en) * 1996-12-09 1999-03-02 International Business Machines Corporatin Polish process and slurry for planarization
FR2763258B1 (fr) * 1997-05-15 1999-06-25 Commissariat Energie Atomique Procede de fabrication d'oxydes metalliques, simples ou mixtes, ou d'oxyde de silicium
US5871872A (en) * 1997-05-30 1999-02-16 Shipley Company, Ll.C. Dye incorporated pigments and products made from same
US5770022A (en) * 1997-06-05 1998-06-23 Dow Corning Corporation Method of making silica nanoparticles
US5891205A (en) * 1997-08-14 1999-04-06 Ekc Technology, Inc. Chemical mechanical polishing composition
US5801092A (en) * 1997-09-04 1998-09-01 Ayers; Michael R. Method of making two-component nanospheres and their use as a low dielectric constant material for semiconductor devices

Also Published As

Publication number Publication date
WO1999061244A1 (en) 1999-12-02
DE69942687D1 (de) 2010-09-30
KR20010043853A (ko) 2001-05-25
WO1999061244A8 (en) 2000-03-09
CN1155469C (zh) 2004-06-30
US6726990B1 (en) 2004-04-27
EP1082405A4 (de) 2005-09-21
EP1082405B1 (de) 2010-08-18
KR100597057B1 (ko) 2006-07-06
JP2002516351A (ja) 2002-06-04
CN1305411A (zh) 2001-07-25
CA2333259A1 (en) 1999-12-02
EP1082405A1 (de) 2001-03-14

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Legal Events

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